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Class Information
Number: 117/207
Name: Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor > Apparatus > For crystallization from liquid or supercritical state > Crucibleless apparatus having means providing movement of discrete droplets or solid particles to thin-film precursor (e.g., verneuil method)
Description: Subject matter in which droplets or solid particles of precursor* are moved as discrete entities to a thin-film liquid precursor* mass from which the single-crystal* product is grown and which precursor is not contained by a crucible.


Patents under this class:

Patent Number Title Of Patent Date Issued
7402208 Method and equipment for producing biopolymer crystal Jul. 22, 2008
7399360 Crucible and method of growing single crystal by using crucible Jul. 15, 2008
7357835 Production of crystalline materials by using high intensity ultrasound Apr. 15, 2008
7344596 System and method for crystal growing Mar. 18, 2008
6623708 High density protein crystal growth Sep. 23, 2003
6458202 Process for preparing single crystal silicon having uniform thermal history Oct. 1, 2002
5531185 Manufacturing apparatus for use in a micro-gravity environment Jul. 2, 1996
5367981 Apparatus for manufacturing crystals through floating zone method Nov. 29, 1994
5108720 Float zone processing of particulate silicon Apr. 28, 1992
5006317 Process for producing crystalline silicon ingot in a fluidized bed reactor Apr. 9, 1991
4062653 Powder flow control device for growing Verneuil crystals Dec. 13, 1977
4000977 Apparatus for producing monocrystals by the Verneuil technique Jan. 4, 1977



 
 
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