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Class Information
Number: 118/719
Name: Coating apparatus > Gas or vapor deposition > Multizone chamber
Description: Apparatus wherein the coating apparatus is divided into a number of distinct areas wherein different aspects of the coating treatment can be performed.


Patents under this class:
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Patent Number Title Of Patent Date Issued
5766360 Substrate processing apparatus and substrate processing method Jun. 16, 1998
5766404 Methods and apparatus for plasma treatment of workpieces Jun. 16, 1998
5762745 Substrate processing apparatus Jun. 9, 1998
5764012 Two-axis magnetically coupled robot Jun. 9, 1998
5759214 Nitrogen gas supply system Jun. 2, 1998
5759268 System for providing a controlled deposition on wafers Jun. 2, 1998
5759334 Plasma processing apparatus Jun. 2, 1998
5755888 Method and apparatus of forming thin films May. 26, 1998
5755938 Single chamber for CVD and sputtering film manufacturing May. 26, 1998
5753092 Cylindrical carriage sputtering system May. 19, 1998
5753320 Process for forming deposited film May. 19, 1998
5750436 Thermal processing method and apparatus therefor May. 12, 1998
5747099 Two chamber reaction furnace May. 5, 1998
5747780 Apparatus for conveying and processing a wafer in a physically contact-free state May. 5, 1998
5738771 Thin film forming apparatus Apr. 14, 1998
5736431 Method for producing thin film solar battery Apr. 7, 1998
5735960 Apparatus and method to increase gas residence time in a reactor Apr. 7, 1998
5735961 Semiconductor fabricating apparatus, method for controlling oxygen concentration within load-lock chamber and method for generating native oxide Apr. 7, 1998
5730801 Compartnetalized substrate processing chamber Mar. 24, 1998
5730802 Vapor growth apparatus and vapor growth method capable of growing good productivity Mar. 24, 1998
5730847 Arc ion plating device and arc ion plating system Mar. 24, 1998
5720821 Jet vapor deposition of organic molecule guest-inorganic host thin films Feb. 24, 1998
5714008 Molecular beam epitaxy source cell Feb. 3, 1998
5711811 Method and equipment for growing thin films Jan. 27, 1998
5711813 Epitaxial crystal growth apparatus Jan. 27, 1998
5709753 Parylene deposition apparatus including a heated and cooled dimer crucible Jan. 20, 1998
5709785 Metallizing machine Jan. 20, 1998
5707500 Vacuum processing equipment, film coating equipment and deposition method Jan. 13, 1998
5704980 Method of and apparatus for making plastic film with barrier layers Jan. 6, 1998
5700127 Substrate processing method and substrate processing apparatus Dec. 23, 1997
5697749 Wafer processing apparatus Dec. 16, 1997
5695564 Semiconductor processing system Dec. 9, 1997
5688359 Muffle etch injector assembly Nov. 18, 1997
5688389 Method and apparatus for thin film coating an article Nov. 18, 1997
5685684 Vacuum processing system Nov. 11, 1997
5685912 Pressure control system for semiconductor manufacturing equipment Nov. 11, 1997
5685963 In situ getter pump system and method Nov. 11, 1997
5679165 Apparatus for manufacturing semiconductor device Oct. 21, 1997
5679166 Magnetic recording media, magnetic recording media fabrication method, and fabrication equipment Oct. 21, 1997
5674574 Vapor delivery system for solid precursors and method regarding same Oct. 7, 1997
5674368 Film forming apparatus Oct. 7, 1997
5667592 Process chamber sleeve with ring seals for isolating individual process modules in a common cluster Sep. 16, 1997
5662785 Method for masking a workpiece and a vacuum treatment facility Sep. 2, 1997
5656902 Two-axis magnetically coupled robot Aug. 12, 1997
5651867 Plasma processing method and apparatus Jul. 29, 1997
5651868 Method and apparatus for coating thin film data storage disks Jul. 29, 1997
5647912 Plasma processing apparatus Jul. 15, 1997
5637180 Plasma processing method and plasma generator Jun. 10, 1997
5630879 Method and apparatus for the partial coating of sets of structural components May. 20, 1997
5630880 Method and apparatus for a large volume plasma processor that can utilize any feedstock material May. 20, 1997

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