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Class Information
Number: 117/89
Name: Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor > Forming from vapor or gaseous state (e.g., vpe, sublimation) > With decomposition of a precursor (except impurity or dopant precursor) composed of diverse atoms (e.g., cvd) > Including change in a growth-influencing parameter (e.g., composition, temperature, concentration, flow rate) during growth (e.g., multilayer or junction or superlattice growing)
Description: Subject matter in which a growth-influencing parameter, such as temperature, precursor* composition, precursor* concentration, or precursor* flow rate, is varied (e.g., modulated) during growth and as a result growth is altered, usually so that distinct layers of single-crystals* are formed or so that a single-crystal* of varying internal composition is formed (e.g., superlattice).


Sub-classes under this class:

Class Number Class Name Patents
117/92 Using an energy beam or field, a particle beam or field, or a plasma (e.g., ionization, pecvd, cbe, mombe, rf induction, laser) 213
117/91 With a chemical reaction (except ionization) in a disparate zone to form a precursor 81
117/90 With pretreatment of substrate (e.g., coacting ablating) 253
117/93 With significant flow manipulation or condition, other than merely specifying the components or their sequence or both 224


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12

Patent Number Title Of Patent Date Issued
7618492 Methods of forming nanocrystals Nov. 17, 2009
7608147 Precisely positioned nanowhiskers and nanowhisker arrays and method for preparing them Oct. 27, 2009
7608539 ALD method and apparatus Oct. 27, 2009
7604697 Heteroepitaxial growth method for gallium nitride Oct. 20, 2009
7601217 Method of fabricating an epitaxially grown layer Oct. 13, 2009
7601215 Method for rapid, controllable growth and thickness, of epitaxial silicon films Oct. 13, 2009
7594966 Method for producing a single crystal Sep. 29, 2009
7576372 Method for making free-standing AlGaN wafer, wafer produced thereby, and associated methods and devices using the wafer Aug. 18, 2009
7572333 Method for manufacturing semiconductor device Aug. 11, 2009
7563321 Process for producing high quality large size silicon carbide crystals Jul. 21, 2009
7553468 Method for producing solid product Jun. 30, 2009
7553372 Method of growing semiconductor crystal Jun. 30, 2009
7553370 Crystal growth method for nitride semiconductor and formation method for semiconductor device Jun. 30, 2009
7553369 Method of altering the properties of a thin film and substrate implementing said method Jun. 30, 2009
7547359 Method of altering crystal structure of group 13 element nitride, group 13 element nitride and structure material containing cubic nitride Jun. 16, 2009
7547360 Reduction of carbon inclusions in sublimation grown SiC single crystals Jun. 16, 2009
7540920 Silicon-containing layer deposition with silicon compounds Jun. 2, 2009
7537659 Method of obtaining a CdTe or CdZnTe single crystal and the single crystal thus obtained May. 26, 2009
7534296 Electrically conductive diamond electrodes May. 19, 2009
7534310 Single crystal GaN substrate, method of growing single crystal GaN and method of producing single crystal GaN substrate May. 19, 2009
7524376 Method and apparatus for aluminum nitride monocrystal boule growth Apr. 28, 2009
7517406 Magnetic garnet material, faraday rotator, optical device, bismuth-substituted rare earth-iron-garnet single-crystal film and method for producing the same and crucible for producing the same Apr. 14, 2009
7514342 Method and apparatus for forming deposited film Apr. 7, 2009
7494545 Epitaxial deposition process and apparatus Feb. 24, 2009
7494546 Method of growing insulating, semiconducting, and conducting group III-nitride thin films and coatings, and use as radiation hard coatings for electronics and optoelectronic devices Feb. 24, 2009
7491269 Method for catalytic growth of nanotubes or nanofibers comprising a NiSi alloy diffusion barrier Feb. 17, 2009
7488386 Atomic layer deposition methods and chemical vapor deposition methods Feb. 10, 2009
7481880 Mask and method for crystallizing amorphous silicon Jan. 27, 2009
7479187 Method for manufacturing silicon epitaxial wafer Jan. 20, 2009
7479443 Germanium deposition Jan. 20, 2009
7473316 Method of growing nitrogenous semiconductor crystal materials Jan. 6, 2009
7465353 Method for growing epitaxial crystal Dec. 16, 2008
7465499 Boron phosphide-based semiconductor device, production method thereof, light-emitting diode and boron phosphide-based semiconductor layer Dec. 16, 2008
7462239 Low temperature load and bake Dec. 9, 2008
7459024 Method of forming an N-type doped single crystal diamond Dec. 2, 2008
7455730 Method for growth of silicon carbide single crystal, silicon carbide seed crystal, and silicon carbide single crystal Nov. 25, 2008
7442252 Method for producing single crystal of multi-element oxide single crystal containing bismuth as constituting element Oct. 28, 2008
7442253 Process for forming low defect density, ideal oxygen precipitating silicon Oct. 28, 2008
7438762 Manufacture method for ZnO based compound semiconductor crystal and ZnO based compound semiconductor substrate Oct. 21, 2008
7438760 Methods of making substitutionally carbon-doped crystalline Si-containing materials by chemical vapor deposition Oct. 21, 2008
7435297 Molten-salt-based growth of group III nitrides Oct. 14, 2008
7431767 Apparatus and method for growth of a thin film Oct. 7, 2008
7427326 Minimizing degradation of SiC bipolar semiconductor devices Sep. 23, 2008
7416605 Anneal of epitaxial layer in a semiconductor device Aug. 26, 2008
7416604 Nitride crystal, nitride crystal substrate, epilayer-containing nitride crystal substrate, semiconductor device and method of manufacturing the same Aug. 26, 2008
7416606 Method of forming a layer of silicon carbide on a silicon wafer Aug. 26, 2008
7413608 Crystallization apparatus, crystallization method, and phase shifter Aug. 19, 2008
7404858 Method for epitaxial growth of silicon carbide Jul. 29, 2008
7393412 Method for manufacturing compound semiconductor epitaxial substrate Jul. 1, 2008
7387678 GaN substrate and method of fabricating the same, nitride semiconductor device and method of fabricating the same Jun. 17, 2008

1 2 3 4 5 6 7 8 9 10 11 12


 
 
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