| Patent Number |
Title Of Patent |
Date Issued |
| 7335787 |
Method for producing onium salt derivatives, and novel onium salt derivatives |
February 26, 2008 |
| The invention provides a high-yield method for producing onium salt derivatives useful as agents, such as acid-generators, employed in chemically amplified resists; and to provide novel onium salt derivatives. Reaction of an onium salt derivative containing a halide anion or a carbox |
| 6861456 |
Photosensitive compound, photosensitive resin, and photosensitive composition |
March 1, 2005 |
| The present invention provides a novel photosensitive compound having an azido group suitable for exposure to light of a short wavelength; a photosensitive resin containing the photosensitive compound; and a photosensitive composition containing the photosensitive compound or photose |
| 6797452 |
Photosensitive composition comprising photosensitive saponified poly(vinyl acetate) and pattern |
September 28, 2004 |
| A photosensitive resin composition which includes a photosensitive saponified PVA having a pendant group derived from a quaternary styrylpyridinium or styrylquinolinium, or a derivative thereof. The composition comprises a photosensitive saponified PVA which has structural units repr |
| 6777477 |
Coating solution for forming transparent and conductive tin oxide film and method for preparing |
August 17, 2004 |
| The invention relates to a coating solution for forming transparent conductive tin oxide film, a method for producing transparent conductive tin oxide film, and transparent conductive tin oxide film. The coating solution is capable of forming, from an inexpensive starting material such |
| 6768027 |
Cinnamaldehyde compound having an azido group |
July 27, 2004 |
| The invention provides a novel azidocinnamaldehyde compound which, when used as an intermediate for providing a photosensitive moiety of a photoresist, introduces a photosensitive moiety having high sensitivity and attaining high contrast between the exposed portion and the unexposed |
| 6713225 |
1,2-Naphthoquinone-2-diazidesulfonate ester photosensitive agent, method for producing the photo |
March 30, 2004 |
| The invention provides a 1,2-naphthoquinone-2-diazidesulfonate ester photosensitive agent which is useful as a photosensitive agent employed in a photoresist for producing semiconductor integrated circuits, liquid crystal displays, EL displays, etc., a method for producing the photos |
| 6620957 |
Process for producing onium salt derivative and novel onium salt derivative |
September 16, 2003 |
| The invention provides a high-yield method for producing onium salt derivatives useful as agents, such as acid-generators, employed in chemically amplified resists; and to provide novel onium salt derivatives. Reaction of an onium salt derivative containing a halide anion or a carbox |
| 6448383 |
Method for producing 1,2-naphthoquinonediazide photosensitive agent |
September 10, 2002 |
| A method for producing a high-purity 1,2-naphthoquinonediazide photosensitive agent containing a low level of impurities, by condensing, in an organic solvent other than amide, polyhydric phenolic compound and 1,2-naphthoquinonediazide-sulfonic acid halide in the presence of organic |
| 6444391 |
Photosensitive compositions and pattern formation method |
September 3, 2002 |
| Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslin |
| 6342330 |
Photosensitive compositions and pattern formation method |
January 29, 2002 |
| Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslin |
| 6274714 |
Method for producing 1,2-naphthoquinone-2-diazide-4-sulfonyl chloride |
August 14, 2001 |
| An effective method for producing 1,2-naphthoquinone-2-diazide-4-sulfonyl chloride at high yield, wherein formation of impurities is prevented. The method includes the following steps: 1,2-naphthoquinone-2-diazide is reacted with chlorosulfuric acid, to thereby produce a mixture of a |
| 6140018 |
Photosensitive resin and composition thereof derived from saponified poly(vinyl acetate) and pat |
October 31, 2000 |
| The invention provides a photosensitive resin and a photosensitive resin composition having excellent water resistance after hardening, excellent developability, and excellent patterning characteristics, and a pattern formation method making use of the composition. The invention provides |
| 6140007 |
Photosensitive compositions and pattern formation method |
October 31, 2000 |
| Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslin |
| 6077941 |
Method for producing 1,2-naphthoquinone-2-diazide derivatives |
June 20, 2000 |
| An effective method for producing a 1,2-naphthoquinone-2-diazide or a sulfo-substituted compound thereof from a 2-diazo-1-naphthalenesulfonic acid or a sulfo-substituted compound thereof. A 1,2-naphthoquinone-2-diazide derivative or a sulfo-substituted compound thereof is derived fro |
| 5807657 |
Polyvinyl alcohol base photosensitive resin, photosensitive composition, and method for pattern- |
September 15, 1998 |
| A polyvinyl alcohol base photosensitive resin comprised of a polyvinyl alcohol base polymer compound with the structural units of formulae (I) and (II) ##STR1## as well as a photosensitive resin composition comprising this resin and, optionally, an anionic additive and a method o |
| 5021505 |
Photosensitive poly(vinyl alcohol) derivative |
June 4, 1991 |
| A photosensitive poly(vinyl alcohol) derivative comprising units of the fula ##STR1## wherein R.sub.1 is alkylene, R.sub.2 is hydrogen or a lower alkoxy, ##STR2## is a quaternary aromatic nitrogen-containing heterocycle, X.sup.- is SO.sub.3.sup.- or CO.sub.2.sup.-, m is 0 |
| 4925770 |
Contrast-enhancing agent for photolithography |
May 15, 1990 |
| The invention provides a novel contrast-enhancing agent for photolithography which is used as an overcoating on a positive-working photoresist layer for enhancing the contrast of the photoresist in a low-contrast exposure to light. The composition comprises, in addition to a watersol |
