| Patent Number |
Title Of Patent |
Date Issued |
| 8183500 |
Orthogonal beam delivery system for wafer edge processing |
May 22, 2012 |
| A method and apparatus for processing substrate edges is disclosed that overcomes the limitations of conventional edge processing methods and systems used in semiconductor manufacturing. The edge processing method and apparatus of this invention includes a laser and optical system to |
| 7270724 |
Scanning plasma reactor |
September 18, 2007 |
| A scanning plasma reactor for exciting reactant gases at a substrate surface including a beam forming module, a gas injection module, a reaction chamber with a window and a vacuum chuck, a gas exhaust module. Radiation from the beam forming module and the reactant gas create an excit |
| 6773683 |
Photocatalytic reactor system for treating flue effluents |
August 10, 2004 |
| A photocatalytic reactor system consisting of a photonic energy source to remove undesirable contaminants from an effluent stream. The device includes a photonic energy source, a beam delivery system, and a reaction chamber into which the photonic energy is transmitted. The contaminated |
| 5814156 |
Photoreactive surface cleaning |
September 29, 1998 |
| Foreign material on a surface of a substrate is processed to form a non-solid by-product by providing a gaseous reactant in the vicinity of the foreign material and delivering a beam of radiation to aid the gaseous reactant to react with the foreign material to form the non-solid by- |
| 5669979 |
Photoreactive surface processing |
September 23, 1997 |
| A method of cleaning a substrate surface, the cleaning being done photoreactively without damaging the surface. A laser beam of UV radiation is delivered at an acute angle to the surface of the substrate, the beam striking the surface at a long and narrow reaction region. The beam and |
