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Class Information
Number: 118/719
Name: Coating apparatus > Gas or vapor deposition > Multizone chamber
Description: Apparatus wherein the coating apparatus is divided into a number of distinct areas wherein different aspects of the coating treatment can be performed.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6017395 |
Gas pressure regulation in vapor deposition |
Jan. 25, 2000 |
| 6017396 |
Plasma film forming apparatus that prevents substantial irradiation damage to the substrate |
Jan. 25, 2000 |
| 6015465 |
Temperature control system for semiconductor process chamber |
Jan. 18, 2000 |
| 6013134 |
Advance integrated chemical vapor deposition (AICVD) for semiconductor devices |
Jan. 11, 2000 |
| 6004397 |
TEOS-O.sub.3 oxidizing film depositing system and process for supplying ozone (O.sub.3) thereto |
Dec. 21, 1999 |
| 5993556 |
Vacuum treatment system for depositing thin coatings |
Nov. 30, 1999 |
| 5989346 |
Semiconductor processing apparatus |
Nov. 23, 1999 |
| 5979306 |
Heating pressure processing apparatus |
Nov. 9, 1999 |
| 5980684 |
Processing apparatus for substrates |
Nov. 9, 1999 |
| 5976259 |
Semiconductor device, manufacturing method, and system |
Nov. 2, 1999 |
| 5976260 |
Semiconductor producing apparatus, and wafer vacuum chucking device, gas cleaning method and nitride film forming method in semiconductor producing apparatus |
Nov. 2, 1999 |
| 5976261 |
Multi-zone gas injection apparatus and method for microelectronics manufacturing equipment |
Nov. 2, 1999 |
| 5972116 |
Method and apparatus for producing a semiconductor device |
Oct. 26, 1999 |
| 5972161 |
Dry etcher apparatus for preventing residual reaction gas from condensing on wafers after etching |
Oct. 26, 1999 |
| 5968274 |
Continuous forming method for functional deposited films and deposition apparatus |
Oct. 19, 1999 |
| 5961727 |
Sealing apparatus for vacuum treatment of support for light-sensitive material |
Oct. 5, 1999 |
| 5961798 |
System and method for vacuum coating of articles having precise and reproducible positioning of articles |
Oct. 5, 1999 |
| 5963753 |
Substrate processing apparatus |
Oct. 5, 1999 |
| 5957648 |
Factory automation apparatus and method for handling, moving and storing semiconductor wafer carriers |
Sep. 28, 1999 |
| 5958134 |
Process equipment with simultaneous or sequential deposition and etching capabilities |
Sep. 28, 1999 |
| 5958510 |
Method and apparatus for forming a thin polymer layer on an integrated circuit structure |
Sep. 28, 1999 |
| 5951770 |
Carousel wafer transfer system |
Sep. 14, 1999 |
| 5951835 |
Continuous vacuum processing apparatus |
Sep. 14, 1999 |
| 5944940 |
Wafer transfer system and method of using the same |
Aug. 31, 1999 |
| 5942038 |
Cooling element for a semiconductor fabrication chamber |
Aug. 24, 1999 |
| 5935336 |
Apparatus to increase gas residence time in a reactor |
Aug. 10, 1999 |
| 5935395 |
Substrate processing apparatus with non-evaporable getter pump |
Aug. 10, 1999 |
| 5932014 |
Apparatus for producing semiconductor device |
Aug. 3, 1999 |
| 5919310 |
Continuously film-forming apparatus provided with improved gas gate means |
Jul. 6, 1999 |
| 5913978 |
Apparatus and method for regulating pressure in two chambers |
Jun. 22, 1999 |
| 5911834 |
Gas delivery system |
Jun. 15, 1999 |
| 5909994 |
Vertical dual loadlock chamber |
Jun. 8, 1999 |
| 5910218 |
Systems for forming films having high dielectric constants |
Jun. 8, 1999 |
| 5910219 |
Can coating system |
Jun. 8, 1999 |
| 5908506 |
Continuous vapor deposition apparatus |
Jun. 1, 1999 |
| 5908507 |
Chemical vapor deposition reactor and method of producing oxide superconductive conductor using the same |
Jun. 1, 1999 |
| 5904958 |
Adjustable nozzle for evaporation or organic monomers |
May. 18, 1999 |
| 5902088 |
Single loadlock chamber with wafer cooling function |
May. 11, 1999 |
| 5900062 |
Lift pin for dechucking substrates |
May. 4, 1999 |
| 5900065 |
Apparatus for the plasma-chemical deposition of polycrystalline diamond |
May. 4, 1999 |
| 5900105 |
Wafer transfer system and method of using the same |
May. 4, 1999 |
| 5895594 |
Method and device for heating carrier bodies |
Apr. 20, 1999 |
| 5891251 |
CVD reactor having heated process chamber within isolation chamber |
Apr. 6, 1999 |
| 5888638 |
Sealing element, particularly for shut-off and regulating valves, and process for its production |
Mar. 30, 1999 |
| 5885355 |
Semiconductor fabrication apparatus with a handler |
Mar. 23, 1999 |
| 5885356 |
Method of reducing residue accumulation in CVD chamber using ceramic lining |
Mar. 23, 1999 |
| 5881668 |
System for providing a controlled deposition on wafers |
Mar. 16, 1999 |
| 5882165 |
Multiple chamber integrated process system |
Mar. 16, 1999 |
| 5882412 |
Vertical two chamber reaction furnace |
Mar. 16, 1999 |
| 5882413 |
Substrate processing apparatus having a substrate transport with a front end extension and an internal substrate buffer |
Mar. 16, 1999 |
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