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Zygo Corporation Patents
Assignee:
Zygo Corporation
Address:
Middlefield, CT
No. of patents:
290
Patents:


1 2 3 4 5 6


Patent Number Title Of Patent Date Issued
7619746 Generating model signals for interferometry November 17, 2009
A method is disclosed which includes, for each of multiple areas of a test surface on a test object having different reflectivities, using an interferometry system to measure each area in a first mode of operation that measures information about the reflectivity of the area over a range
7616323 Interferometer with multiple modes of operation for determining characteristics of an object sur November 10, 2009
Disclosed is a system including: (i) an interferometer configured to direct test electromagnetic radiation to a test surface and reference electromagnetic radiation to a reference surface and subsequently combine the electromagnetic radiation to form an interference pattern, the elec
7616322 Cyclic error compensation in interferometry systems November 10, 2009
An interference signal S(t) is provided from interference between two beams directed along different paths. The signal S(t) is indicative of changes in an optical path difference n{tilde over (L)}(t) between the different paths, where n is an average refractive index along the differ
7612893 Scanning interferometric methods and apparatus for measuring aspheric surfaces and wavefronts November 3, 2009
Interferometric scanning method(s) and apparatus for measuring test optics having aspherical surfaces including those with large departures from spherical. A reference wavefront is generated from a known origin along a scanning axis. A test optic is aligned on the scanning axis and s
7586620 Methods and systems for interferometric analysis of surfaces and related applications September 8, 2009
A method for determining a spatial property of an object includes obtaining a scanning low coherence interference signal from a measurement object that includes two or more interfaces. The scanning low coherence interference signal includes two or more overlapping low coherence inter
7576868 Cyclic error compensation in interferometry systems August 18, 2009
A first portion of a beam including a first frequency component is directed along a first path. A second portion of the beam is frequency shifted to generate a shifted beam that includes a second frequency component different from the first frequency component and one or more spuriou
7564568 Phase shifting interferometry with multiple accumulation July 21, 2009
An interferometer system is disclosed which is configured to combine measurement light with reference light to form an optical interference pattern, where the interferometer system includes a modulator configured to repetitively introduce a sequence of phase shifts between the measur
7564566 Method and system for analyzing low-coherence interferometry signals for information about thin July 21, 2009
Methods and systems are disclosed for analyzing a scanning interferometry signal. Steps include: providing a scanning interferometry signal produced by a scanning interferometer for a first location of a test object (e.g., a sample having a thin film); providing a model function of t
7561278 Interferometer using integrated retarders to reduce physical volume July 14, 2009
An apparatus includes an interferometer having a polarizing beam splitter to split an input beam into a measurement beam and a reference beam, the measurement beam contacting a measurement object, the reference beam contacting a reference object. The interferometer includes at least one
7548322 Multi-axis interferometers and methods and systems using multi-axis interferometers June 16, 2009
In general, in one aspect, the invention features an apparatus including a multi-axis interferometer configured to produce at least three output beams each including interferometric information about a distance between the interferometer and a measurement object along a corresponding
7542147 Data age compensation with avalanche photodiode June 2, 2009
A method is disclosed including conditioning a measurement signal from an interferometer, said conditioning characterized by one or more conditioning parameters; measuring a plurality of values for the conditioned measurement signal; providing one or more values indicative of the con
7532330 Angle interferometers May 12, 2009
Methods and systems for determining information about the incident angle of a beam are disclosed, the method including directing a beam having an s-polarized component and a p-polarized component to reflect from an interface at a non-normal angle, where the non-normal reflection intr
7528962 Apparatus and methods for reducing non-cyclic non-linear errors in interferometry May 5, 2009
In general, in one aspect, the invention features interferometry systems that include an interferometer configured to direct a first beam and a second beam derived from common light source along different paths and to combine the two beams to form an output beam including information
7528961 Compensation of turbulent effects of gas in measurement paths of multi-axis interferometers May 5, 2009
In general, in a first aspect, the invention features a method that includes using an interferometry assembly to provide three different output beams, each output beam including an interferometric phase related to an optical path difference between a corresponding first beam and a co
7522288 Compensation of systematic effects in low coherence interferometry April 21, 2009
In general, in one aspect, the invention features a method that includes transforming interferometry data acquired for a test sample using a low coherence imaging interferometry system to a frequency domain and, at a plurality of frequencies in the frequency domain, reducing contribution
7495773 In situ determination of pixel mapping in interferometry February 24, 2009
Interferometric methods and apparatus by which the map between pixel positions and corresponding part locations are determined in situ. The part under test, which is assumed to be a rigid body, is precisely moved from a base position to at least one other position in one to six degrees
7495770 Beam shear reduction in interferometry systems February 24, 2009
In certain aspects, the invention features interferometry systems that include an input assembly positioned to receive a beam emitted from a light source comprising a first component beam and a second component beam, the input assembly being configured to change a dimension of one of
7492469 Interferometry systems and methods using spatial carrier fringes February 17, 2009
