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Class Information
Number: 118/719
Name: Coating apparatus > Gas or vapor deposition > Multizone chamber
Description: Apparatus wherein the coating apparatus is divided into a number of distinct areas wherein different aspects of the coating treatment can be performed.


Patents under this class:
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Patent Number Title Of Patent Date Issued
5433780 Vacuum processing apparatus and exhaust system that prevents particle contamination Jul. 18, 1995
5433785 Thermal treatment apparatus, semiconductor device fabrication apparatus, load-lock chamber Jul. 18, 1995
5433787 Apparatus for forming deposited film including light transmissive diffusion plate Jul. 18, 1995
5431735 Phosphorus effusion cell for molecular beam epitaxy Jul. 11, 1995
5429070 High density plasma deposition and etching apparatus Jul. 4, 1995
5425611 Substrate handling and processing system Jun. 20, 1995
5423914 Film depositing apparatus and process for preparing layered structure including oxide superconductor thin film Jun. 13, 1995
5423971 Arrangement for coating substrates Jun. 13, 1995
5424097 Continuous vapor deposition apparatus Jun. 13, 1995
5421889 Method and apparatus for inverting samples in a process Jun. 6, 1995
5421890 Apparatus for producing oxide thin film Jun. 6, 1995
5417537 Wafer transport device May. 23, 1995
5413663 Plasma processing apparatus May. 9, 1995
5413671 Apparatus and method for removing deposits from an APCVD system May. 9, 1995
5411592 Apparatus for deposition of thin-film, solid state batteries May. 2, 1995
5411593 Apparatus for servicing vacuum chamber using non-reactive gas filled maintenance enclosure May. 2, 1995
5409539 Slotted cantilever diffusion tube system with a temperature insulating baffle system and a distributed gas injector system Apr. 25, 1995
5409540 Chemical vapor phase growth method and chemical vapor phase growth apparatus Apr. 25, 1995
5407485 Apparatus for producing semiconductor device and method for producing semiconductor device Apr. 18, 1995
5404894 Conveyor apparatus Apr. 11, 1995
5405230 Load-lock unit and wafer transfer system Apr. 11, 1995
5405445 Vacuum extraction system for chemical vapor deposition reactor vessel and trapping device incorporated therein Apr. 11, 1995
5405446 Apparatus for heat processing a substrate Apr. 11, 1995
5401316 Method and apparatus for hydrophobic treatment Mar. 28, 1995
5399199 Apparatus for gas source molecular beam epitaxy Mar. 21, 1995
5397395 Method of continuously forming a large area functional deposited film by microwave PCVD and apparatus for the same Mar. 14, 1995
5397596 Method of reducing particulate contaminants in a chemical-vapor-deposition system Mar. 14, 1995
5395198 Vacuum loading chuck and fixture for flexible printed circuit panels Mar. 7, 1995
5388944 Vertical heat-treating apparatus and heat-treating process by using the vertical heat-treating apparatus Feb. 14, 1995
5387067 Direct load/unload semiconductor wafer cassette apparatus and transfer system Feb. 7, 1995
5383969 Process and apparatus for supplying zinc vapor continuously to a chemical vapor deposition process from a continuous supply of solid zinc Jan. 24, 1995
5383971 Differential pressure CVD chuck Jan. 24, 1995
5382126 Multichamber coating apparatus Jan. 17, 1995
5382419 Production of high-purity polycrystalline silicon rod for semiconductor applications Jan. 17, 1995
5378283 Treating device Jan. 3, 1995
5376212 Reduced-pressure processing apparatus Dec. 27, 1994
5374313 Magnetic roller gas gate employing transonic sweep gas flow to isolate regions of differing gaseous composition or pressure Dec. 20, 1994
5372646 Apparatus for making photovoltaic devices Dec. 13, 1994
5372647 Apparatus for forming thin film Dec. 13, 1994
5372648 Plasma CVD system Dec. 13, 1994
5372862 Coating technique for synchrotron beam tubes Dec. 13, 1994
5370736 Horizontal reactor hardware design Dec. 6, 1994
5368676 Plasma processing apparatus comprising electron supply chamber and high frequency electric field generation means Nov. 29, 1994
5366554 Device for forming a deposited film Nov. 22, 1994
5366555 Chemical vapor deposition under a single reactor vessel divided into separate reaction regions with its own depositing and exhausting means Nov. 22, 1994
5364219 Apparatus for clean transfer of objects Nov. 15, 1994
5364225 Method of printed circuit panel manufacture Nov. 15, 1994
5364481 Apparatus for manufacturing a thin-film photovoltaic conversion device Nov. 15, 1994
5355832 Polymerization reactor Oct. 18, 1994
5356474 Apparatus and method for making aligned Hi-Tc tape superconductors Oct. 18, 1994

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