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Class Information
Number: 118/719
Name: Coating apparatus > Gas or vapor deposition > Multizone chamber
Description: Apparatus wherein the coating apparatus is divided into a number of distinct areas wherein different aspects of the coating treatment can be performed.










Patents under this class:
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Patent Number Title Of Patent Date Issued
6024800 Plasma processing apparatus Feb. 15, 2000
6025266 Vacuum film formation method and device Feb. 15, 2000
6022415 Spherical article conveying atmosphere replacing device Feb. 8, 2000
6019850 Apparatus for making a semiconductor device in a continuous manner Feb. 1, 2000
6017395 Gas pressure regulation in vapor deposition Jan. 25, 2000
6017396 Plasma film forming apparatus that prevents substantial irradiation damage to the substrate Jan. 25, 2000
6015465 Temperature control system for semiconductor process chamber Jan. 18, 2000
6013134 Advance integrated chemical vapor deposition (AICVD) for semiconductor devices Jan. 11, 2000
6004397 TEOS-O.sub.3 oxidizing film depositing system and process for supplying ozone (O.sub.3) thereto Dec. 21, 1999
5993556 Vacuum treatment system for depositing thin coatings Nov. 30, 1999
5989346 Semiconductor processing apparatus Nov. 23, 1999
5979306 Heating pressure processing apparatus Nov. 9, 1999
5980684 Processing apparatus for substrates Nov. 9, 1999
5976259 Semiconductor device, manufacturing method, and system Nov. 2, 1999
5976260 Semiconductor producing apparatus, and wafer vacuum chucking device, gas cleaning method and nitride film forming method in semiconductor producing apparatus Nov. 2, 1999
5976261 Multi-zone gas injection apparatus and method for microelectronics manufacturing equipment Nov. 2, 1999
5972116 Method and apparatus for producing a semiconductor device Oct. 26, 1999
5972161 Dry etcher apparatus for preventing residual reaction gas from condensing on wafers after etching Oct. 26, 1999
5968274 Continuous forming method for functional deposited films and deposition apparatus Oct. 19, 1999
5961727 Sealing apparatus for vacuum treatment of support for light-sensitive material Oct. 5, 1999
5961798 System and method for vacuum coating of articles having precise and reproducible positioning of articles Oct. 5, 1999
5963753 Substrate processing apparatus Oct. 5, 1999
5957648 Factory automation apparatus and method for handling, moving and storing semiconductor wafer carriers Sep. 28, 1999
5958134 Process equipment with simultaneous or sequential deposition and etching capabilities Sep. 28, 1999
5958510 Method and apparatus for forming a thin polymer layer on an integrated circuit structure Sep. 28, 1999
5951770 Carousel wafer transfer system Sep. 14, 1999
5951835 Continuous vacuum processing apparatus Sep. 14, 1999
5944940 Wafer transfer system and method of using the same Aug. 31, 1999
5942038 Cooling element for a semiconductor fabrication chamber Aug. 24, 1999
5935336 Apparatus to increase gas residence time in a reactor Aug. 10, 1999
5935395 Substrate processing apparatus with non-evaporable getter pump Aug. 10, 1999
5932014 Apparatus for producing semiconductor device Aug. 3, 1999
5919310 Continuously film-forming apparatus provided with improved gas gate means Jul. 6, 1999
5913978 Apparatus and method for regulating pressure in two chambers Jun. 22, 1999
5911834 Gas delivery system Jun. 15, 1999
5909994 Vertical dual loadlock chamber Jun. 8, 1999
5910218 Systems for forming films having high dielectric constants Jun. 8, 1999
5910219 Can coating system Jun. 8, 1999
5908506 Continuous vapor deposition apparatus Jun. 1, 1999
5908507 Chemical vapor deposition reactor and method of producing oxide superconductive conductor using the same Jun. 1, 1999
5904958 Adjustable nozzle for evaporation or organic monomers May. 18, 1999
5902088 Single loadlock chamber with wafer cooling function May. 11, 1999
5900062 Lift pin for dechucking substrates May. 4, 1999
5900065 Apparatus for the plasma-chemical deposition of polycrystalline diamond May. 4, 1999
5900105 Wafer transfer system and method of using the same May. 4, 1999
5895594 Method and device for heating carrier bodies Apr. 20, 1999
5891251 CVD reactor having heated process chamber within isolation chamber Apr. 6, 1999
5888638 Sealing element, particularly for shut-off and regulating valves, and process for its production Mar. 30, 1999
5885355 Semiconductor fabrication apparatus with a handler Mar. 23, 1999
5885356 Method of reducing residue accumulation in CVD chamber using ceramic lining Mar. 23, 1999

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