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Class Information
Number: 118/52
Name: Coating apparatus > With means to centrifuge work
Description: Coating apparatus combined with means to rotate the base at such speed that centrifugal force affects the coating.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6113697 |
Method of and apparatus for coating a wafer with a minimal layer of photoresist |
Sep. 5, 2000 |
| 6113695 |
Coating unit |
Sep. 5, 2000 |
| 6113694 |
Substrate treatment apparatus |
Sep. 5, 2000 |
| 6110280 |
Temperature controlled chemical dispenser |
Aug. 29, 2000 |
| 6106618 |
Photoresist application for a circlet wafer |
Aug. 22, 2000 |
| 6099643 |
Apparatus for processing a substrate providing an efficient arrangement and atmospheric isolation of chemical treatment section |
Aug. 8, 2000 |
| 6099702 |
Electroplating chamber with rotatable wafer holder and pre-wetting and rinsing capability |
Aug. 8, 2000 |
| 6090521 |
Apparatus for forming a photoresist film in a semiconductor device and method of forming a photoresist film using the same |
Jul. 18, 2000 |
| 6090205 |
Apparatus for processing substrate |
Jul. 18, 2000 |
| 6077349 |
Method and apparatus for manufacturing disc-shaped recording medium |
Jun. 20, 2000 |
| 6076979 |
Method of and apparatus for supplying developing solution onto substrate |
Jun. 20, 2000 |
| 6073576 |
Substrate edge seal and clamp for low-pressure processing equipment |
Jun. 13, 2000 |
| 6068881 |
Spin-apply tool having exhaust ring |
May. 30, 2000 |
| 6065424 |
Electroless deposition of metal films with spray processor |
May. 23, 2000 |
| 6063439 |
Processing apparatus and method using solution |
May. 16, 2000 |
| 6062442 |
Dispense system of a photoresist coating machine |
May. 16, 2000 |
| 6063190 |
Method of forming coating film and apparatus therefor |
May. 16, 2000 |
| 6059880 |
Coating apparatus |
May. 9, 2000 |
| 6056998 |
Coating apparatus and coating method |
May. 2, 2000 |
| 6053977 |
Coating apparatus |
Apr. 25, 2000 |
| 6048399 |
SOG coater nozzle pot |
Apr. 11, 2000 |
| 6048400 |
Substrate processing apparatus |
Apr. 11, 2000 |
| 6042647 |
Nozzle system for feeding treatment liquid such as a liquid developer on a workpiece |
Mar. 28, 2000 |
| 6040016 |
Liquid application nozzle, method of manufacturing same, liquid application method, liquid application device, and method of manufacturing cathode-ray tube |
Mar. 21, 2000 |
| 6033135 |
Development system for manufacturing semiconductor devices, including a container equipped with cleaning and ventillation apparatus, and controlling method thereof |
Mar. 7, 2000 |
| 6027760 |
Photoresist coating process control with solvent vapor sensor |
Feb. 22, 2000 |
| 6024249 |
Fluid delivery system using an optical sensor to monitor for gas bubbles |
Feb. 15, 2000 |
| 6025012 |
Method and apparatus for determining film thickness control conditions and discharging liquid to a rotating substrate |
Feb. 15, 2000 |
| 6019843 |
Apparatus for coating a semiconductor wafer with a photoresist |
Feb. 1, 2000 |
| 6019844 |
Acoustic wave enhanced spin coater |
Feb. 1, 2000 |
| 6017393 |
Photoresist supply system with air venting |
Jan. 25, 2000 |
| 6017585 |
High efficiency semiconductor wafer coating apparatus and method |
Jan. 25, 2000 |
| 6013316 |
Disc master drying cover assembly |
Jan. 11, 2000 |
| 6013315 |
Dispense nozzle design and dispense method |
Jan. 11, 2000 |
| 6012858 |
Apparatus and method for forming liquid film |
Jan. 11, 2000 |
| 6004047 |
Method of and apparatus for processing photoresist, method of evaluating photoresist film, and processing apparatus using the evaluation method |
Dec. 21, 1999 |
| 5993547 |
Edge rinse mechanism for removing a peripheral portion of a resist film formed on a wafer |
Nov. 30, 1999 |
| 5993546 |
Apparatus for forming a solid thin film from a layer of liquid material without void |
Nov. 30, 1999 |
| 5989342 |
Apparatus for substrate holding |
Nov. 23, 1999 |
| 5985031 |
Spin coating spindle and chuck assembly |
Nov. 16, 1999 |
| 5985357 |
Treating solution supplying method and apparatus |
Nov. 16, 1999 |
| 5980985 |
Method and apparatus for forming protective film |
Nov. 9, 1999 |
| 5972110 |
Resist processing system |
Oct. 26, 1999 |
| 5968268 |
Coating apparatus and coating method |
Oct. 19, 1999 |
| 5965200 |
Processing apparatus and processing method |
Oct. 12, 1999 |
| 5962193 |
Method and apparatus for controlling air flow in a liquid coater |
Oct. 5, 1999 |
| 5962070 |
Substrate treating method and apparatus |
Oct. 5, 1999 |
| 5958517 |
System and method for cleaning nozzle delivering spin-on-glass to substrate |
Sep. 28, 1999 |
| 5954877 |
Soft impact dispense nozzle |
Sep. 21, 1999 |
| 5954878 |
Apparatus for uniformly coating a substrate |
Sep. 21, 1999 |
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