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Class Information
Number: 118/719
Name: Coating apparatus > Gas or vapor deposition > Multizone chamber
Description: Apparatus wherein the coating apparatus is divided into a number of distinct areas wherein different aspects of the coating treatment can be performed.










Patents under this class:

Patent Number Title Of Patent Date Issued
5637180 Plasma processing method and plasma generator Jun. 10, 1997
5630879 Method and apparatus for the partial coating of sets of structural components May. 20, 1997
5630880 Method and apparatus for a large volume plasma processor that can utilize any feedstock material May. 20, 1997
5628828 Processing method and equipment for processing a semiconductor device having holder/carrier with flattened surface May. 13, 1997
5626677 Atmospheric pressure CVD apparatus May. 6, 1997
5624498 Showerhead for a gas supplying apparatus Apr. 29, 1997
5622918 Process and apparatus for preparing YBaCuO superconducting films Apr. 22, 1997
5620522 Microwave plasma generator Apr. 15, 1997
5620578 Sputtering apparatus having an on board service module Apr. 15, 1997
5618388 Geometries and configurations for magnetron sputtering apparatus Apr. 8, 1997
5611861 Rotary type apparatus for processing semiconductor wafers and method of processing semiconductor wafers Mar. 18, 1997
5609688 Apparatus for producing semiconductor device Mar. 11, 1997
5609689 Vacuum process apparaus Mar. 11, 1997
5603761 Liquid phase epitaxial growth method for carrying out the same Feb. 18, 1997
5597609 Process and apparatus for the continuous or semi-continuous coating of eyeglass lenses Jan. 28, 1997
5593740 Method and apparatus for making carbon-encapsulated ultrafine metal particles Jan. 14, 1997
5591268 Plasma process with radicals Jan. 7, 1997
5588999 Thin film forming device Dec. 31, 1996
5589007 Photovoltaic elements and process and apparatus for their formation Dec. 31, 1996
5589224 Apparatus for full wafer deposition Dec. 31, 1996
5587207 Arc assisted CVD coating and sintering method Dec. 24, 1996
5585137 Apparatus and method of manufacturing fiber Dec. 17, 1996
5582881 Process for deposition of a Ti/TiN cap layer on aluminum metallization and apparatus Dec. 10, 1996
5578129 Gas supplying head and load lock chamber of semiconductor processing system Nov. 26, 1996
5578130 Apparatus and method for depositing a film Nov. 26, 1996
5575855 Apparatus for forming a deposited film Nov. 19, 1996
5571330 Load lock chamber for vertical type heat treatment apparatus Nov. 5, 1996
5571331 Vacuum treatment apparatus Nov. 5, 1996
5571749 Method and apparatus for forming deposited film Nov. 5, 1996
5569328 Silicon semiconductor wafer test Oct. 29, 1996
5562383 Treatment apparatus Oct. 8, 1996
5562387 Device for transferring plate-like objects Oct. 8, 1996
5563095 Method for manufacturing semiconductor devices Oct. 8, 1996
5558717 CVD Processing chamber Sep. 24, 1996
5556472 Film deposition apparatus Sep. 17, 1996
5556473 Parylene deposition apparatus including dry vacuum pump system and downstream cold trap Sep. 17, 1996
5554249 Magnetron plasma processing system Sep. 10, 1996
5551984 Vertical heat treatment apparatus with a circulation gas passage Sep. 3, 1996
5547512 Continuous atomspheric pressure CVD coating of fibers Aug. 20, 1996
5545387 Production of high-purity polycrystalline silicon rod for semiconductor applications Aug. 13, 1996
5542979 Apparatus for producing thin film Aug. 6, 1996
5540777 Aluminum oxide LPCVD system Jul. 30, 1996
5538390 Enclosure for load lock interface Jul. 23, 1996
5538390 Enclosure for load lock interface Jul. 23, 1996
5536128 Method and apparatus for carrying a variety of products Jul. 16, 1996
5536317 Parylene deposition apparatus including a quartz crystal thickness/rate controller Jul. 16, 1996
5536319 Parylene deposition apparatus including an atmospheric shroud and inert gas source Jul. 16, 1996
5536320 Processing apparatus Jul. 16, 1996
5536321 Parylene deposition apparatus including a post-pyrolysis filtering chamber and a deposition chamber inlet filter Jul. 16, 1996
5536322 Parylene deposition apparatus including a heated and cooled support platen and an electrostatic clamping device Jul. 16, 1996











 
 
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