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iFire Technologies, Inc. Patents
Assignee:
iFire Technologies, Inc.
Address:
Austin, TX
No. of patents:
2
Patents:




Patent Number Title Of Patent Date Issued
7118992 Wafer thinning using magnetic mirror plasma October 10, 2006
A method for manufacturing integrated circuits uses an atmospheric magnetic mirror plasma etching apparatus to thin a semiconductor wafer. In addition the process may, while thinning, both segregate and expose through-die vias for an integrated circuit chip. To segregate, the wafer m
6794272 Wafer thinning using magnetic mirror plasma September 21, 2004
A method for manufacturing integrated circuits uses an atmospheric magnetic mirror plasma etching apparatus to thin a semiconductor wafer. In addition the process may, while thinning, both segregate and expose through-die vias for an integrated circuit chip. To segregate, the wafer may b

 
 
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