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Class Information
Number: 118/719
Name: Coating apparatus > Gas or vapor deposition > Multizone chamber
Description: Apparatus wherein the coating apparatus is divided into a number of distinct areas wherein different aspects of the coating treatment can be performed.










Patents under this class:
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Patent Number Title Of Patent Date Issued
6132518 Nickel carbonyl vapour deposition apparatus and method Oct. 17, 2000
6129045 Apparatus and method for exchanging an atmosphere of spherical object Oct. 10, 2000
6123097 Apparatus and methods for controlling process chamber pressure Sep. 26, 2000
6120606 Gas vent system for a vacuum chamber Sep. 19, 2000
6120611 Apparatus and method for hermetically sealing a chamber Sep. 19, 2000
6120640 Boron carbide parts and coatings in a plasma reactor Sep. 19, 2000
6120641 Process architecture and manufacturing tool sets employing hard mask patterning for use in the manufacture of one or more metallization levels on a workpiece Sep. 19, 2000
6113701 Semiconductor device, manufacturing method, and system Sep. 5, 2000
6110540 Plasma apparatus and method Aug. 29, 2000
6110556 Lid assembly for a process chamber employing asymmetric flow geometries Aug. 29, 2000
6106634 Methods and apparatus for reducing particle contamination during wafer transport Aug. 22, 2000
6099598 Fabrication system and fabrication method Aug. 8, 2000
6099896 Method and apparatus for zone lubrication of magnetic media Aug. 8, 2000
6093252 Process chamber with inner support Jul. 25, 2000
6090176 Sample transferring method and sample transfer supporting apparatus Jul. 18, 2000
6090247 Apparatus for coating substrates Jul. 18, 2000
6085689 Apparatus to increase gas residence time in a reactor Jul. 11, 2000
6086676 Programmable electrical interlock system for a vacuum processing system Jul. 11, 2000
6083321 Fluid delivery system and method Jul. 4, 2000
6083566 Substrate handling and processing system and method Jul. 4, 2000
6079354 Thermal post-deposition treatment of halogen-doped films to improve film stability and reduce halogen migration to interconnect layers Jun. 27, 2000
6079928 Dual plate gas assisted heater module Jun. 27, 2000
6080679 High-speed soft evacuation process and system Jun. 27, 2000
6074486 Apparatus and method for manufacturing a semiconductor device having hemispherical grains Jun. 13, 2000
6071350 Semiconductor device manufacturing apparatus employing vacuum system Jun. 6, 2000
6071375 Gas purge protection of sensors and windows in a gas phase processing reactor Jun. 6, 2000
6068088 Releasable semiconductor wafer lifter basket May. 30, 2000
6068738 Method and apparatus for thin film coating an article May. 30, 2000
6066210 Substrate processing apparatus with a processing chamber, transfer chamber, intermediate holding chamber, and an atmospheric pressure section May. 23, 2000
6063201 Effusion cell assembly for epitaxial apparatus May. 16, 2000
6063248 Process chamber isolation system in a deposition apparatus May. 16, 2000
6056824 Free floating shield and semiconductor processing system May. 2, 2000
6056849 Apparatus for the surface treatment of workpieces by means of a plasma May. 2, 2000
6053688 Method and apparatus for loading and unloading wafers from a wafer carrier Apr. 25, 2000
6053980 Substrate processing apparatus Apr. 25, 2000
6054014 Exhaust apparatus Apr. 25, 2000
6054018 Outside chamber sealing roller system for surface treatment gas reactors Apr. 25, 2000
6051113 Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure using target indexing Apr. 18, 2000
6051276 Internally heated pyrolysis zone Apr. 18, 2000
6045620 Two-piece slit valve insert for vacuum processing system Apr. 4, 2000
6042652 Atomic layer deposition apparatus for depositing atomic layer on multiple substrates Mar. 28, 2000
6039770 Semiconductor device manufacturing system having means for reducing a pressure difference between loadlock and processing chambers Mar. 21, 2000
6039811 Apparatus for fabricating polysilicon film for semiconductor device Mar. 21, 2000
6039835 Etching apparatus and method of etching a substrate Mar. 21, 2000
6040585 Method for detecting wafer orientation during transport Mar. 21, 2000
6036780 Mechanism for detecting particulate formation and/or failures in the removal of gas from a liquid Mar. 14, 2000
6029476 Method and apparatus for manufacturing an optical fiber provided with a hermetic coating Feb. 29, 2000
6030458 Phosphorus effusion source Feb. 29, 2000
6030459 Low-pressure processing device Feb. 29, 2000
6027569 Gas injection systems for a LPCVD furnace Feb. 22, 2000

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