| Patent Number |
Title Of Patent |
Date Issued |
| 5829969 |
Vertical heat treating apparatus |
November 3, 1998 |
| A vertical heat treating apparatus includes a first boat elevator for carrying a first wafer boat between a wafer transfer region and a predetermined position in a heat treating furnace, and a second boat elevator for carrying a second wafer boat between the wafer transfer region and |
| 5818596 |
Film thickness measuring apparatus |
October 6, 1998 |
| A sample is placed on a sample receiving stage for receiving the sample. The sample is transferred one at a time to a measuring table, and a thickness of a thin film formed on a surface of the sample is measured by irradiating the surface of the sample with a measuring light beam. A |
| 5813851 |
Heat treatment method |
September 29, 1998 |
| When a wafer boat having wafers, objects to be treated, placed thereon is loaded into a reaction tube, which is then raised in temperature by a heating section at a speed of 50.degree. C./min or more, a pressure reduction degree of the reaction tube is lowered or a hydrogen gas is su |
| 5780849 |
Apparatus for detecting objects to be transferred for use in semiconductor device fabrication ap |
July 14, 1998 |
| An apparatus for detecting objects to be transferred includes a wafer detecting unit having photo-sensors which scan a carrier moved up and down on a lift stage to detect wafers held on respective stages in the carrier, and an indication device provided vertically downward on the lift st |
| 5769952 |
Reduced pressure and normal pressure treatment apparatus |
June 23, 1998 |
| A reduced pressure treatment unit comprising a plurality of treatment chambers conducting reduced pressure process treatment of a treatment object (wafer) and a normal pressure treatment unit conducting normal pressure process treatment of the treatment object, which are connected by |
| 5704981 |
Processing apparatus for substrates to be processed |
January 6, 1998 |
| A partition member with a buffer plate disposed on the top surface thereof is disposed in a region belonging to a surface-to-be-processed of a substrate-to-be-processed held in a processing apparatus. An injector having cross-sectional areas decreasing toward the forward end thereof is |
| 5440206 |
Plasma processing apparatus comprising means for generating rotating magnetic field |
August 8, 1995 |
| In a plasma processing s including a processing chamber and plate-parallel electrodes, provided in the processing chamber, for generating a high-frequency electric field in response to a high-frequency voltage, a ring-shaped core is provided in the periphery of the processing chamber, |
| 5028791 |
Electron beam excitation ion source |
July 2, 1991 |
| An electron beam excitation ion source comprises a housing having an ion generation chamber therein. A discharge gas and an accelerated electrons are introduced into the ion generation chamber, causing the accelerated electrons to collide against the discharge gas to generate a plasma |