In general, in one aspect, the invention features an apparatus that includes an interferometer having a main cavity and an auxiliary reference surface, the main cavity including a partially reflective surface defining a primary reference surface and a test surface. The interferometer
7489407 Error correction in interferometry systems February 10, 2009
In general, in one aspect, the invention features methods that include using an interferometer to produce an output beam having a phase related to an optical path difference between a path of a first beam and a path of a second beam, wherein the first beam contacts a measurement object
7488929 Perimeter detection using fiber optic sensors February 10, 2009
A fiber optic perimeter detection system includes a receiver to receive output light signals from sensors positioned at different regions, each sensor including a sensing fiber. Each sensor generates an output light signal having a specified wavelength, the output light signal having a
7468799 Scanning interferometry for thin film thickness and surface measurements December 23, 2008
A method including: providing a low coherence scanning interferometry data for at least one spatial location of a sample having multiple interfaces, wherein the data is collected using a low coherence scanning interferometer having an illumination geometry and an illumination frequen
7466429 Profiling complex surface structures using scanning interferometry December 16, 2008
A method including comparing information derivable from a scanning interferometry signal for a first surface location of a test object to information corresponding to multiple models of the test object, wherein the multiple models are parameterized by a series of characteristics for
7456975 Methods and systems for interferometric analysis of surfaces and related applications November 25, 2008
A method for determining a spatial property of an object includes obtaining a scanning low coherence interference signal from a measurement object that includes two or more interfaces. The scanning low coherence interference signal includes two or more overlapping low coherence inter
7446883 Method and apparatus for tilt corrected lateral shear in a lateral shear plus rotational shear a November 4, 2008
A Fizeau or other interferometer is used to provide high resolution, in-situ calibration of an external angle measurement system such as widely spaced high stability plane mirror interferometers (HSPMIs)). The calibrated measurement system then measures mechanical tilt during shearin
7446882 Interferometer for determining characteristics of an object surface November 4, 2008
Disclosed is a system including: (i) an interferometer configured to direct test electromagnetic radiation to a test surface and reference electromagnetic radiation to a reference surface and subsequently combine the electromagnetic radiation to form an interference pattern, the elec
7433049 Multi-axis interferometer with procedure and data processing for mirror mapping October 7, 2008
In general, in one aspect, the invention features methods that include locating a plurality of alignment marks on a moveable stage, interferometrically measuring a position of a measurement object along an interferometer axis for each of the alignment mark locations, and using the in
7428685 Cyclic error compensation in interferometry systems September 23, 2008
The invention features a method including: (i) providing an interference signal S(t) from two beams directed along different paths, wherein the signal S(t) is indicative of changes in an optical path difference n{tilde over (L)}(t) between the different paths, where n is an average r
7428057 Interferometer for determining characteristics of an object surface, including processing and ca September 23, 2008
Disclosed is a system including: (i) an interferometer configured to direct test electromagnetic radiation to a test surface and reference electromagnetic radiation to a reference surface and subsequently combine the electromagnetic radiation to form an interference pattern, the elec
7417743 Interferometry systems and methods August 26, 2008
In general, in a first aspect, the invention features apparatus that include an interferometer having a main cavity and an auxiliary reference surface, the main cavity including a primary reference surface and a test surface. The interferometer is configured to direct a primary portion o
7405833 Method for calibration and removal of wavefront errors July 29, 2008
Apparatus and methods for generating an empirically determined mathematical model of wavefront error in an interferometer as a function of aperture misalignment and then applying the model to correct subsequent measurements. The methods are useful in Fizeau and other types of interfe
7403289 Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including July 22, 2008
A method including: imaging test light emerging from a test object over a range of angles to interfere with reference light on a detector, wherein the test and reference light are derived from a common source; for each of the angles, simultaneously varying an optical path length differen
7382466 Coating for reflective optical components June 3, 2008
An optical component has a coating including one or more layers at each reflecting surface. The coating causes the optical component to have polarization eigenstates that are substantially linear and to have the properties of a half-wave plate. The coated optical component can be used
7379190 Stage alignment in lithography tools May 27, 2008
In general, in a first aspect, the invention features a lithography system that includes a stage for supporting a wafer, an illumination system including a radiation source and a lens assembly, wherein the illumination system is configured to direct radiation through a mask to produc
7375823 Interferometry systems and methods of using interferometry systems May 20, 2008
In general, in one aspect, the invention features methods that include interferometrically monitoring a distance between an interferometry assembly and a measurement object along each of three different measurement axes while moving the measurement object relative to the interferomet
7365857 Precompensation of polarization errors in heterodyne interferometry April 29, 2008
Apparatus and methods for adjusting the polarizations of the components of an input beam to reduce leakage caused by imperfections in an interferometer are disclosed. The apparatus includes an interferometer positioned to receive an input beam that includes two components having diff
7330274 Compensation for geometric effects of beam misalignments in plane mirror interferometers February 12, 2008
Techniques for compensating for geometric effects of beam misalignment in plane mirror interferometers are disclosed.
