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Class Information
Number: 118/719
Name: Coating apparatus > Gas or vapor deposition > Multizone chamber
Description: Apparatus wherein the coating apparatus is divided into a number of distinct areas wherein different aspects of the coating treatment can be performed.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6273955 |
Film forming apparatus |
Aug. 14, 2001 |
| 6273956 |
Synchronous multiplexed near zero overhead architecture for vacuum processes |
Aug. 14, 2001 |
| 6273991 |
Apparatus for plasma ion trimming of frequency devices |
Aug. 14, 2001 |
| 6274196 |
Apparatus and method for exchanging an atmosphere of spherical object |
Aug. 14, 2001 |
| 6270581 |
Wet-oxidation apparatus and wet-oxidation method |
Aug. 7, 2001 |
| 6270582 |
Single wafer load lock chamber for pre-processing and post-processing wafers in a vacuum processing system |
Aug. 7, 2001 |
| 6270619 |
Treatment device, laser annealing device, manufacturing apparatus, and manufacturing apparatus for flat display device |
Aug. 7, 2001 |
| 6270861 |
Individually controlled environments for pulsed addition and crystallization |
Aug. 7, 2001 |
| 6267075 |
Apparatus for cleaning items using gas plasma |
Jul. 31, 2001 |
| 6267820 |
Clog resistant injection valve |
Jul. 31, 2001 |
| 6264748 |
Substrate processing apparatus |
Jul. 24, 2001 |
| 6258169 |
Control apparatus and control method |
Jul. 10, 2001 |
| 6258173 |
Film forming apparatus for forming a crystalline silicon film |
Jul. 10, 2001 |
| 6251191 |
Processing apparatus and processing system |
Jun. 26, 2001 |
| 6251192 |
Vacuum exhaust system |
Jun. 26, 2001 |
| 6244812 |
Low profile automated pod door removal system |
Jun. 12, 2001 |
| 6245149 |
Inert barrier for high purity epitaxial deposition systems |
Jun. 12, 2001 |
| 6245152 |
Method and apparatus for producing epitaxial wafer |
Jun. 12, 2001 |
| 6241824 |
Apparatus for the coating of substrates in a vacuum chamber |
Jun. 5, 2001 |
| 6241858 |
Methods and apparatus for producing enhanced interference pigments |
Jun. 5, 2001 |
| 6238485 |
Optical transmission systems and apparatuses including bragg gratings and methods of making |
May. 29, 2001 |
| 6238739 |
Non-plasma CVD method and apparatus of forming Ti1-xA1xN coatings |
May. 29, 2001 |
| 6239859 |
Photolithographic apparatus composed of coater/developer and a plurality of steppers in parallel connected thereto |
May. 29, 2001 |
| 6234107 |
Auxiliary vacuum chamber and vacuum processing unit using same |
May. 22, 2001 |
| 6234788 |
Disk furnace for thermal processing |
May. 22, 2001 |
| 6235171 |
Vacuum film forming/processing apparatus and method |
May. 22, 2001 |
| 6235172 |
System for and method of providing a controlled deposition on wafers |
May. 22, 2001 |
| 6235634 |
Modular substrate processing system |
May. 22, 2001 |
| 6230719 |
Apparatus for removing contaminants on electronic devices |
May. 15, 2001 |
| 6231289 |
Dual plate gas assisted heater module |
May. 15, 2001 |
| 6231732 |
Cylindrical carriage sputtering system |
May. 15, 2001 |
| 6228173 |
Single-substrate-heat-treating apparatus for semiconductor process system |
May. 8, 2001 |
| 6228439 |
Thin film deposition apparatus |
May. 8, 2001 |
| 6228773 |
Synchronous multiplexed near zero overhead architecture for vacuum processes |
May. 8, 2001 |
| 6223683 |
Hollow plastic containers with an external very thin coating of low permeability to gases and vapors through plasma-assisted deposition of inorganic substances and method and system for making |
May. 1, 2001 |
| 6224679 |
Controlling gas in a multichamber processing system |
May. 1, 2001 |
| 6224680 |
Wafer transfer system |
May. 1, 2001 |
| 6221155 |
Chemical vapor deposition system for polycrystalline silicon rod production |
Apr. 24, 2001 |
| 6221164 |
Method of in-situ cleaning for LPCVD teos pump |
Apr. 24, 2001 |
| 6221165 |
High temperature plasma-assisted diffusion |
Apr. 24, 2001 |
| 6221791 |
Apparatus and method for oxidizing silicon substrates |
Apr. 24, 2001 |
| 6218212 |
Apparatus for growing mixed compound semiconductor and growth method using the same |
Apr. 17, 2001 |
| 6217663 |
Substrate processing apparatus and substrate processing method |
Apr. 17, 2001 |
| 6214119 |
Vacuum substrate processing system having multiple processing chambers and a central load/unload chamber |
Apr. 10, 2001 |
| 6214120 |
High throughput multi-vacuum chamber system for processing wafers and method of processing wafers using the same |
Apr. 10, 2001 |
| 6206969 |
Method and apparatus for fabricating semiconductor |
Mar. 27, 2001 |
| 6206970 |
Semiconductor wafer processor, semiconductor processor gas filtering system and semiconductor processing methods |
Mar. 27, 2001 |
| 6206971 |
Integrated temperature controlled exhaust and cold trap assembly |
Mar. 27, 2001 |
| 6206974 |
Substrate processing system, interface apparatus, and substrate transportation method |
Mar. 27, 2001 |
| 6206975 |
Vacuum treatment system for application of thin, hard layers |
Mar. 27, 2001 |
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