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Browse by Category: Main > Material Science
Class Information
Number: 117/93
Name: Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor > Forming from vapor or gaseous state (e.g., vpe, sublimation) > With decomposition of a precursor (except impurity or dopant precursor) composed of diverse atoms (e.g., cvd) > Including change in a growth-influencing parameter (e.g., composition, temperature, concentration, flow rate) during growth (e.g., multilayer or junction or superlattice growing) > With significant flow manipulation or condition, other than merely specifying the components or their sequence or both
Description: Subject matter in which significant gas or vapor flow manipulation or condition, other than merely specifying the components of precursors*, or their sequence, or both, is specified.


Patents under this class:
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Patent Number Title Of Patent Date Issued
7615116 Method for producing silicon epitaxial wafer and silicon epitaxial wafer Nov. 10, 2009
7608539 ALD method and apparatus Oct. 27, 2009
7601215 Method for rapid, controllable growth and thickness, of epitaxial silicon films Oct. 13, 2009
7553370 Crystal growth method for nitride semiconductor and formation method for semiconductor device Jun. 30, 2009
7547359 Method of altering crystal structure of group 13 element nitride, group 13 element nitride and structure material containing cubic nitride Jun. 16, 2009
7524376 Method and apparatus for aluminum nitride monocrystal boule growth Apr. 28, 2009
7488386 Atomic layer deposition methods and chemical vapor deposition methods Feb. 10, 2009
7449065 Method for the growth of large low-defect single crystals Nov. 11, 2008
7442252 Method for producing single crystal of multi-element oxide single crystal containing bismuth as constituting element Oct. 28, 2008
7438760 Methods of making substitutionally carbon-doped crystalline Si-containing materials by chemical vapor deposition Oct. 21, 2008
7431964 Method of forming a porous metal catalyst on a substrate for nanotube growth Oct. 7, 2008
7416605 Anneal of epitaxial layer in a semiconductor device Aug. 26, 2008
7402206 Method of synthesizing a compound of the formula M.sub.n+1AX.sub.n, film of the compound and its use Jul. 22, 2008
7393412 Method for manufacturing compound semiconductor epitaxial substrate Jul. 1, 2008
7374617 Atomic layer deposition methods and chemical vapor deposition methods May. 20, 2008
7335259 Growth of single crystal nanowires Feb. 26, 2008
7311777 Process for manufacturing quartz crystal element Dec. 25, 2007
7309394 Ultraviolet light-emitting device in which p-type semiconductor is used Dec. 18, 2007
7294360 Conformal coatings for micro-optical elements, and method for making the same Nov. 13, 2007
7250083 ALD method and apparatus Jul. 31, 2007
7229498 Nanostructures produced by phase-separation during growth of (III-V).sub.1-x(IV.sub.2).sub.x alloys Jun. 12, 2007
7229501 Silicon epitaxial wafer and process for manufacturing the same Jun. 12, 2007
7217324 Method and device for producing an electronic GaAs detector for x-ray detection for imaging May. 15, 2007
7153363 Atomic layer deposition Dec. 26, 2006
7150789 Atomic layer deposition methods Dec. 19, 2006
7147715 Growth of ultra-high purity silicon carbide crystals in an ambient containing hydrogen Dec. 12, 2006
7141499 Apparatus and method for growth of a thin film Nov. 28, 2006
7135071 Fractal structure and method of forming it Nov. 14, 2006
7128787 Atomic layer deposition method Oct. 31, 2006
7105054 Method and apparatus of growing a thin film onto a substrate Sep. 12, 2006
7101434 Fractal structure and its forming method Sep. 5, 2006
7094289 Method for manufacturing highly-crystallized oxide powder Aug. 22, 2006
7060132 Method and apparatus of growing a thin film Jun. 13, 2006
7033436 Crystal growth method for nitride semiconductor and formation method for semiconductor device Apr. 25, 2006
7014710 Method of growing single crystal Gallium Nitride on silicon substrate Mar. 21, 2006
7011706 Device substrate and method for producing device substrate Mar. 14, 2006
7011707 Production method for semiconductor substrate and semiconductor element Mar. 14, 2006
7001460 Semiconductor element and its manufacturing method Feb. 21, 2006
7001459 Spinel-structured metal oxide on a substrate and method of making same by molecular beam epitaxy Feb. 21, 2006
6994751 Nitride-based semiconductor element and method of forming nitride-based semiconductor Feb. 7, 2006
RE38937 Susceptor for vapor-phase growth apparatus Jan. 24, 2006
6972050 Method for depositing in particular crystalline layers, and device for carrying out the method Dec. 6, 2005
6932866 Method for depositing in particular crystalline layers Aug. 23, 2005
6923860 Oxidation of material for tunnel magneto-resistive sensors Aug. 2, 2005
6902620 Atomic layer deposition systems and methods Jun. 7, 2005
6896730 Atomic layer deposition apparatus and methods May. 24, 2005
6875272 Method for preparing GaN based compound semiconductor crystal Apr. 5, 2005
6869481 Method and device for regulating the differential pressure in epitaxy reactors Mar. 22, 2005
6869480 Method for the production of nanometer scale step height reference specimens Mar. 22, 2005
6863727 Method of depositing transition metal nitride thin films Mar. 8, 2005

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