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Class Information
Number: 118/719
Name: Coating apparatus > Gas or vapor deposition > Multizone chamber
Description: Apparatus wherein the coating apparatus is divided into a number of distinct areas wherein different aspects of the coating treatment can be performed.


Patents under this class:

Patent Number Title Of Patent Date Issued
6927165 Method and apparatus for processing substrates and method for manufacturing a semiconductor device Aug. 9, 2005
6923867 Substrate processing apparatus and method for manufacturing semiconductor device Aug. 2, 2005
6923868 Installation for electron-ray coatication of coatings Aug. 2, 2005
6924001 Production device for DLC film-coated plastic container and production method therefor Aug. 2, 2005
6921456 High pressure processing chamber for semiconductor substrate Jul. 26, 2005
6921466 Revolution member supporting apparatus and semiconductor substrate processing apparatus Jul. 26, 2005
6919001 Disk coating system Jul. 19, 2005
6916397 Methods and apparatus for maintaining a pressure within an environmentally controlled chamber Jul. 12, 2005
6913652 Gas flow division in a wafer processing system having multiple chambers Jul. 5, 2005
6913675 Film forming apparatus, substrate for forming oxide thin film, and production method thereof Jul. 5, 2005
6911112 Method of and apparatus for performing sequential processes requiring different amounts of time in the manufacturing of semiconductor devices Jun. 28, 2005
6905578 Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure Jun. 14, 2005
6905582 Configurable vacuum system and method Jun. 14, 2005
6902623 Reactor having a movable shutter Jun. 7, 2005
6902624 Massively parallel atomic layer deposition/chemical vapor deposition system Jun. 7, 2005
6902647 Method of processing substrates with integrated weighing steps Jun. 7, 2005
6902947 Integrated method for release and passivation of MEMS structures Jun. 7, 2005
6903013 Method to fill a trench and tunnel by using ALD seed layer and electroless plating Jun. 7, 2005
6903016 Combined conformal/non-conformal seed layers for metallic interconnects Jun. 7, 2005
6903030 System and method for heat treating semiconductor Jun. 7, 2005
6899764 Chemical vapor deposition reactor and process chamber for said reactor May. 31, 2005
6899765 Chamber elements defining a movable internal chamber May. 31, 2005
6895685 Vacuum processing apparatus and semiconductor manufacturing line using the same May. 24, 2005
6896513 Large area substrate processing system May. 24, 2005
6893506 Atomic layer deposition apparatus and method May. 17, 2005
6886272 Vacuum processing apparatus and operating method therefor May. 3, 2005
6884298 Method and system for coating and developing Apr. 26, 2005
6884299 Deposition apparatus for organic light-emitting devices Apr. 26, 2005
6881269 Lens plasma coating system Apr. 19, 2005
6878207 Gas gate for isolating regions of differing gaseous pressure Apr. 12, 2005
6875279 Single reactor, multi-pressure chemical vapor deposition for semiconductor devices Apr. 5, 2005
6875280 Substrate processing apparatus and substrate processing method Apr. 5, 2005
6875281 Method and system for coating and developing Apr. 5, 2005
6875282 Substrate transport container Apr. 5, 2005
6875306 Vacuum processing device Apr. 5, 2005
6869483 Coating process and apparatus Mar. 22, 2005
6869508 Physical vapor deposition apparatus and process Mar. 22, 2005
6863733 Apparatus for fabricating thin-film semiconductor device Mar. 8, 2005
6860965 High throughput architecture for semiconductor processing Mar. 1, 2005
6858085 Two-compartment chamber for sequential processing Feb. 22, 2005
6858119 Mobile plating system and method Feb. 22, 2005
6855207 Apparatus and system for eliminating contaminants on a substrate surface Feb. 15, 2005
6852169 Apparatus and methods for processing optical fibers with a plasma Feb. 8, 2005
6852194 Processing apparatus, transferring apparatus and transferring method Feb. 8, 2005
6849134 Minimum volume oven for producing uniform pyrolytic oxide coatings on capacitor anodes Feb. 1, 2005
6846380 Substrate processing apparatus and related systems and methods Jan. 25, 2005
6843882 Gas flow control in a wafer processing system having multiple chambers for performing same process Jan. 18, 2005
6843883 Vacuum processing apparatus and method for producing an object to be processed Jan. 18, 2005
6843892 Apparatus and method for selectively and controllably electrically biasing a plurality of substrates on a pallet Jan. 18, 2005
6841006 Atmospheric substrate processing apparatus for depositing multiple layers on a substrate Jan. 11, 2005



 
 
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