Method and apparatus for cleaning semiconductor devices and other workpieces using an aqueous rinse solution which is de-oxygenated by passing the aqueous rinse solution and a carrier gas through an osmotic membrane degasifier. A cleaning chamber is also disclosed for carrying out th
An apparatus and method for cleaning and rinsing of disk-shaped objects, such as silicon wafers, high precision lenses and the like. The cleaning and rinsing may take place in a single chamber, that is sequentially filled with cleaning solution, rinsing solution, and the like. In an
Method and apparatus for cleaning semiconductor devices and other workpieces using an aqueous rinse solution which is de-oxygenated by passing the aqueous rinse solution and a carrier gas through an osmotic membrane degasifier. A cleaning chamber is also disclosed for carrying out th