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Class Information
Number: 118/719
Name: Coating apparatus > Gas or vapor deposition > Multizone chamber
Description: Apparatus wherein the coating apparatus is divided into a number of distinct areas wherein different aspects of the coating treatment can be performed.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6120611 |
Apparatus and method for hermetically sealing a chamber |
Sep. 19, 2000 |
| 6120640 |
Boron carbide parts and coatings in a plasma reactor |
Sep. 19, 2000 |
| 6120641 |
Process architecture and manufacturing tool sets employing hard mask patterning for use in the manufacture of one or more metallization levels on a workpiece |
Sep. 19, 2000 |
| 6113701 |
Semiconductor device, manufacturing method, and system |
Sep. 5, 2000 |
| 6110540 |
Plasma apparatus and method |
Aug. 29, 2000 |
| 6110556 |
Lid assembly for a process chamber employing asymmetric flow geometries |
Aug. 29, 2000 |
| 6106634 |
Methods and apparatus for reducing particle contamination during wafer transport |
Aug. 22, 2000 |
| 6099598 |
Fabrication system and fabrication method |
Aug. 8, 2000 |
| 6099896 |
Method and apparatus for zone lubrication of magnetic media |
Aug. 8, 2000 |
| 6093252 |
Process chamber with inner support |
Jul. 25, 2000 |
| 6090176 |
Sample transferring method and sample transfer supporting apparatus |
Jul. 18, 2000 |
| 6090247 |
Apparatus for coating substrates |
Jul. 18, 2000 |
| 6085689 |
Apparatus to increase gas residence time in a reactor |
Jul. 11, 2000 |
| 6086676 |
Programmable electrical interlock system for a vacuum processing system |
Jul. 11, 2000 |
| 6083321 |
Fluid delivery system and method |
Jul. 4, 2000 |
| 6083566 |
Substrate handling and processing system and method |
Jul. 4, 2000 |
| 6079354 |
Thermal post-deposition treatment of halogen-doped films to improve film stability and reduce halogen migration to interconnect layers |
Jun. 27, 2000 |
| 6079928 |
Dual plate gas assisted heater module |
Jun. 27, 2000 |
| 6080679 |
High-speed soft evacuation process and system |
Jun. 27, 2000 |
| 6074486 |
Apparatus and method for manufacturing a semiconductor device having hemispherical grains |
Jun. 13, 2000 |
| 6071350 |
Semiconductor device manufacturing apparatus employing vacuum system |
Jun. 6, 2000 |
| 6071375 |
Gas purge protection of sensors and windows in a gas phase processing reactor |
Jun. 6, 2000 |
| 6068088 |
Releasable semiconductor wafer lifter basket |
May. 30, 2000 |
| 6068738 |
Method and apparatus for thin film coating an article |
May. 30, 2000 |
| 6066210 |
Substrate processing apparatus with a processing chamber, transfer chamber, intermediate holding chamber, and an atmospheric pressure section |
May. 23, 2000 |
| 6063201 |
Effusion cell assembly for epitaxial apparatus |
May. 16, 2000 |
| 6063248 |
Process chamber isolation system in a deposition apparatus |
May. 16, 2000 |
| 6056824 |
Free floating shield and semiconductor processing system |
May. 2, 2000 |
| 6056849 |
Apparatus for the surface treatment of workpieces by means of a plasma |
May. 2, 2000 |
| 6053688 |
Method and apparatus for loading and unloading wafers from a wafer carrier |
Apr. 25, 2000 |
| 6053980 |
Substrate processing apparatus |
Apr. 25, 2000 |
| 6054014 |
Exhaust apparatus |
Apr. 25, 2000 |
| 6054018 |
Outside chamber sealing roller system for surface treatment gas reactors |
Apr. 25, 2000 |
| 6051113 |
Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure using target indexing |
Apr. 18, 2000 |
| 6051276 |
Internally heated pyrolysis zone |
Apr. 18, 2000 |
| 6045620 |
Two-piece slit valve insert for vacuum processing system |
Apr. 4, 2000 |
| 6042652 |
Atomic layer deposition apparatus for depositing atomic layer on multiple substrates |
Mar. 28, 2000 |
| 6039770 |
Semiconductor device manufacturing system having means for reducing a pressure difference between loadlock and processing chambers |
Mar. 21, 2000 |
| 6039811 |
Apparatus for fabricating polysilicon film for semiconductor device |
Mar. 21, 2000 |
| 6039835 |
Etching apparatus and method of etching a substrate |
Mar. 21, 2000 |
| 6040585 |
Method for detecting wafer orientation during transport |
Mar. 21, 2000 |
| 6036780 |
Mechanism for detecting particulate formation and/or failures in the removal of gas from a liquid |
Mar. 14, 2000 |
| 6029476 |
Method and apparatus for manufacturing an optical fiber provided with a hermetic coating |
Feb. 29, 2000 |
| 6030458 |
Phosphorus effusion source |
Feb. 29, 2000 |
| 6030459 |
Low-pressure processing device |
Feb. 29, 2000 |
| 6027569 |
Gas injection systems for a LPCVD furnace |
Feb. 22, 2000 |
| 6024800 |
Plasma processing apparatus |
Feb. 15, 2000 |
| 6025266 |
Vacuum film formation method and device |
Feb. 15, 2000 |
| 6022415 |
Spherical article conveying atmosphere replacing device |
Feb. 8, 2000 |
| 6019850 |
Apparatus for making a semiconductor device in a continuous manner |
Feb. 1, 2000 |
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