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Class Information
Number: 118/50.1
Name: Coating apparatus > With vacuum or fluid pressure chamber > With means to apply electrical and/or radiant energy to work and/or coating material
Description: Apparatus combined with means to treat the work and/or coating material with electrical and/or radiant energy.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7616872 |
Temperature measurement and heat-treating methods and systems |
Nov. 10, 2009 |
| 7612346 |
Non-axisymmetric charged-particle beam system |
Nov. 3, 2009 |
| 7608802 |
Heating device for heating semiconductor wafers in thermal processing chambers |
Oct. 27, 2009 |
| 7608151 |
Method and system for coating sections of internal surfaces |
Oct. 27, 2009 |
| 7568445 |
System and method for the holographic deposition of material |
Aug. 4, 2009 |
| 7566422 |
Exposure apparatus with tanks storing helium gas and method of manufacturing device using exposure apparatus |
Jul. 28, 2009 |
| 7554103 |
Increased tool utilization/reduction in MWBC for UV curing chamber |
Jun. 30, 2009 |
| 7554059 |
Heater unit and semiconductor manufacturing apparatus including the same |
Jun. 30, 2009 |
| 7528347 |
Cooling device and heat treating device using the same |
May. 5, 2009 |
| 7528348 |
Apparatus and method for measuring the temperature of substrates |
May. 5, 2009 |
| 7528349 |
Temperature stabilization for substrate processing |
May. 5, 2009 |
| 7525068 |
Heating system of batch type reaction chamber and method thereof |
Apr. 28, 2009 |
| 7516714 |
Immobilizing device |
Apr. 14, 2009 |
| 7509035 |
Lamp array for thermal processing exhibiting improved radial uniformity |
Mar. 24, 2009 |
| 7453051 |
System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy |
Nov. 18, 2008 |
| 7432475 |
Vertical heat treatment device and method controlling the same |
Oct. 7, 2008 |
| 7429718 |
Heating and cooling of substrate support |
Sep. 30, 2008 |
| 7429717 |
Multizone heater for furnace |
Sep. 30, 2008 |
| 7381928 |
Thermal processing apparatus and thermal processing method |
Jun. 3, 2008 |
| 7381967 |
Non-axisymmetric charged-particle beam system |
Jun. 3, 2008 |
| 7378618 |
Rapid conductive cooling using a secondary process plane |
May. 27, 2008 |
| 7371997 |
Thermal processing apparatus and thermal processing method |
May. 13, 2008 |
| 7358462 |
Apparatus and method for reducing stray light in substrate processing chambers |
Apr. 15, 2008 |
| 7332691 |
Cooling plate, bake unit, and substrate treating apparatus |
Feb. 19, 2008 |
| 7312422 |
Semiconductor batch heating assembly |
Dec. 25, 2007 |
| 7308865 |
Installation for the electrostatic oiling of metal strips |
Dec. 18, 2007 |
| 7274006 |
Heater |
Sep. 25, 2007 |
| 7274867 |
System and method for determining the temperature of a semiconductor wafer |
Sep. 25, 2007 |
| 7270724 |
Scanning plasma reactor |
Sep. 18, 2007 |
| 7256370 |
Vacuum thermal annealer |
Aug. 14, 2007 |
| 7214618 |
Technique for high efficiency metalorganic chemical vapor deposition |
May. 8, 2007 |
| 7211769 |
Heating chamber and method of heating a wafer |
May. 1, 2007 |
| 7211152 |
Heating element CVD system and connection structure between heating element and electric power supply mechanism in the heating element CVD system |
May. 1, 2007 |
| 7179504 |
Substrate processing method and substrate processing system |
Feb. 20, 2007 |
| 7159535 |
Apparatus for heating and curing powder coatings on porous wood products |
Jan. 9, 2007 |
| 7156045 |
Coating machine |
Jan. 2, 2007 |
| 7151060 |
Device and method for thermally treating semiconductor wafers |
Dec. 19, 2006 |
| 7141763 |
Method and apparatus for rapid temperature change and control |
Nov. 28, 2006 |
| 7138607 |
Determining method of thermal processing condition |
Nov. 21, 2006 |
| 7138014 |
Electroless deposition apparatus |
Nov. 21, 2006 |
| 7138606 |
Wafer processing method |
Nov. 21, 2006 |
| 7135656 |
Apparatus and method for reducing stray light in substrate processing chambers |
Nov. 14, 2006 |
| 7126087 |
Method of effecting heating and cooling in reduced pressure atmosphere |
Oct. 24, 2006 |
| 7115838 |
Unit for varying a temperature of a test piece and testing instrument incorporating same |
Oct. 3, 2006 |
| 7115837 |
Selective reflectivity process chamber with customized wavelength response and method |
Oct. 3, 2006 |
| 7112763 |
Method and apparatus for low temperature pyrometry useful for thermally processing silicon wafers |
Sep. 26, 2006 |
| 7102104 |
Heat treatment system |
Sep. 5, 2006 |
| 7097712 |
Apparatus for processing a semiconductor |
Aug. 29, 2006 |
| 7091453 |
Heat treatment apparatus by means of light irradiation |
Aug. 15, 2006 |
| 7082261 |
Heating stage |
Jul. 25, 2006 |
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