7327469 Method for compensating errors in interferometric surface metrology February 5, 2008
A method for determining a surface profile of an object is described. The method typically includes providing a surface profile (e.g., a height profile) of a test object measured by an interferometric profiler. Information related to field- and object orientation-dependent systematic
7327466 Multi-corner retroreflector February 5, 2008
A two-corner retroreflector that includes a common face positioned to receive two beams and two corners each positioned to receive one of the beams and retro-reflect it back through the common face.
7327465 Compensation for effects of beam misalignments in interferometer metrology systems February 5, 2008
In general, in a first aspect, the invention features methods that include deriving a first beam and a second beam from an input beam and directing the first and second beams along different paths, where the path of the first beam contacts a measurement object, producing an output beam
7324214 Interferometer and method for measuring characteristics of optically unresolved surface features January 29, 2008
Disclosed is an interferometry analysis method that includes comparing information derivable from multiple interferometry signals corresponding to different surface locations of a test object to information corresponding to multiple models of the test object, wherein the multiple mod
7324210 Scanning interferometry for thin film thickness and surface measurements January 29, 2008
A method including: providing a low coherence scanning interferometry data for at least one spatial location of a sample having multiple interfaces, wherein the data is collected using a low coherence scanning interferometer having an illumination geometry and an illumination frequen
7321432 Measurement and compensation of errors in interferometers January 22, 2008
In general, in one aspect, the invention features a method for determining the location of an alignment mark on a stage including measuring a location, x.sub.1, of a stage along a first measurement axis using an interferometer, measuring a location, x.sub.2, of the stage along a seco
7321431 Method and system for analyzing low-coherence interferometry signals for information about thin January 22, 2008
Methods and systems are disclosed for analyzing a scanning interferometry signal. A scanning interferometry signal is provided that is produced by a scanning interferometer for a first location of a test object (e.g., a sample having a thin film). A model function of the scanning int
7321430 Vibration resistant interferometry January 22, 2008
Scanning interferometry data for a test object is provided, the data typically including intensity values for each of multiple scan positions for each of different spatial locations of the test object. The intensity values for each spatial location define an interference signal for the
7315382 Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including January 1, 2008
A method including: imaging test light emerging from a test object over a range of angles to interfere with reference light on a detector, wherein the test and reference light are derived from a common source; for each of the angles, simultaneously varying an optical path length differen
7310152 Interferometer assemblies having reduced cyclic errors and system using the interferometer assem December 18, 2007
In general, in one aspect, the invention features apparatus that include an interferometer including a main assembly having two laterally displaced polarizing beam splitter interfaces, wherein the interfaces are positioned to receive two spatially separated beams and direct them each
7304747 Methods and systems for determining optical properties using low-coherence interference signals December 4, 2007
Methods and related systems for determining properties of optical systems (e.g., interferometers) and/or optical elements (e.g., lenses and/or lens systems) are described. For example, information related to an optical thickness mismatch of an interferometer can be determined by providin
7298494 Methods and systems for interferometric analysis of surfaces and related applications November 20, 2007
A method for determining a spatial property of an object includes obtaining a scanning low coherence interference signal from a measurement object that includes two or more interfaces. The scanning low coherence interference signal includes two or more overlapping low coherence inter
7298493 Interferometric optical assemblies and systems including interferometric optical assemblies November 20, 2007
In general, in one aspect, the invention features assemblies that include a first polarizing beam splitter positioned in the paths of a pair of initial beams, the polarizing beam splitter being configured to combine the pair of initial beams to form an input beam. The assemblies further
7292346 Triangulation methods and systems for profiling surfaces through a thin film coating November 6, 2007
An optical system includes a photolithography system, a low coherence interferometer, and a detector. The photolithography system is configured to illuminate a portion of an object with a light pattern and has a reference surface. The low coherence interferometer has a reference opti
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