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Class Information
Number: 118/719
Name: Coating apparatus > Gas or vapor deposition > Multizone chamber
Description: Apparatus wherein the coating apparatus is divided into a number of distinct areas wherein different aspects of the coating treatment can be performed.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5354348 |
Method for producing silica glass optical fiber with carbon coating |
Oct. 11, 1994 |
| 5354380 |
Apparatus for the insertion and removal of a mask through the airlock of a vacuum coating apparatus |
Oct. 11, 1994 |
| 5352261 |
Apparatus for the production of hermetically coated optical fiber |
Oct. 4, 1994 |
| 5350453 |
Device for producing thin films of mixed metal oxides from organic metal compounds on a substrate |
Sep. 27, 1994 |
| 5340261 |
Load-lock unit and wafer transfer system |
Aug. 23, 1994 |
| 5338362 |
Apparatus for processing semiconductor wafer comprising continuously rotating wafer table and plural chamber compartments |
Aug. 16, 1994 |
| 5336029 |
Loading apparatus having a suction-hold mechanism |
Aug. 9, 1994 |
| 5336324 |
Apparatus for depositing a coating on a substrate |
Aug. 9, 1994 |
| 5336325 |
Enhanced vertical thermal reactor system |
Aug. 9, 1994 |
| 5330633 |
Process for forming metal deposited film containing aluminum as main component by use of alkyl aluminum hydride |
Jul. 19, 1994 |
| 5327624 |
Method for forming a thin film on a semiconductor device using an apparatus having a load lock |
Jul. 12, 1994 |
| 5328515 |
Chemical treatment plasma apparatus for forming a ribbon-like plasma |
Jul. 12, 1994 |
| 5326211 |
Airlock system |
Jul. 5, 1994 |
| 5324360 |
Method for producing non-monocrystalline semiconductor device and apparatus therefor |
Jun. 28, 1994 |
| 5324361 |
Apparatus for coating cap-shaped substrates |
Jun. 28, 1994 |
| 5316585 |
Method for fabricating superconducting materials and superconductive thin films |
May. 31, 1994 |
| 5316793 |
Directed effusive beam atomic layer epitaxy system and method |
May. 31, 1994 |
| 5314539 |
Apparatus for plasma treatment of continuous material |
May. 24, 1994 |
| 5314574 |
Surface treatment method and apparatus |
May. 24, 1994 |
| 5315212 |
Plasma processing apparatus for generating uniform strip-shaped plasma by propagating microwave through rectangular slit |
May. 24, 1994 |
| 5312489 |
Rotary fixture for vapor deposition coating apparatus |
May. 17, 1994 |
| 5312490 |
Gas seal for continuous chemical vapor deposition reactors |
May. 17, 1994 |
| 5312509 |
Manufacturing system for low temperature chemical vapor deposition of high purity metals |
May. 17, 1994 |
| 5312647 |
Method and apparatus of vacuum deposition |
May. 17, 1994 |
| 5310410 |
Method for processing semi-conductor wafers in a multiple vacuum and non-vacuum chamber apparatus |
May. 10, 1994 |
| 5308399 |
Method and apparatus for coating a structural component by gas diffusion |
May. 3, 1994 |
| 5303671 |
System for continuously washing and film-forming a semiconductor wafer |
Apr. 19, 1994 |
| 5304248 |
Passive shield for CVD wafer processing which provides frontside edge exclusion and prevents backside depositions |
Apr. 19, 1994 |
| 5302209 |
Apparatus for manufacturing semiconductor device |
Apr. 12, 1994 |
| 5294572 |
Method and apparatus for depositing a layer on a substrate |
Mar. 15, 1994 |
| 5292393 |
Multichamber integrated process system |
Mar. 8, 1994 |
| 5290417 |
Apparatus with axial gas distribution for vacuum coating substrates on a carousel |
Mar. 1, 1994 |
| 5288326 |
Apparatus for continuous growth of SiC single crystal from SiC synthesized in a vapor phase without using graphite crucible |
Feb. 22, 1994 |
| 5288327 |
Deflected flow in chemical vapor deposition cell |
Feb. 22, 1994 |
| 5288329 |
Chemical vapor deposition apparatus of in-line type |
Feb. 22, 1994 |
| 5288379 |
Multi-chamber integrated process system |
Feb. 22, 1994 |
| 5288684 |
Photochemical vapor phase reaction apparatus and method of causing a photochemical vapor phase reaction |
Feb. 22, 1994 |
| 5286296 |
Multi-chamber wafer process equipment having plural, physically communicating transfer means |
Feb. 15, 1994 |
| 5286531 |
Method for treating an oxide coating |
Feb. 15, 1994 |
| 5284519 |
Inverted diffuser stagnation point flow reactor for vapor deposition of thin films |
Feb. 8, 1994 |
| 5284521 |
Vacuum film forming apparatus |
Feb. 8, 1994 |
| 5282899 |
Apparatus for the production of a dissociated atomic particle flow |
Feb. 1, 1994 |
| 5281274 |
Atomic layer epitaxy (ALE) apparatus for growing thin films of elemental semiconductors |
Jan. 25, 1994 |
| 5281295 |
Semiconductor fabrication equipment |
Jan. 25, 1994 |
| 5275709 |
Apparatus for coating substrates, preferably flat, more or less plate-like substrates |
Jan. 4, 1994 |
| 5273585 |
Heat-treating apparatus |
Dec. 28, 1993 |
| 5271963 |
Elimination of low temperature ammonia salt in TiCl.sub.4 NH.sub.3 CVD reaction |
Dec. 21, 1993 |
| 5272106 |
Method for the making of an optoelectronic device |
Dec. 21, 1993 |
| 5268033 |
Table top parylene deposition chamber |
Dec. 7, 1993 |
| 5268034 |
Fluid dispersion head for CVD appratus |
Dec. 7, 1993 |
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