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Class Information
Number: 118/715
Name: Coating apparatus > Gas or vapor deposition
Description: Apparatus wherein a coating material which is in the form of either the third state of matter, i.e., gaseous, or the transition between the second and third states of matter, i.e., vaporous, is condensed upon and forms a deposit of a base.

Sub-classes under this class:

Class Number Class Name Patents
118/733 Chamber seal 445
118/726 Crucible or evaporator structure 988
118/720 Having means to expose a portion of a substrate to coating medium 378
118/716 Means to coat or impregnate particulate matter 141
118/719 Multizone chamber 1,615
118/717 Object embedded in particulate mass 23
118/718 Running length work 513
118/722 With treating means (e.g., jarring) 258
118/728 Work support 1,684

Patents under this class:

Patent Number Title Of Patent Date Issued
8711338 Apparatus for counting particles in a gas Apr. 29, 2014
8710507 Semiconductor thin film, thin film transistor, method for manufacturing same, and manufacturing equipment of semiconductor thin film Apr. 29, 2014
8703248 Polycrystalline silicon reactor Apr. 22, 2014
8703188 Dispersible tablet Apr. 22, 2014
8702867 Gas distribution plate and substrate treating apparatus including the same Apr. 22, 2014
8702866 Showerhead electrode assembly with gas flow modification for extended electrode life Apr. 22, 2014
8692166 Substrate heating device and substrate heating method Apr. 8, 2014
8691063 Methods and apparatus for forming diamond-like coatings Apr. 8, 2014
8691015 Method and system for binding halide-based contaminants Apr. 8, 2014
8685855 Tray for CVD and method for forming film using same Apr. 1, 2014
8679956 Multiple precursor showerhead with by-pass ports Mar. 25, 2014
8679288 Showerhead electrode assemblies for plasma processing apparatuses Mar. 25, 2014
8679287 Method and apparatus for preventing ALD reactants from damaging vacuum pumps Mar. 25, 2014
8679255 Gas supply device, substrate processing apparatus and substrate processing method Mar. 25, 2014
8679254 Vapor phase epitaxy apparatus of group III nitride semiconductor Mar. 25, 2014
8679253 Deposition apparatus and method for depositing film Mar. 25, 2014
8679252 Actively heated aluminum baffle component having improved particle performance and methods of use and manufacture thereof Mar. 25, 2014
8674607 Plasma processing apparatus and processing gas supply structure thereof Mar. 18, 2014
8673394 Deposition method and apparatus Mar. 18, 2014
8673188 Carbon-carbon parts and methods for making same Mar. 18, 2014
8673080 Temperature controlled showerhead Mar. 18, 2014
8673076 Substrate processing apparatus and semiconductor device producing method Mar. 18, 2014
8671882 Plasma processing apparatus Mar. 18, 2014
8668815 Process kit for RF physical vapor deposition Mar. 11, 2014
8668776 Gas delivery apparatus and method for atomic layer deposition Mar. 11, 2014
8668775 Machine CVD shower head Mar. 11, 2014
8667928 Semiconductor processing Mar. 11, 2014
8664560 Method and apparatus for abatement of reaction products from a vacuum processing chamber Mar. 4, 2014
8663437 Deposition apparatus and electronic device manufacturing method Mar. 4, 2014
8663424 Plasma processing apparatus and gas supply member support device Mar. 4, 2014
8663389 Method and apparatus for crystal growth using a membrane-assisted semi-closed reactor Mar. 4, 2014
8662886 System for improved pressure control in horizontal diffusion furnace scavenger system for controlling oxide growth Mar. 4, 2014
8657958 CVD-Siemens monosilane reactor process with complete utilization of feed gases and total recycle Feb. 25, 2014
8656860 High efficiency epitaxial chemical vapor deposition (CVD) reactor Feb. 25, 2014
8656859 Mask and mask assembly having the same Feb. 25, 2014
8652342 Semiconductor fabrication apparatuses to perform semiconductor etching and deposition processes and methods of forming semiconductor device using the same Feb. 18, 2014
8652258 Substrate treatment device Feb. 18, 2014
8652256 Manufacturing apparatus of polycrystalline silicon Feb. 18, 2014
8651048 Controlled deposition of metal and metal cluster ions by surface field patterning in soft-landing devices Feb. 18, 2014
8647485 Process kit shield for plasma enhanced processing chamber Feb. 11, 2014
8647438 Annular baffle Feb. 11, 2014
8647434 System and process for high-density, low-energy plasma enhanced vapor phase epitaxy Feb. 11, 2014
8646407 Film formation apparatus for semiconductor process and method for using the same Feb. 11, 2014
8646405 Deposition mask and method of fabricating the same Feb. 11, 2014
8642124 Gas dispersion shield method Feb. 4, 2014
8636847 Chemical vapor deposition flow inlet elements and methods Jan. 28, 2014
8632635 Vapor deposition apparatus and vapor deposition method Jan. 21, 2014
8632634 Coating apparatus and coating method Jan. 21, 2014
8631758 Drum coating device Jan. 21, 2014
8631756 Apparatus for processing substrate and method of maintaining the apparatus Jan. 21, 2014

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