| Patent Number |
Title Of Patent |
Date Issued |
| RE40963 |
Method for plasma processing by shaping an induced electric field |
November 10, 2009 |
| A method for achieving a highly uniform plasma density on a substrate by shaping an induced electric field including the steps of positioning the substrate in a processing chamber, supplying a high frequency power to a spiral antenna generating an induced electric field in the processing |
| RE40052 |
Heat treatment apparatus |
February 12, 2008 |
| A heat treatment table is divided into two or more regions, a heater is disposed for each region. On a predetermined portion of the heat treatment table, a plurality of sensors are disposed separately each other. A relation between temperatures of the respective portions on the heat |
| RE40046 |
Processing system |
February 12, 2008 |
| A processing system has an upper electrode with gas discharge holes of a shape corresponding to the external we of insulating members. The insulating members are formed of a poly(ether etherketone) resin, a polyimide resin, a poly(ether imide) resin or the like. Each insulating membe |
| RE39969 |
Processing system |
January 1, 2008 |
| A processing system has an upper electrode with gas discharge holes of a shape corresponding to the external we of insulating members. The insulating members are formed of a poly(ether etherketone) resin, a polyimide resin, a poly (ether imide) resin or the like. Each insulating memb |
| RE39939 |
Processing system |
December 18, 2007 |
| A processing system has an upper electrode with gas discharge holes of a shape corresponding to the external we of insulating members. The insulating members are formed of a poly(ether etherketone) resin, a polyimide resin, a poly (ether imide) resin or the like. Each insulating memb |
| RE37470 |
Substrate processing apparatus and substrate processing method |
December 18, 2001 |
| A wafer processing apparatus includes a common path, extending in a Y-axis direction, in which one wafer or a plurality of wafers are conveyed, a plurality of process units stacked on both sides of the common path to constitute multi-stage structures, a main handler moved in the common p |
| RE36810 |
Plasma processing apparatus and method |
August 8, 2000 |
| A plasma processing apparatus comprises a first passage opened in a top of suscepter at a peripheral area thereof, a first gas supply source for supplying heat exchange gas into a small clearance between the suscepter and a wafer through the first passage, a first vacuum pump for exhaust |
| RE36371 |
Method of forming polycrystalline silicon film in process of manufacturing LCD |
November 2, 1999 |
| In a method of forming a polycrystalline silicon film in a process of manufacturing an LCD, a hydrogenated amorphous silicon film is formed on a glass substrate by plasam CVD throughout areas serving as the pixel portion and driver unit of the LCD. A laser beam is radiated on a selected |
| D604257 |
Heater for semiconductor manufacturing |
November 17, 2009 |
|
| D602882 |
Wafer carrying-in/out apparatus |
October 27, 2009 |
|
| D601979 |
Pedestal base of a heat insulating cylinder for manufacturing semiconductor wafers |
October 13, 2009 |
|
| D601521 |
Heater for manufacturing semiconductor |
October 6, 2009 |
|
| D600660 |
Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers |
September 22, 2009 |
|
| D600659 |
Process tube for manufacturing semiconductor wafers |
September 22, 2009 |
|
| D600222 |
Wafer boat |
September 15, 2009 |
|
| D600221 |
Wafer boat |
September 15, 2009 |
|
| D600220 |
Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers |
September 15, 2009 |
|
| D594488 |
Process tube for manufacturing semiconductor wafers |
June 16, 2009 |
|
| D594485 |
Top panel for microwave introduction window of a plasma processing apparatus |
June 16, 2009 |
|
| D593969 |
Processing chamber for manufacturing semiconductors |
June 9, 2009 |
|
| D593585 |
Top panel for microwave introduction window of a plasma processing apparatus |
June 2, 2009 |
|
| D593127 |
Computer generated image for a display panel or screen |
May 26, 2009 |
|
| D593119 |
Computer generated image for a display panel or screen |
May 26, 2009 |
|
| D592230 |
Wafer carrying-in/out machine |
May 12, 2009 |
|
| D591924 |
Arm for wafer transportation for manufacturing semiconductor wafers |
May 5, 2009 |
|
| D590359 |
Process tube for manufacturing semiconductor wafers or the like |
April 14, 2009 |
|
| D589977 |
Computer generated image for a display panel or screen |
April 7, 2009 |
|
| D589976 |
Computer generated image for a display panel or screen |
April 7, 2009 |
|
| D589912 |
Wafer holding member |
April 7, 2009 |
|
| D589474 |
Wafer holding member |
March 31, 2009 |
|
| D589472 |
Processing chamber for manufacturing semiconductors |
March 31, 2009 |
|
| D589471 |
Heater for manufacturing semiconductor |
March 31, 2009 |
|
| D589034 |
Microwave introducing antenna for a plasma processing apparatus |
March 24, 2009 |
|
| D588079 |
Heat dissipation deterrence link for semiconductor manufacture |
March 10, 2009 |
|
| D588078 |
Heat dissipation deterrence link for semiconductor manufacture |
March 10, 2009 |
|
| D587222 |
Attracting plate of an electrostatic chuck for semiconductor manufacturing |
February 24, 2009 |
|
| D586768 |
Process tube for manufacturing semiconductor wafers |
February 17, 2009 |
|
| D585905 |
Computer generated image for a display panel or screen |
February 3, 2009 |
|
| D585904 |
Computer generated image for a display panel or screen |
February 3, 2009 |
|
| D583395 |
Cover for a heater stage of a plasma processing apparatus |
December 23, 2008 |
|
| D583394 |
Cover for a heater stage of a plasma processing apparatus |
December 23, 2008 |
|
| D582949 |
Cover for a heater stage of a plasma processing apparatus |
December 16, 2008 |
|
| D581012 |
Middle plate for the shower head |
November 18, 2008 |
|
| D580894 |
Wafer boat |
November 18, 2008 |
|
| D579885 |
Upper heat insulating cylinder for manufacturing semiconductor wafers |
November 4, 2008 |
|
| D574843 |
Computer generated image for a display panel or screen |
August 12, 2008 |
|
| D574792 |
Lower heat insulating cylinder for manufacturing semiconductor wafers |
August 12, 2008 |
|
| D572733 |
Top panel for microwave introduction window of a plasma processing apparatus |
July 8, 2008 |
|
| D572707 |
Microwave introducing antenna for a plasma processing apparatus |
July 8, 2008 |
|
| D571833 |
Top panel for microwave introduction window of plasma processing apparatus |
June 24, 2008 |
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