| |
 |
|
Class Information
Number: 118/719
Name: Coating apparatus > Gas or vapor deposition > Multizone chamber
Description: Apparatus wherein the coating apparatus is divided into a number of distinct areas wherein different aspects of the coating treatment can be performed.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5882415 |
Electron-beam continuous process vaporization installation for thermally high stressed substrata |
Mar. 16, 1999 |
| 5879460 |
System for providing a controlled deposition on wafers |
Mar. 9, 1999 |
| 5879461 |
Metered gas control in a substrate processing apparatus |
Mar. 9, 1999 |
| 5879519 |
Geometries and configurations for magnetron sputtering apparatus |
Mar. 9, 1999 |
| 5873942 |
Apparatus and method for low pressure chemical vapor deposition using multiple chambers and vacuum pumps |
Feb. 23, 1999 |
| 5871587 |
Processing system for semiconductor device manufacture of otherwise |
Feb. 16, 1999 |
| 5871806 |
Heat-treating process |
Feb. 16, 1999 |
| 5868847 |
Clamp ring for shielding a substrate during film layer deposition |
Feb. 9, 1999 |
| 5865932 |
Sealing method and apparatus for vacuum treatment of support for light-sensitive material |
Feb. 2, 1999 |
| 5863336 |
Apparatus for fabrication of superconductor |
Jan. 26, 1999 |
| 5863338 |
Apparatus and method for forming thin film |
Jan. 26, 1999 |
| 5858100 |
Substrate holder and reaction apparatus |
Jan. 12, 1999 |
| 5858101 |
System providing a controlled deposition of wafers |
Jan. 12, 1999 |
| 5858102 |
Apparatus of chemical vapor for producing layer variation by planetary susceptor rotation |
Jan. 12, 1999 |
| 5855675 |
Multipurpose processing chamber for chemical vapor deposition processes |
Jan. 5, 1999 |
| 5855679 |
Semiconductor manufacturing apparatus |
Jan. 5, 1999 |
| 5855680 |
Apparatus for growing thin films |
Jan. 5, 1999 |
| 5855681 |
Ultra high throughput wafer vacuum processing system |
Jan. 5, 1999 |
| 5855687 |
Substrate support shield in wafer processing reactors |
Jan. 5, 1999 |
| 5855726 |
Vacuum processing apparatus and semiconductor manufacturing line using the same |
Jan. 5, 1999 |
| 5853486 |
Treatment system and treatment apparatus with multi-stage carrier storage chambers |
Dec. 29, 1998 |
| 5851296 |
Vacuum processing apparatus and method |
Dec. 22, 1998 |
| 5851299 |
Passive shield for CVD wafer processing which provides frontside edge exclusion and prevents backside depositions |
Dec. 22, 1998 |
| 5851600 |
Plasma process method and apparatus |
Dec. 22, 1998 |
| 5849087 |
Vacuum treatment system for applying thin layers to substrates such as headlights reflectors |
Dec. 15, 1998 |
| 5849088 |
Free floating shield |
Dec. 15, 1998 |
| 5846328 |
In-line film deposition system |
Dec. 8, 1998 |
| 5833754 |
Deposition apparatus for growing a material with reduced hazard |
Nov. 10, 1998 |
| 5830272 |
System for and method of providing a controlled deposition on wafers |
Nov. 3, 1998 |
| 5820679 |
Fabrication system and method having inter-apparatus transporter |
Oct. 13, 1998 |
| 5817366 |
Method for manufacturing organic electroluminescent element and apparatus therefor |
Oct. 6, 1998 |
| 5814153 |
Semiconductor device manufacturing apparatus |
Sep. 29, 1998 |
| 5814154 |
Short-coupled-path extender for plasma source |
Sep. 29, 1998 |
| 5810537 |
Isolation chamber transfer apparatus |
Sep. 22, 1998 |
| 5810929 |
Pyrogenic wet thermal oxidation of semiconductor wafers |
Sep. 22, 1998 |
| 5810930 |
Photo-chemical vapor deposition apparatus having exchange apparatus of optical window and method of exchanging optical window therewith |
Sep. 22, 1998 |
| 5807614 |
Method and device for forming an excited gaseous atmosphere lacking electrically charged species used for treating nonmetallic substrates |
Sep. 15, 1998 |
| 5807615 |
Method and device for forming an excited gaseous treatment atmosphere lacking electrically charged species used for treating metallic substrates |
Sep. 15, 1998 |
| 5803973 |
Apparatus for coating a substrate by chemical vapor deposition |
Sep. 8, 1998 |
| 5800616 |
Vertical LPCVD furnace with reversible manifold collar and method of retrofitting same |
Sep. 1, 1998 |
| 5795399 |
Semiconductor device manufacturing apparatus, method for removing reaction product, and method of suppressing deposition of reaction product |
Aug. 18, 1998 |
| 5792271 |
System for supplying high-pressure medium gas |
Aug. 11, 1998 |
| 5785762 |
External combustion oxidation apparatus |
Jul. 28, 1998 |
| 5785796 |
Vacuum processing apparatus, vacuum processing method, and method for cleaning the vacuum processing apparatus |
Jul. 28, 1998 |
| 5780313 |
Method of fabricating semiconductor device |
Jul. 14, 1998 |
| 5772770 |
Substrate processing apparatus |
Jun. 30, 1998 |
| 5773088 |
Treatment system including vacuum isolated sources and method |
Jun. 30, 1998 |
| 5769588 |
Dual cassette load lock |
Jun. 23, 1998 |
| 5769952 |
Reduced pressure and normal pressure treatment apparatus |
Jun. 23, 1998 |
| 5766360 |
Substrate processing apparatus and substrate processing method |
Jun. 16, 1998 |
|
|
|
