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Class Information
Number: 118/50.1
Name: Coating apparatus > With vacuum or fluid pressure chamber > With means to apply electrical and/or radiant energy to work and/or coating material
Description: Apparatus combined with means to treat the work and/or coating material with electrical and/or radiant energy.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6288367 |
Method and apparatus for performing thermal reflow operations under high gravity conditions |
Sep. 11, 2001 |
| 6284051 |
Cooled window |
Sep. 4, 2001 |
| 6281511 |
Apparatus for forming materials |
Aug. 28, 2001 |
| 6262393 |
Epitaxial growth furnace |
Jul. 17, 2001 |
| 6237525 |
Apparatus for coating a paper or board web |
May. 29, 2001 |
| 6225602 |
Vertical furnace for the treatment of semiconductor substrates |
May. 1, 2001 |
| 6216631 |
Robotic manipulation system utilizing patterned granular motion |
Apr. 17, 2001 |
| 6203619 |
Multiple station apparatus for liquid source fabrication of thin films |
Mar. 20, 2001 |
| 6203858 |
Method and system for coating a web |
Mar. 20, 2001 |
| 6188044 |
High-performance energy transfer system and method for thermal processing applications |
Feb. 13, 2001 |
| 6179031 |
Process for the adhesion of a flat plastic substrate in the form of a circular disk to a like second substrate for a digital video disc and apparatus for implementation of the process |
Jan. 30, 2001 |
| 6159873 |
Method for producing semiconductor device and production apparatus of semiconductor device |
Dec. 12, 2000 |
| 6126752 |
Semiconductor device having capacitor and manufacturing apparatus thereof |
Oct. 3, 2000 |
| 6121581 |
Semiconductor processing system |
Sep. 19, 2000 |
| 6117771 |
Method for depositing cobalt |
Sep. 12, 2000 |
| 6116184 |
Method and apparatus for misted liquid source deposition of thin film with reduced mist particle size |
Sep. 12, 2000 |
| 6106663 |
Semiconductor process chamber electrode |
Aug. 22, 2000 |
| 6098637 |
In situ cleaning of the surface inside a vacuum processing chamber |
Aug. 8, 2000 |
| 6096998 |
Method and apparatus for performing thermal reflow operations under high gravity conditions |
Aug. 1, 2000 |
| 6093911 |
Vacuum heating furnace with tapered portion |
Jul. 25, 2000 |
| 6090210 |
Multi-zone gas flow control in a process chamber |
Jul. 18, 2000 |
| 6068728 |
Laser texturing with reverse lens focusing system |
May. 30, 2000 |
| 6064800 |
Apparatus for uniform gas and radiant heat dispersion for solid state fabrication processes |
May. 16, 2000 |
| 6043450 |
Method to compensate for non-uniform film growth during chemical vapor deposition |
Mar. 28, 2000 |
| 6039806 |
Precision thickness optical coating system and method of operation thereof |
Mar. 21, 2000 |
| 6035100 |
Reflector cover for a semiconductor processing chamber |
Mar. 7, 2000 |
| 6021738 |
Carriage electrode contact system used in coating objects by vacuum deposit |
Feb. 8, 2000 |
| 6018616 |
Thermal cycling module and process using radiant heat |
Jan. 25, 2000 |
| 6007633 |
Single-substrate-processing apparatus in semiconductor processing system |
Dec. 28, 1999 |
| 6005225 |
Thermal processing apparatus |
Dec. 21, 1999 |
| 6002109 |
System and method for thermal processing of a semiconductor substrate |
Dec. 14, 1999 |
| 5997642 |
Method and apparatus for misted deposition of integrated circuit quality thin films |
Dec. 7, 1999 |
| 5989654 |
Method for manufacturing an optical information recording medium |
Nov. 23, 1999 |
| 5962085 |
Misted precursor deposition apparatus and method with improved mist and mist flow |
Oct. 5, 1999 |
| 5948168 |
Distributed microwave plasma reactor for semiconductor processing |
Sep. 7, 1999 |
| 5895594 |
Method and device for heating carrier bodies |
Apr. 20, 1999 |
| 5878191 |
Heat treatment apparatus for semiconductor wafers |
Mar. 2, 1999 |
| 5870526 |
Inflatable elastomeric element for rapid thermal processing (RTP) system |
Feb. 9, 1999 |
| 5863327 |
Apparatus for forming materials |
Jan. 26, 1999 |
| 5861060 |
Supply tank for electrostatic spraying system |
Jan. 19, 1999 |
| 5861609 |
Method and apparatus for rapid thermal processing |
Jan. 19, 1999 |
| 5850071 |
Substrate heating equipment for use in a semiconductor fabricating apparatus |
Dec. 15, 1998 |
| 5840125 |
Rapid thermal heating apparatus including a substrate support and an external drive to rotate the same |
Nov. 24, 1998 |
| 5833752 |
Manifold system |
Nov. 10, 1998 |
| 5833820 |
Electroplating apparatus |
Nov. 10, 1998 |
| 5803973 |
Apparatus for coating a substrate by chemical vapor deposition |
Sep. 8, 1998 |
| 5798139 |
Apparatus for and method of manufacturing plastic container coated with carbon film |
Aug. 25, 1998 |
| 5779802 |
Thin film deposition chamber with ECR-plasma source |
Jul. 14, 1998 |
| 5759334 |
Plasma processing apparatus |
Jun. 2, 1998 |
| 5755888 |
Method and apparatus of forming thin films |
May. 26, 1998 |
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