| Patent Number |
Title Of Patent |
Date Issued |
| RE40052 |
Heat treatment apparatus |
February 12, 2008 |
| A heat treatment table is divided into two or more regions, a heater is disposed for each region. On a predetermined portion of the heat treatment table, a plurality of sensors are disposed separately each other. A relation between temperatures of the respective portions on the heat |
| RE40046 |
Processing system |
February 12, 2008 |
| A processing system has an upper electrode with gas discharge holes of a shape corresponding to the external we of insulating members. The insulating members are formed of a poly(ether etherketone) resin, a polyimide resin, a poly(ether imide) resin or the like. Each insulating membe |
| RE39969 |
Processing system |
January 1, 2008 |
| A processing system has an upper electrode with gas discharge holes of a shape corresponding to the external we of insulating members. The insulating members are formed of a poly(ether etherketone) resin, a polyimide resin, a poly (ether imide) resin or the like. Each insulating memb |
| RE39939 |
Processing system |
December 18, 2007 |
| A processing system has an upper electrode with gas discharge holes of a shape corresponding to the external we of insulating members. The insulating members are formed of a poly(ether etherketone) resin, a polyimide resin, a poly (ether imide) resin or the like. Each insulating memb |
| RE37470 |
Substrate processing apparatus and substrate processing method |
December 18, 2001 |
| A wafer processing apparatus includes a common path, extending in a Y-axis direction, in which one wafer or a plurality of wafers are conveyed, a plurality of process units stacked on both sides of the common path to constitute multi-stage structures, a main handler moved in the common p |
| RE36810 |
Plasma processing apparatus and method |
August 8, 2000 |
| A plasma processing apparatus comprises a first passage opened in a top of suscepter at a peripheral area thereof, a first gas supply source for supplying heat exchange gas into a small clearance between the suscepter and a wafer through the first passage, a first vacuum pump for exhaust |
| RE36371 |
Method of forming polycrystalline silicon film in process of manufacturing LCD |
November 2, 1999 |
| In a method of forming a polycrystalline silicon film in a process of manufacturing an LCD, a hydrogenated amorphous silicon film is formed on a glass substrate by plasam CVD throughout areas serving as the pixel portion and driver unit of the LCD. A laser beam is radiated on a selected |
| D581012 |
Middle plate for the shower head |
November 18, 2008 |
|
| D580894 |
Wafer boat |
November 18, 2008 |
|
| D579885 |
Upper heat insulating cylinder for manufacturing semiconductor wafers |
November 4, 2008 |
|
| D574843 |
Computer generated image for a display panel or screen |
August 12, 2008 |
|
| D574792 |
Lower heat insulating cylinder for manufacturing semiconductor wafers |
August 12, 2008 |
|
| D572733 |
Top panel for microwave introduction window of a plasma processing apparatus |
July 8, 2008 |
|
| D572707 |
Microwave introducing antenna for a plasma processing apparatus |
July 8, 2008 |
|
| D571833 |
Top panel for microwave introduction window of plasma processing apparatus |
June 24, 2008 |
|
| D571832 |
Top panel for microwave introduction window of a plasma processing apparatus |
June 24, 2008 |
|
| D571831 |
Top panel for microwave introduction window of a plasma processing apparatus |
June 24, 2008 |
|
| D571740 |
Semiconductor wafer delivery apparatus |
June 24, 2008 |
|
| D571739 |
Semiconductor wafer delivery apparatus |
June 24, 2008 |
|
| D571383 |
Top panel for microwave introduction window of a plasma processing apparatus |
June 17, 2008 |
|
| D570868 |
Computer generated image for a display panel or screen |
June 10, 2008 |
|
| D570310 |
Attracting plate of an electrostatic chuck for semiconductor manufacturing |
June 3, 2008 |
|
| D570309 |
Wafer boat |
June 3, 2008 |
|
| D570308 |
Wafer boat |
June 3, 2008 |
|
| D568837 |
Semiconductor wafer delivery apparatus |
May 13, 2008 |
|
| D564462 |
RF electrode for a process tube of semiconductor manufacturing apparatus |
March 18, 2008 |
|
| D563991 |
Computer generated image for a display panel or screen |
March 11, 2008 |
|
| D563990 |
Computer generated image for a display panel or screen |
March 11, 2008 |
|
| D563989 |
Computer generated image for a display panel or screen |
March 11, 2008 |
|
| D563988 |
Computer generated image for a image panel or screen |
March 11, 2008 |
|
| D563987 |
Computer generated image for a display panel or screen |
March 11, 2008 |
|
| D563984 |
Computer generated image for a display panel or screen |
March 11, 2008 |
|
| D563983 |
Computer generated image for a display panel or screen |
March 11, 2008 |
|
| D563951 |
Microwave introducing antenna for a plasma processing apparatus |
March 11, 2008 |
|
| D563950 |
Microwave introducing antenna for a plasma processing apparatus |
March 11, 2008 |
|
| D563949 |
Microwave introducing antenna for a plasma processing apparatus |
March 11, 2008 |
|
| D562524 |
Wafer transfer apparatus |
February 19, 2008 |
|
| D560284 |
Cover ring |
January 22, 2008 |
|
| D559994 |
Cover ring |
January 15, 2008 |
|
| D559993 |
Cover ring |
January 15, 2008 |
|
| D559806 |
Pair of stage arms for a semiconductor wafer delivery apparatus |
January 15, 2008 |
|
| D559805 |
Stage arm for a semiconductor wafer delivery apparatus |
January 15, 2008 |
|
| D556157 |
Load-lock chamber |
November 27, 2007 |
|
| D553104 |
Absorption board for an electric chuck used in semiconductor manufacture |
October 16, 2007 |
|
| D552138 |
Arm transferring substrate to be processed |
October 2, 2007 |
|
| D552047 |
Process tube for manufacturing semiconductor wafers |
October 2, 2007 |
|
| D551634 |
Wafer-boat for heat-processing of semiconductor wafers |
September 25, 2007 |
|
| D548705 |
Attracting disc for an electrostatic chuck for semiconductor production |
August 14, 2007 |
|
| D548200 |
Attracting disc for an electrostatic chuck for semiconductor production |
August 7, 2007 |
|
| D546784 |
Attracting disc for an electrostatic chuck for semiconductor production |
July 17, 2007 |
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