| Patent Number |
Title Of Patent |
Date Issued |
| RE38254 |
Positive resist composition |
September 16, 2003 |
| Disclosed is an improved, chemically-amplifying positive resist composition for radiations, especially UV rays, deep-UV rays, excimer laser beams, X-rays, electron beams. The composition comprises (A) a resin component whose solubility in an alkaline aqueous solution is increased by the |
| D552565 |
Supporting plate |
October 9, 2007 |
|
| D544452 |
Supporting plate |
June 12, 2007 |
|
| 7449276 |
Positive photoresist composition and method for forming resist pattern |
November 11, 2008 |
| The invention provides a positive photoresist composition which exhibits a high level of etching resistance and attains high resolution, and enables the formation of a fine pattern using an electron beam exposure step, as well as a method for forming a resist pattern that uses the positi |
| 7442675 |
Cleaning composition and method of cleaning semiconductor substrate |
October 28, 2008 |
| A cleaning composition comprises at least quaternary ammonium hydroxide, a water-soluble organic solvent, water, an anticorrosive, and potassium hydroxide of 1 mass percent or less of a total amount of the solution. This cleaning composition can singly and effectively remove a photoresis |
| 7435530 |
Positive type resist composition and resist pattern formation method using same |
October 14, 2008 |
| A positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain sect |
| 7422839 |
Resin for positive resist composition, and positive resist composition using the same, laminate |
September 9, 2008 |
| The use of a positive resist composition that includes a resin with a specific structure improves the resolution and yields a resist pattern with a favorable shape. In addition, when a resist layer is formed on either a magnetic film or a metallic oxidation prevention film formed on |
| 7419769 |
Negative photoresist compositions for the formation of thick films, photoresist films and method |
September 2, 2008 |
| A negative photoresist composition is used for the formation of thick films and includes (A) a novolak resin, (B) a plasticizer, (C) a crosslinking agent and (D) an acid generator. The composition is applied onto a substrate and thereby yields a photoresist film 5 to 100 .mu.m thick. |
| 7416832 |
Positive resist composition |
August 26, 2008 |
| A positive resist composition capable of forming a resist pattern having excellent shape is provided. This composition is a positive resist composition including a base resin component (A) and an acid generator component (B) generating an acid under exposure, which are dissolved in a |
| 7407739 |
Resist developer and resist pattern formation method using same |
August 5, 2008 |
| A resist developer capable of forming a high resolution resist pattern with good shape and little film thinning is provided, together with a resist pattern formation method using such a developer. The resist developer is an aqueous solution comprising an ammonium hydroxide represente |
| 7407734 |
Resist composition for electron beam or EUV |
August 5, 2008 |
| A resist composition and a method of forming a resist pattern that enable contamination within the exposure apparatus to be prevented in lithography processes using an electron beam or EUV (extreme ultraviolet light). In this method, an organic solvent containing, as the principal co |
| 7402376 |
Photosensitive resin composition and photosensitive dry film containing the same |
July 22, 2008 |
| A photosensitive resin composition which gives a dry film having a sand blast proof property and a development property in a well-balanced manner. A photosensitive resin composition containing a carboxy group-containing urethane (meth)acrylate compound having two or more of (meth)acr |
| 7402372 |
Positive resist composition and method of forming resist pattern |
July 22, 2008 |
| A positive resist composition includes a resin (A) that increases alkali solubility due to action of an acid, wherein the resin comprises a copolymer containing a first structural unit (a1) derived from hydroxystyrene, and a second structural unit (a2) derived from a (meth)acrylate w |
| 7399575 |
Laminated photosensitive relief printing original plate and method for producing the relief prin |
July 15, 2008 |
| A relief printing original plate including a substrate, a photosensitive resin layer thereon that is photosensitive to ultraviolet radiations, and a mask layer thereon having both ultraviolet and non-ultraviolet absorbability, the ultraviolet absorbability being deactivatable in resp |
| 7390612 |
Positive type resist composition and resist pattern formation method using same |
June 24, 2008 |
| There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester |
| 7371510 |
Material for forming resist protecting film for use in liquid immersion lithography process, com |
May 13, 2008 |
| Provided are a material for forming a resist protecting film which is for use in a liquid immersion lithography process and which is formed on a resist film, wherein the material has the following properties of: being transparent with respect to exposure light; having substantially no |
| 7364831 |
Positive resist composition and resist pattern formation method |
April 29, 2008 |
| A positive resist composition includes a resin component (A) whose alkaline solubility changes by an action of an acid, an acid generator component (B), and polypropylene glycol, wherein the component (A) includes a resin component (A1) including a constitutional unit (a1) represente |
| 7358028 |
Chemically amplified positive photo resist composition and method for forming resist pattern |
April 15, 2008 |
