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Class Information
Number: 118/719
Name: Coating apparatus > Gas or vapor deposition > Multizone chamber
Description: Apparatus wherein the coating apparatus is divided into a number of distinct areas wherein different aspects of the coating treatment can be performed.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5527390 |
Treatment system including a plurality of treatment apparatus |
Jun. 18, 1996 |
| 5527391 |
Method and apparatus for continuously forming functional deposited films with a large area by a microwave plasma CVD method |
Jun. 18, 1996 |
| 5520741 |
Apparatus for producing a plasma polymer protective layer on workpieces, in particular headlamp reflectors |
May. 28, 1996 |
| 5518599 |
Cross flow metalizing of compact discs |
May. 21, 1996 |
| 5515986 |
Plasma treatment apparatus and method for operating same |
May. 14, 1996 |
| 5514217 |
Microwave plasma CVD apparatus with a deposition chamber having a circumferential wall comprising a curved moving substrate web and a microwave applicator means having a specific dielectric me |
May. 7, 1996 |
| 5512320 |
Vacuum processing apparatus having improved throughput |
Apr. 30, 1996 |
| 5510151 |
Continuous film-forming process using microwave energy in a moving substrate web functioning as a substrate and plasma generating space |
Apr. 23, 1996 |
| 5505778 |
Surface treating apparatus, surface treating method and semiconductor device manufacturing method |
Apr. 9, 1996 |
| 5505779 |
Integrated module multi-chamber CVD processing system and its method for processing substrates |
Apr. 9, 1996 |
| 5503675 |
Apparatus for applying a mask to and/or removing it from a substrate |
Apr. 2, 1996 |
| 5503676 |
Apparatus and method for magnetron in-situ cleaning of plasma reaction chamber |
Apr. 2, 1996 |
| 5501739 |
Apparatus and method for forming thin film |
Mar. 26, 1996 |
| 5498290 |
Confinement of secondary electrons in plasma ion processing |
Mar. 12, 1996 |
| 5494521 |
Apparatus and method for vapor growth |
Feb. 27, 1996 |
| 5494522 |
Plasma process system and method |
Feb. 27, 1996 |
| 5489369 |
Method and apparatus for thin film coating an article |
Feb. 6, 1996 |
| 5487784 |
Formation of tin oxide films on glass substrates |
Jan. 30, 1996 |
| 5484483 |
Thermal treatment apparatus |
Jan. 16, 1996 |
| 5484484 |
Thermal processing method and apparatus therefor |
Jan. 16, 1996 |
| 5482557 |
Device for forming deposited film |
Jan. 9, 1996 |
| 5482607 |
Film forming apparatus |
Jan. 9, 1996 |
| 5478396 |
Production of high-purity polycrystalline silicon rod for semiconductor applications |
Dec. 26, 1995 |
| 5478609 |
Substrate heating mechanism |
Dec. 26, 1995 |
| 5474410 |
Multi-chamber system provided with carrier units |
Dec. 12, 1995 |
| 5474611 |
Plasma vapor deposition apparatus |
Dec. 12, 1995 |
| 5474613 |
Chemical vapor deposition furnace and furnace apparatus |
Dec. 12, 1995 |
| 5474641 |
Processing method and apparatus thereof |
Dec. 12, 1995 |
| 5472506 |
Method and apparatus for producing magnetic recording medium |
Dec. 5, 1995 |
| 5472507 |
IC wiring connecting method and apparatus |
Dec. 5, 1995 |
| 5472509 |
Gas plasma apparatus with movable film liners |
Dec. 5, 1995 |
| 5470389 |
Apparatus for forming deposited film |
Nov. 28, 1995 |
| 5470390 |
Mixed gas supply system with a backup supply system |
Nov. 28, 1995 |
| 5470784 |
Method of forming semiconducting materials and barriers using a multiple chamber arrangement |
Nov. 28, 1995 |
| 5468111 |
Disc loading and unloading assembly |
Nov. 21, 1995 |
| 5468112 |
Wafer container and wafer aligning apparatus |
Nov. 21, 1995 |
| 5466296 |
Thin film deposition apparatus, mainly dedicated to PECVD and sputtering techniques and respective processes |
Nov. 14, 1995 |
| 5464475 |
Work-in-process storage pod |
Nov. 7, 1995 |
| 5464476 |
Plasma processing device comprising plural RF inductive coils |
Nov. 7, 1995 |
| 5462013 |
CVD apparatus and method for forming uniform coatings |
Oct. 31, 1995 |
| 5462397 |
Processing apparatus |
Oct. 31, 1995 |
| 5462603 |
Semiconductor processing apparatus |
Oct. 31, 1995 |
| 5447568 |
Chemical vapor deposition method and apparatus making use of liquid starting material |
Sep. 5, 1995 |
| 5445484 |
Vacuum processing system |
Aug. 29, 1995 |
| 5445675 |
Semiconductor processing apparatus |
Aug. 29, 1995 |
| 5445676 |
Method and apparatus for manufacturing semiconductor devices |
Aug. 29, 1995 |
| 5439522 |
Device for locking a flat, preferably discoid substrate onto the substrate plate of a vacuum coating apparatus |
Aug. 8, 1995 |
| 5439547 |
Semiconductor manufacturing apparatus with a spare vacuum chamber |
Aug. 8, 1995 |
| 5435682 |
Chemical vapor desposition system |
Jul. 25, 1995 |
| 5435683 |
Load-lock unit and wafer transfer system |
Jul. 25, 1995 |
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