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Class Information
Number: 118/719
Name: Coating apparatus > Gas or vapor deposition > Multizone chamber
Description: Apparatus wherein the coating apparatus is divided into a number of distinct areas wherein different aspects of the coating treatment can be performed.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6218212 |
Apparatus for growing mixed compound semiconductor and growth method using the same |
Apr. 17, 2001 |
| 6217663 |
Substrate processing apparatus and substrate processing method |
Apr. 17, 2001 |
| 6214119 |
Vacuum substrate processing system having multiple processing chambers and a central load/unload chamber |
Apr. 10, 2001 |
| 6214120 |
High throughput multi-vacuum chamber system for processing wafers and method of processing wafers using the same |
Apr. 10, 2001 |
| 6206969 |
Method and apparatus for fabricating semiconductor |
Mar. 27, 2001 |
| 6206970 |
Semiconductor wafer processor, semiconductor processor gas filtering system and semiconductor processing methods |
Mar. 27, 2001 |
| 6206971 |
Integrated temperature controlled exhaust and cold trap assembly |
Mar. 27, 2001 |
| 6206974 |
Substrate processing system, interface apparatus, and substrate transportation method |
Mar. 27, 2001 |
| 6206975 |
Vacuum treatment system for application of thin, hard layers |
Mar. 27, 2001 |
| 6207005 |
Cluster tool apparatus using plasma immersion ion implantation |
Mar. 27, 2001 |
| 6203619 |
Multiple station apparatus for liquid source fabrication of thin films |
Mar. 20, 2001 |
| 6200441 |
Multiple station vacuum deposition apparatus for texturing a substrate using a scanning beam |
Mar. 13, 2001 |
| 6201999 |
Method and apparatus for automatically generating schedules for wafer processing within a multichamber semiconductor wafer processing tool |
Mar. 13, 2001 |
| 6196154 |
Air lock for introducing substrates to and/or removing them from a treatment chamber |
Mar. 6, 2001 |
| 6190113 |
Quartz pin lift for single wafer chemical vapor deposition/etch process chamber |
Feb. 20, 2001 |
| 6192291 |
Method of controlling semiconductor fabricating equipment to process wafers of a single lot individually |
Feb. 20, 2001 |
| 6186090 |
Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor |
Feb. 13, 2001 |
| 6186092 |
Apparatus and method for aligning and controlling edge deposition on a substrate |
Feb. 13, 2001 |
| 6186722 |
Chamber apparatus for processing semiconductor devices |
Feb. 13, 2001 |
| 6187099 |
Installation for the treatment of objects in a defined gas atmosphere, whose O2 content is smaller that that of air and with which environmentally damaging treatment gases are produced |
Feb. 13, 2001 |
| 6183183 |
Dual arm linear hand-off wafer transfer assembly |
Feb. 6, 2001 |
| 6183564 |
Buffer chamber for integrating physical and chemical vapor deposition chambers together in a processing system |
Feb. 6, 2001 |
| 6179923 |
Deposition apparatus for an organic thin-film light-emitting element |
Jan. 30, 2001 |
| 6176929 |
Thin-film deposition apparatus |
Jan. 23, 2001 |
| 6176932 |
Thin film deposition apparatus |
Jan. 23, 2001 |
| 6176968 |
Method and apparatus for producing semiconductor laser device |
Jan. 23, 2001 |
| 6176987 |
System for and method of providing a controlled deposition of wafers |
Jan. 23, 2001 |
| 6177129 |
Process for handling workpieces and apparatus therefor |
Jan. 23, 2001 |
| 6174366 |
Apparatus and method for processing of semiconductors, such as silicon chips |
Jan. 16, 2001 |
| 6174373 |
Non-plasma halogenated gas flow prevent metal residues |
Jan. 16, 2001 |
| 6174374 |
Method for annealing a semiconductor |
Jan. 16, 2001 |
| 6174377 |
Processing chamber for atomic layer deposition processes |
Jan. 16, 2001 |
| 6168667 |
Resist-processing apparatus |
Jan. 2, 2001 |
| 6168669 |
Substrate holding apparatus and substrate process system |
Jan. 2, 2001 |
| 6161311 |
System and method for reducing particles in epitaxial reactors |
Dec. 19, 2000 |
| 6162299 |
Multi-position load lock chamber |
Dec. 19, 2000 |
| 6156124 |
Wafer transfer station for a chemical mechanical polisher |
Dec. 5, 2000 |
| 6156657 |
Method of treating active material |
Dec. 5, 2000 |
| 6152070 |
Tandem process chamber |
Nov. 28, 2000 |
| 6153013 |
Deposited-film-forming apparatus |
Nov. 28, 2000 |
| 6153260 |
Method for heating exhaust gas in a substrate reactor |
Nov. 28, 2000 |
| 6148761 |
Dual channel gas distribution plate |
Nov. 21, 2000 |
| 6149379 |
Wafer transfer method using a serial number detecting device in semiconductor fabricating equipment |
Nov. 21, 2000 |
| 6149730 |
Apparatus for forming films of a semiconductor device, a method of manufacturing a semiconductor device, and a method of forming thin films of a semiconductor |
Nov. 21, 2000 |
| 6147033 |
Apparatus and method for forming a film on a tape substrate |
Nov. 14, 2000 |
| 6143040 |
Substrate processing apparatus and maintenance method therefor |
Nov. 7, 2000 |
| 6143081 |
Film forming apparatus and method, and film modifying apparatus and method |
Nov. 7, 2000 |
| 6143082 |
Isolation of incompatible processes in a multi-station processing chamber |
Nov. 7, 2000 |
| 6143083 |
Substrate transferring mechanism |
Nov. 7, 2000 |
| 6143126 |
Process and manufacturing tool architecture for use in the manufacture of one or more metallization levels on an integrated circuit |
Nov. 7, 2000 |
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