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Class Information
Number: 117/99
Name: Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor > Forming from vapor or gaseous state (e.g., vpe, sublimation) > With decomposition of a precursor (except impurity or dopant precursor) composed of diverse atoms (e.g., cvd) > With a chemical reaction (except ionization) in a disparate zone to form a precursor (e.g., transport processes)
Description: Subject matter including a step of forming a precursor*, including dopant* precursor*, by a chemical reaction* (except ionization) in a location separate from the deposition zone.


Sub-classes under this class:

Class Number Class Name Patents
117/100 Fully-sealed or vacuum-maintained chamber (e.g., ampoule) 29


Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
7608539 ALD method and apparatus Oct. 27, 2009
7556688 Method for achieving low defect density AlGaN single crystal boules Jul. 7, 2009
7501023 Method and apparatus for fabricating crack-free Group III nitride semiconductor materials Mar. 10, 2009
7488385 Method for epitaxial growth of a gallium nitride film separated from its substrate Feb. 10, 2009
7481881 Method of manufacturing GaN crystal substrate Jan. 27, 2009
7438761 Apparatus for fabricating a III-V nitride film and a method for fabricating the same Oct. 21, 2008
7427555 Growth of planar, non-polar gallium nitride by hydride vapor phase epitaxy Sep. 23, 2008
7402206 Method of synthesizing a compound of the formula M.sub.n+1AX.sub.n, film of the compound and its use Jul. 22, 2008
7399357 Atomic layer deposition using multilayers Jul. 15, 2008
7384481 Method of forming a rare-earth dielectric layer Jun. 10, 2008
7357837 GaN single crystal substrate and method of making the same Apr. 15, 2008
7250083 ALD method and apparatus Jul. 31, 2007
7147713 Phase controlled sublimation Dec. 12, 2006
7128785 Method for depositing especially crystalline layers from the gas phase onto especially crystalline substrates Oct. 31, 2006
7094289 Method for manufacturing highly-crystallized oxide powder Aug. 22, 2006
7084049 Manufacturing method for buried insulating layer-type semiconductor silicon carbide substrate Aug. 1, 2006
7033439 Apparatus for fabricating a III-V nitride film and a method for fabricating the same Apr. 25, 2006
6972050 Method for depositing in particular crystalline layers, and device for carrying out the method Dec. 6, 2005
6969426 Forming improved metal nitrides Nov. 29, 2005
6962624 Method and device for depositing in particular organic layers using organic vapor phase deposition Nov. 8, 2005
6955719 Manufacturing methods for semiconductor devices with multiple III-V material layers Oct. 18, 2005
6821341 Precursor for use in preparing layers on substrates Nov. 23, 2004
6808803 Molecular epitaxy method and compositions Oct. 26, 2004
6783849 Molecular layer epitaxy method and compositions Aug. 31, 2004
6773508 Single crystal silicon carbide thin film fabrication method and fabrication apparatus of the same Aug. 10, 2004
6660083 Method of epitaxially growing device structures with submicron group III nitride layers utilizing HVPE Dec. 9, 2003
6616757 Method for achieving low defect density GaN single crystal boules Sep. 9, 2003
6613143 Method for fabricating bulk GaN single crystals Sep. 2, 2003
6569240 Dielectric film and method for forming the same May. 27, 2003
6514338 Method and apparatus for producing silicon carbide single crystal Feb. 4, 2003
6497764 Method for growing SiC single crystals Dec. 24, 2002
6406539 Process for producing silicon carbide single crystal and production apparatus therefor Jun. 18, 2002
6316098 Molecular layer epitaxy method and compositions Nov. 13, 2001
6281098 Process for Polycrystalline film silicon growth Aug. 28, 2001
6273951 Precursor mixtures for use in preparing layers on substrates Aug. 14, 2001
6193797 Method of making SiC single crystal and apparatus for making SiC single crystal Feb. 27, 2001
6179913 Compound gas injection system and methods Jan. 30, 2001
6139631 Crystal growth method and apparatus Oct. 31, 2000
6139628 Method of forming gallium nitride crystal Oct. 31, 2000
6080297 Method and apparatus for constant composition delivery of hydride gases for semiconductor processing Jun. 27, 2000
6045612 Growth of bulk single crystals of aluminum nitride Apr. 4, 2000
6045613 Production of bulk single crystals of silicon carbide Apr. 4, 2000
6030454 Composition and method for forming thin film ferrite layers on a substrate Feb. 29, 2000
6017144 Method and apparatus for depositing highly oriented and reflective crystalline layers using a low temperature seeding layer Jan. 25, 2000
6001172 Apparatus and method for the in-situ generation of dopants Dec. 14, 1999
5997639 Method of reducing carbon incorporation into films produced by chemical vapor deposition involving organometallic precursor compounds Dec. 7, 1999
5985024 Method and apparatus for growing high purity single crystal silicon carbide Nov. 16, 1999
5954874 Growth of bulk single crystals of aluminum nitride from a melt Sep. 21, 1999
5925232 Method and apparatus for constant composition delivery of hydride gases for semiconductor processing Jul. 20, 1999
5858086 Growth of bulk single crystals of aluminum nitride Jan. 12, 1999

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