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Class Information
Number: 118/50.1
Name: Coating apparatus > With vacuum or fluid pressure chamber > With means to apply electrical and/or radiant energy to work and/or coating material
Description: Apparatus combined with means to treat the work and/or coating material with electrical and/or radiant energy.










Patents under this class:
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Patent Number Title Of Patent Date Issued
6179031 Process for the adhesion of a flat plastic substrate in the form of a circular disk to a like second substrate for a digital video disc and apparatus for implementation of the process Jan. 30, 2001
6159873 Method for producing semiconductor device and production apparatus of semiconductor device Dec. 12, 2000
6126752 Semiconductor device having capacitor and manufacturing apparatus thereof Oct. 3, 2000
6121581 Semiconductor processing system Sep. 19, 2000
6117771 Method for depositing cobalt Sep. 12, 2000
6116184 Method and apparatus for misted liquid source deposition of thin film with reduced mist particle size Sep. 12, 2000
6106663 Semiconductor process chamber electrode Aug. 22, 2000
6098637 In situ cleaning of the surface inside a vacuum processing chamber Aug. 8, 2000
6096998 Method and apparatus for performing thermal reflow operations under high gravity conditions Aug. 1, 2000
6093911 Vacuum heating furnace with tapered portion Jul. 25, 2000
6090210 Multi-zone gas flow control in a process chamber Jul. 18, 2000
6068728 Laser texturing with reverse lens focusing system May. 30, 2000
6064800 Apparatus for uniform gas and radiant heat dispersion for solid state fabrication processes May. 16, 2000
6043450 Method to compensate for non-uniform film growth during chemical vapor deposition Mar. 28, 2000
6039806 Precision thickness optical coating system and method of operation thereof Mar. 21, 2000
6035100 Reflector cover for a semiconductor processing chamber Mar. 7, 2000
6021738 Carriage electrode contact system used in coating objects by vacuum deposit Feb. 8, 2000
6018616 Thermal cycling module and process using radiant heat Jan. 25, 2000
6007633 Single-substrate-processing apparatus in semiconductor processing system Dec. 28, 1999
6005225 Thermal processing apparatus Dec. 21, 1999
6002109 System and method for thermal processing of a semiconductor substrate Dec. 14, 1999
5997642 Method and apparatus for misted deposition of integrated circuit quality thin films Dec. 7, 1999
5989654 Method for manufacturing an optical information recording medium Nov. 23, 1999
5962085 Misted precursor deposition apparatus and method with improved mist and mist flow Oct. 5, 1999
5948168 Distributed microwave plasma reactor for semiconductor processing Sep. 7, 1999
5895594 Method and device for heating carrier bodies Apr. 20, 1999
5878191 Heat treatment apparatus for semiconductor wafers Mar. 2, 1999
5870526 Inflatable elastomeric element for rapid thermal processing (RTP) system Feb. 9, 1999
5863327 Apparatus for forming materials Jan. 26, 1999
5861060 Supply tank for electrostatic spraying system Jan. 19, 1999
5861609 Method and apparatus for rapid thermal processing Jan. 19, 1999
5850071 Substrate heating equipment for use in a semiconductor fabricating apparatus Dec. 15, 1998
5840125 Rapid thermal heating apparatus including a substrate support and an external drive to rotate the same Nov. 24, 1998
5833820 Electroplating apparatus Nov. 10, 1998
5833752 Manifold system Nov. 10, 1998
5803973 Apparatus for coating a substrate by chemical vapor deposition Sep. 8, 1998
5798139 Apparatus for and method of manufacturing plastic container coated with carbon film Aug. 25, 1998
5779802 Thin film deposition chamber with ECR-plasma source Jul. 14, 1998
5759334 Plasma processing apparatus Jun. 2, 1998
5755888 Method and apparatus of forming thin films May. 26, 1998
5750209 Method for producing magnetic recording medium and apparatus therefor May. 12, 1998
5728224 Apparatus and method for manufacturing a packaging material using gaseous phase atmospheric photo chemical vapor deposition to apply a barrier layer to a moving web substrate Mar. 17, 1998
5726815 Apparatus for aligning the object focus in filament irradiating units Mar. 10, 1998
5719991 System for compensating against wafer edge heat loss in rapid thermal processing Feb. 17, 1998
5707451 Method and apparatus for cleaning a throttle valve Jan. 13, 1998
5690745 Apparatus for plasma treatment of the inside surface of a fuel tank Nov. 25, 1997
5683518 Rapid thermal processing apparatus for processing semiconductor wafers Nov. 4, 1997
5670203 Process for potting components in an impregnating compound Sep. 23, 1997
5654043 Pulsed plate plasma implantation system and method Aug. 5, 1997
5651868 Method and apparatus for coating thin film data storage disks Jul. 29, 1997

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