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V Technology Co., Ltd. Patents
Assignee:
V Technology Co., Ltd.
Address:
Yokohama-shi, JP
No. of patents:
2
Patents:












Patent Number Title Of Patent Date Issued
8293434 Method for forming convex pattern, exposure apparatus and photomask October 23, 2012
The present invention is a photomask 3 for exposing a substrate coated with a positive photosensitive material. At least a first mask pattern group 16 and a second mask pattern group 17 are formed on a transparent substrate at a predetermined arrangement pitch. The first mask pattern
7812920 Production method of substrate for liquid crystal display using image-capturing and reference po October 12, 2010
A production method of a substrate for a liquid crystal display in which an exposure pattern of a color filter or a black matrix is formed in a predetermined position of a TFT substrate at a high level of precision. Therefore the production method includes following steps: applying a

 
 
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