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Class Information
Number: 118/719
Name: Coating apparatus > Gas or vapor deposition > Multizone chamber
Description: Apparatus wherein the coating apparatus is divided into a number of distinct areas wherein different aspects of the coating treatment can be performed.


Patents under this class:
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Patent Number Title Of Patent Date Issued
5266116 Glow discharge apparatus for continuously manufacturing semiconductor device comprising gas gates with slotted rollers Nov. 30, 1993
5266117 Apparatus for the evaporative coating of substrates Nov. 30, 1993
5264038 Chemical vapor deposition system Nov. 23, 1993
5264245 CVD method for forming uniform coatings Nov. 23, 1993
5261776 Vacuum operated wafer transfer apparatus Nov. 16, 1993
5261959 Diamond crystal growth apparatus Nov. 16, 1993
5261960 Reaction chambers for CVD systems Nov. 16, 1993
5259881 Wafer processing cluster tool batch preheating and degassing apparatus Nov. 9, 1993
5259942 Device for transferring a workpiece into and out from a vacuum chamber Nov. 9, 1993
5258075 Process for producing photoconductive member and apparatus for producing the same Nov. 2, 1993
5256204 Single semiconductor water transfer method and manufacturing system Oct. 26, 1993
5254169 High-vacuum coating apparatus Oct. 19, 1993
5254170 Enhanced vertical thermal reactor system Oct. 19, 1993
5254210 Method and apparatus for growing semiconductor heterostructures Oct. 19, 1993
5252131 Apparatus for gas source molecular beam epitaxy Oct. 12, 1993
5252366 Chemical vapor deposition method using an actively cooled effuser to coat a substrate having a heated surface layer Oct. 12, 1993
5248349 Process for making photovoltaic devices and resultant product Sep. 28, 1993
5246500 Vapor phase epitaxial growth apparatus Sep. 21, 1993
5244559 Apparatus for transport and heat treatment of substrates Sep. 14, 1993
5242477 Apparatus for coating optical fibers Sep. 7, 1993
5240505 Method of an apparatus for forming thin film for semiconductor device Aug. 31, 1993
5238498 Open tube-type impurity-diffusion apparatus for simultaneously diffusing impurities into a plurality of wafers subjected to a common environment, for producing a mass of semiconductor chips Aug. 24, 1993
5238525 Analysis of Rheed data from rotating substrates Aug. 24, 1993
5236509 Modular IBAD apparatus for continuous coating Aug. 17, 1993
5234501 Oxidation metod Aug. 10, 1993
5234528 Vertical heat-treating apparatus Aug. 10, 1993
5232505 Apparatus for the automatic casting, coating, varnishing, testing and sorting of workpieces Aug. 3, 1993
5232506 Furnace structure of semiconductor manufacturing apparatus Aug. 3, 1993
5232507 Apparatus for forming deposited films with microwave plasma CVD method Aug. 3, 1993
5232508 Gaseous phase chemical treatment reactor Aug. 3, 1993
5229081 Apparatus for semiconductor process including photo-excitation process Jul. 20, 1993
5227203 Ion-plating method and apparatus therefor Jul. 13, 1993
5227708 Two-axis magnetically coupled robot Jul. 13, 1993
5228114 Heat-treating apparatus with batch scheme having improved heat controlling capability Jul. 13, 1993
5224809 Semiconductor processing system with robotic autoloader and load lock Jul. 6, 1993
5223001 Vacuum processing apparatus Jun. 29, 1993
5222074 Thermal decomposition cell Jun. 22, 1993
5217755 Chemical vapor infiltration method utilizing substantially diffusive conditions Jun. 8, 1993
5217501 Vertical wafer heat treatment apparatus having dual load lock chambers Jun. 8, 1993
5215420 Substrate handling and processing system Jun. 1, 1993
5215589 High-vacuum coating apparatus Jun. 1, 1993
5216223 Plasma treatment apparatus Jun. 1, 1993
5203924 Method of and apparatus for synthesizing diamondlike thin film Apr. 20, 1993
5201956 Cellular tumble coater Apr. 13, 1993
5201995 Alternating cyclic pressure modulation process for selective area deposition Apr. 13, 1993
5202158 Apparatus for and method of producing high density fiber reinforced composite material Apr. 13, 1993
5199993 Methods of and apparatus for coating optical fibers Apr. 6, 1993
5199994 Impurity doping apparatus Apr. 6, 1993
5200017 Sample processing method and apparatus Apr. 6, 1993
5200232 Reaction chamber design and method to minimize particle generation in chemical vapor deposition reactors Apr. 6, 1993

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