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Class Information
Number: 118/715
Name: Coating apparatus > Gas or vapor deposition
Description: Apparatus wherein a coating material which is in the form of either the third state of matter, i.e., gaseous, or the transition between the second and third states of matter, i.e., vaporous, is condensed upon and forms a deposit of a base.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7618599 |
Reaction chamber for manufacturing a carbon nanotube, apparatus for manufacturing the carbon nanotube and system for manufacturing the carbon nanotube |
Nov. 17, 2009 |
| 7618493 |
Device and method for manufacturing thin films |
Nov. 17, 2009 |
| 7611587 |
Thin-film deposition evaporator |
Nov. 3, 2009 |
| 7608151 |
Method and system for coating sections of internal surfaces |
Oct. 27, 2009 |
| 7605095 |
Heat processing method and apparatus for semiconductor process |
Oct. 20, 2009 |
| 7604708 |
Cleaning of native oxide with hydrogen-containing radicals |
Oct. 20, 2009 |
| 7601242 |
Plasma processing system and baffle assembly for use in plasma processing system |
Oct. 13, 2009 |
| 7601223 |
Showerhead assembly and ALD methods |
Oct. 13, 2009 |
| 7597758 |
Chemical precursor ampoule for vapor deposition processes |
Oct. 6, 2009 |
| 7594479 |
Plasma CVD device and discharge electrode |
Sep. 29, 2009 |
| 7592275 |
Method and apparatus for manufacturing active matrix device including top gate type TFT |
Sep. 22, 2009 |
| 7591907 |
Apparatus for hybrid chemical processing |
Sep. 22, 2009 |
| 7589000 |
Fabrication method and fabrication apparatus of group III nitride crystal substance |
Sep. 15, 2009 |
| 7588736 |
Apparatus and method for generating a chemical precursor |
Sep. 15, 2009 |
| 7585384 |
Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor |
Sep. 8, 2009 |
| 7585370 |
Gas-purged vacuum valve |
Sep. 8, 2009 |
| 7582846 |
Hybrid plasma-cold spray method and apparatus |
Sep. 1, 2009 |
| 7582181 |
Method and system for controlling a velocity field of a supercritical fluid in a processing system |
Sep. 1, 2009 |
| 7578883 |
Arrangement and method for abating effluent from a process |
Aug. 25, 2009 |
| 7575638 |
Apparatus for defining regions of process exclusion and process performance in a process chamber |
Aug. 18, 2009 |
| 7572337 |
Blocker plate bypass to distribute gases in a chemical vapor deposition system |
Aug. 11, 2009 |
| 7566422 |
Exposure apparatus with tanks storing helium gas and method of manufacturing device using exposure apparatus |
Jul. 28, 2009 |
| 7566368 |
Method and apparatus for an improved upper electrode plate in a plasma processing system |
Jul. 28, 2009 |
| 7563328 |
Method and apparatus for gas injection system with minimum particulate contamination |
Jul. 21, 2009 |
| 7560038 |
Thin film forming method and system |
Jul. 14, 2009 |
| 7559992 |
Semiconductor processing apparatus and method |
Jul. 14, 2009 |
| 7553516 |
System and method of reducing particle contamination of semiconductor substrates |
Jun. 30, 2009 |
| 7552521 |
Method and apparatus for improved baffle plate |
Jun. 30, 2009 |
| 7550046 |
Vapor deposition system using benzotriazole (BTA) and isopropyl alcohol for protecting copper interconnects |
Jun. 23, 2009 |
| 7547363 |
Solid organometallic compound-filled container and filling method thereof |
Jun. 16, 2009 |
| 7544615 |
Systems and methods of forming refractory metal nitride layers using organic amines |
Jun. 9, 2009 |
| 7541069 |
Method and system for coating internal surfaces using reverse-flow cycling |
Jun. 2, 2009 |
| 7537673 |
Plasma processing apparatus |
May. 26, 2009 |
| 7537662 |
Method and apparatus for depositing thin films on a surface |
May. 26, 2009 |
| 7534854 |
Apparatus and method for oxidation and stabilization of polymeric materials |
May. 19, 2009 |
| 7531458 |
Organometallic compounds |
May. 12, 2009 |
| 7531061 |
Gas temperature control for a plasma process |
May. 12, 2009 |
| 7527658 |
Method of manufacturing displays and apparatus for manufacturing displays |
May. 5, 2009 |
| 7524532 |
Process for depositing thin layers on a substrate in a process chamber of adjustable height |
Apr. 28, 2009 |
| 7524374 |
Method and apparatus for generating a precursor for a semiconductor processing system |
Apr. 28, 2009 |
| 7522974 |
Interface for operating and monitoring abatement systems |
Apr. 21, 2009 |
| 7520937 |
Thin film forming apparatus and method of cleaning the same |
Apr. 21, 2009 |
| 7517558 |
Methods for positioning carbon nanotubes |
Apr. 14, 2009 |
| 7517141 |
Simultaneous control of deposition time and temperature of multi-zone furnaces |
Apr. 14, 2009 |
| 7513953 |
Continuous system for depositing films onto plastic bottles and method |
Apr. 7, 2009 |
| 7513949 |
Method and apparatus for producing semiconductor device |
Apr. 7, 2009 |
| 7510624 |
Self-cooling gas delivery apparatus under high vacuum for high density plasma applications |
Mar. 31, 2009 |
| 7504078 |
Continuous production of aligned carbon nanotubes |
Mar. 17, 2009 |
| 7500822 |
Combined vacuum pump load-lock assembly |
Mar. 10, 2009 |
| 7494560 |
Non-plasma reaction apparatus and method |
Feb. 24, 2009 |
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