| The present invention provides a chemical amplification type positive photoresist composition which is excellent in storage stability as a resist solution in a bottle. A novolak resin or a hydroxystyrenic resin is reacted with a crosslinking agent to give a slightly alkali-soluble or |
| 7335465 |
Developer composition for resists and method for formation of resist pattern |
February 26, 2008 |
| To provide a developer composition for resists, capable of improving dimensional controllability of a resist pattern. The developer composition for resists comprises an organic quaternary ammonium base as a main component, said developer composition further comprising an anionic surf |
| 7329478 |
Chemical amplified positive photo resist composition and method for forming resist pattern |
February 12, 2008 |
| To provide a chemical amplification type positive photoresist composition, which has high sensitivity, high heat resistance and high resolution (high contrast) and is capable of suppressing an undulation phenomenon, and a method for formation of a resist pattern, a chemical amplification |
| 7326515 |
Positive type resist composition and resist pattern formation method using same |
February 5, 2008 |
| There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester |
| 7326512 |
Polymer compound, resist composition and dissolution inhibitor agent containing the polymer comp |
February 5, 2008 |
| Provided are a polymer compound having high transparency for use in a photoresist composition for microfabrication of the next generation, a resist composition using the polymer compound as a base polymer, and a dissolution inhibitor agent composed of the polymer compound.To ensure e |
| 7323287 |
Positive type resist composition and resist pattern formation method using same |
January 29, 2008 |
| There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester |
| 7318992 |
Lift-off positive resist composition |
January 15, 2008 |
| A lift-off positive resist composition capable of forming a fine lift-off pattern is provided. This composition comprises a base resin component (A) and an acid generator component (B) generating an acid under exposure, wherein the base resin component (A) is a silicone resin. |
| 7316889 |
Positive type resist composition and resist pattern formation method using same |
January 8, 2008 |
| There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester |
| 7316888 |
Positive type resist composition and resist pattern formation method using same |
January 8, 2008 |
| There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester |
| 7316885 |
Method of forming resist pattern, positive resist composition, and layered product |
January 8, 2008 |
| There are provided a method of forming a resist pattern that enables the resist pattern to be formed with good control of the pattern size, as well as a positive resist composition used in the method, and a layered product formed using the positive resist composition. In the above method |
| 7312015 |
Process for refining crude resin for electronic material |
December 25, 2007 |
| A process is provided for effectively removing by-products such as oligomers contained within a crude resin for an electronic material, thus producing a resin for an electronic material. In this process, a crude resin for an electronic material containing (a1) structural units derived |
| 7300889 |
Method for forming a coating film on a plate-like workpiece |
November 27, 2007 |
| A method for forming a coating film, comprises the steps of: applying a raw material of a low dielectric constant onto a surface of a plate-like material; reducing oxygen concentration in the atmosphere surrounding the plate-like material to be less than or equal to 1% before a surface |
| 7276575 |
Process for refining crude resin for resist |
October 2, 2007 |
| A process for refining a crude resin for a resist which is capable of effectively removing by-products such as polymers and oligomers contained within the crude resin. The refining process for the crude resin of resist resin (A) used in a photoresist composition includes at least the |
| 7268061 |
Substrate attaching method |
September 11, 2007 |
| A method for attaching a substrate such as a semiconductor wafer in which cracking or chipping can be prevented when the substrate is thinned involves applying adhesive liquid onto a circuit (element)-formed surface of a semiconductor wafer. The adhesive liquid undergoes preliminary |
| 7264918 |
Resist composition for liquid immersion exposure process and method of forming resist pattern th |
September 4, 2007 |
| A resist composition for liquid immersion lithography process, which comprises: (A) a polymer comprising (a1) alkali-soluble constitutional units each comprising an alicyclic group having both (i) a fluorine atom or a fluoroalkyl group and (ii) an alcoholic hydroxyl group, wherein the |
| 7238462 |
Undercoating material for wiring, embedded material, and wiring formation method |
July 3, 2007 |
| This invention provides an undercoating layer material and a filler material containing a resin component having at least a substituent group which is capable of releasing a terminal group to form a sulfonic acid residue upon application of predetermined energy, and a solvent. The re |
| 7237967 |
Developing apparatus and method |
July 3, 2007 |
| A developing apparatus and method is provided in which the use amount of a developing solution can be reduced without deteriorating the accuracy of development. The developing apparatus comprises a new solution tank for storing an unused developing solution and a used solution tank for |
| 7235345 |
Agent for forming coating for narrowing patterns and method for forming fine pattern using the s |
June 26, 2007 |
