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Browse by Category: Main > Material Science
Class Information
Number: 117/108
Name: Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor > Forming from vapor or gaseous state (e.g., vpe, sublimation) > Using an energy beam or field, a particle beam or field, or a plasma (e.g., mbe)
Description: Subject matter in which the process utilizes a particle beam or an energy beam or a particle field or an energy field or a plasma during growth.


Patents under this class:
1 2 3 4 5 6 7 8

Patent Number Title Of Patent Date Issued
7601216 Gas diffusion electrodes, membrane-electrode assemblies and method for the production thereof Oct. 13, 2009
7591897 Method for the rapid synthesis of large quantities of metal oxide nanowires at low temperatures Sep. 22, 2009
7556688 Method for achieving low defect density AlGaN single crystal boules Jul. 7, 2009
7553372 Method of growing semiconductor crystal Jun. 30, 2009
7553368 Process for manufacturing a gallium rich gallium nitride film Jun. 30, 2009
7544398 Controlled nano-doping of ultra thin films Jun. 9, 2009
7504643 Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement Mar. 17, 2009
7495239 Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement Feb. 24, 2009
7485349 Thin film forming method Feb. 3, 2009
7449065 Method for the growth of large low-defect single crystals Nov. 11, 2008
7435297 Molten-salt-based growth of group III nitrides Oct. 14, 2008
7419546 Gas diffusion electrodes, membrane-electrode assemblies and method for the production thereof Sep. 2, 2008
7402206 Method of synthesizing a compound of the formula M.sub.n+1AX.sub.n, film of the compound and its use Jul. 22, 2008
7399357 Atomic layer deposition using multilayers Jul. 15, 2008
7368067 P-type zinc oxide semiconductor film and process for preparation thereof May. 6, 2008
7341628 Method to reduce crystal defects particularly in group III-nitride layers and substrates Mar. 11, 2008
7338582 Method for manufacturing manganese oxide nanostructure and oxygen reduction electrode using said manganese oxide nanostructure Mar. 4, 2008
7279041 Atomic layer deposition methods and atomic layer deposition tools Oct. 9, 2007
7276121 Forming improved metal nitrides Oct. 2, 2007
7273664 Preparation method of a coating of gallium nitride Sep. 25, 2007
H2193 Method of growing homoepitaxial silicon carbide Jul. 3, 2007
7189287 Atomic layer deposition using electron bombardment Mar. 13, 2007
7182812 Direct synthesis of oxide nanostructures of low-melting metals Feb. 27, 2007
7160529 Diamondoid-containing field emission devices Jan. 9, 2007
7087113 Textured substrate tape and devices thereof Aug. 8, 2006
7077904 Method for atomic layer deposition (ALD) of silicon oxide film Jul. 18, 2006
7060131 Epitaxy with compliant layers of group-V species Jun. 13, 2006
7048798 Silicon carbide single crystal and method and apparatus for producing the same May. 23, 2006
7037371 Method for fabricating semiconductor device May. 2, 2006
7022183 Semiconductor thin film and process for production thereof Apr. 4, 2006
7022182 Ferromagnetic p-type single-crystal zinc oxide material and manufacturing method thereof Apr. 4, 2006
7001459 Spinel-structured metal oxide on a substrate and method of making same by molecular beam epitaxy Feb. 21, 2006
6962624 Method and device for depositing in particular organic layers using organic vapor phase deposition Nov. 8, 2005
6953703 Method of making a semiconductor device with exposure of sapphire substrate to activated nitrogen Oct. 11, 2005
6916374 Atomic layer deposition methods and atomic layer deposition tools Jul. 12, 2005
6902620 Atomic layer deposition systems and methods Jun. 7, 2005
6899928 Dual ion beam assisted deposition of biaxially textured template layers May. 31, 2005
6896731 P-type single crystal zinc-oxide having low resistivity and method for preparation thereof May. 24, 2005
6869880 In situ application of etch back for improved deposition into high-aspect-ratio features Mar. 22, 2005
6863728 Apparatus for growing low defect density silicon carbide Mar. 8, 2005
6860943 Method for producing group III nitride compound semiconductor Mar. 1, 2005
6841003 Method for forming carbon nanotubes with intermediate purification steps Jan. 11, 2005
6841002 Method for forming carbon nanotubes with post-treatment step Jan. 11, 2005
6811611 Esrf source for ion plating epitaxial deposition Nov. 2, 2004
6800135 ZnO/sapphire substrate and method for manufacturing the same Oct. 5, 2004
6790278 Method for preparing low-resistant p-type SrTiO3 Sep. 14, 2004
6758900 Micro three-dimensional structure, production method therefor and production device therefor Jul. 6, 2004
6743292 Oriented conductive oxide electrodes on SiO2/Si and glass Jun. 1, 2004
6720260 Sequential electron induced chemical vapor deposition Apr. 13, 2004
6709989 Method for fabricating a semiconductor structure including a metal oxide interface with silicon Mar. 23, 2004

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