| It is disclosed an over-coating agent for forming fine patterns which is applied to cover a substrate having photoresist patterns thereon and allowed to shrink under heat so that the spacing between the adjacent photoresist patterns is lessened, further characterized by containing a |
| 7211168 |
Substrate supporting plate and stripping method for supporting plate |
May 1, 2007 |
| There is provided a supporting plate having a structure in which a solvent can be supplied to an adhesive layer between the supporting plate and a substrate such as a semiconductor wafer in a short period of time after the substrate is thinned, and also a method for stripping the support |
| 7196898 |
Thin film capacitor, high-density packaging substrate incorporating thin film capacitor, and met |
March 27, 2007 |
| A capacitor capable of being incorporated into a packaging substrate, which capacitor includes a high-dielectric-constant layer, and an upper electrode layer and a lower electrode layer sandwiching the high-dielectric-constant layer from the upper side and the lower side. A packaging |
| 7192687 |
Positive resist composition and method of forming resist pattern using same |
March 20, 2007 |
| A positive resist composition capable of realizing an improvement in resolution, a reduction in LER, and a reduction in the level of defects, as well as a method of forming a resist pattern. This composition and method provide: a positive resist composition comprising a resin compo |
| 7189499 |
Method of forming fine patterns |
March 13, 2007 |
| It is disclosed a method of forming fine patterns comprising: covering a substrate having photoresist patterns with an over-coating agent for forming fine patterns, removing the unwanted over-coating agent that has been deposited on the edge portions and/or the back side of the subst |
| 7183368 |
Negative-working photoresist composition |
February 27, 2007 |
| Disclosed is a chemical-amplification negative-working photoresist composition used for photolithographic patterning in the manufacture of semiconductor devices suitable for patterning light-exposure to ArF excimer laser beams and capable of giving a high-resolution patterned resist |
| 7179399 |
Material for forming protective film |
February 20, 2007 |
| A material for forming a protective film comprising an organic solvent and a compound having at least two alicyclic structures. |
| 7172848 |
Chemical amplification type positive resist composition |
February 6, 2007 |
| There is provided a positive resist composition which enables the formation of a fine resist pattern, enables the angle of the taper shape within that resist pattern to be controlled to a suitable angle, and enables the formation of a resist pattern with an excellent depth width of f |
| 7169532 |
Chemically amplified positive photoresist composition for thick film, thick-film photoresist lam |
January 30, 2007 |
| A chemically amplified positive photoresist composition for thick film that is used for forming a thick-film photoresist layer with a film thickness of 10 to 150 .mu.m on top of a support, comprising (A) a compound that generates acid on irradiation with active light or radiation, (B |
| 7166184 |
Multi-stage type processing apparatus |
January 23, 2007 |
| A multi-stage type processing apparatus which can be positioned in a limited space without having a complicated driving mechanism, includes processing units which are stacked in a multi-stage state in the vertical direction. Each processing unit has a cup surrounding a substrate and a |
| 7158039 |
Liquid leakage sensor and liquid leakage detecting system |
January 2, 2007 |
| Among plural liquid leakage sensors placed at the lower most portion of a system such as a floor surface, a leaked liquid storing portion, etc., an error-activated location of the sensor can be easily identified uniquely when the sensor is detecting any abnormality. In a liquid leakage |
| 7153365 |
Tray for substrate |
December 26, 2006 |
| A tray, used for transferring a substrate and conducting a coating process, includes a recessed portion to accommodate a substrate, the depth of the recessed portion being substantially the same as the thickness of the substrate, and a one-step-lower gutter which is provided on an ou |
| 7153355 |
Coating solution for forming silica film |
December 26, 2006 |
| To provide a silica film-forming material having a low dielectric constant and giving a film of less undergoing change in aging, a coating solution for forming a silica film includes a hydrolysis product of a mixture comprising: a tetraalkoxysilane; and at least one of a monoalkyltri |
| 7150956 |
Chemical amplification type positive resist composition, resist laminated material, resist patte |
December 19, 2006 |
| The present invention provides a resist composition comprising (A) polyhydroxystyrene in which at least a portion of hydrogen atoms of hydroxyl groups are substituted with an acid-dissociable dissolution inhibiting group, and the solubility in an alkali solution of the polyhydroxysty |
| 7147984 |
Positive-working chemical-amplification photoresist composition |
December 12, 2006 |
| Disclosed is a positive-working chemical-amplification photoresist composition used in the patterning works in the manufacture of semiconductor devices, with which quite satisfactory patterning of a photoresist layer can be accomplished even on a substrate surface provided with an un |
| 7135064 |
Silica-based coating film on substrate and coating solution therefor |
November 14, 2006 |
| A silica-based coating film having a low dielectric constant not exceeding 2.5 can be formed on the surface of a substrate to serve as a planarizing layer or an interlayer insulating layer by coating the surface with a unique coating solution containing a hydrolysis-condensation product |
