| Patent Number |
Title Of Patent |
Date Issued |
| D341418 |
Supply nozzle for applying liquid resist to a semiconductor wafer |
November 16, 1993 |
|
| 6063190 |
Method of forming coating film and apparatus therefor |
May 16, 2000 |
| An apparatus for forming a coating film, comprises a spin chuck for supporting a substrate with one surface facing upward and rotating the substrate about a vertical axis, a first nozzle for supplying a solvent of a coating solution on the substrate, and a second nozzle for supplying the |
| 6054181 |
Method of substrate processing to form a film on multiple target objects |
April 25, 2000 |
| A method of subjecting a plurality of wafers to coating and beating treatments where a first boat is placed on a stage arranged in an interface section. The first boat is capable of containing the wafers stacked at intervals in a vertical direction. The stage is capable of moving in |
| 6022185 |
Substrate transferring device |
February 8, 2000 |
| A substrate transferring device including a pair of support arms for supporting LCD substrates substantially horizontally, expandable multi-joint link mechanisms for moving the support arms in a horizontal plane, a first motor for extending and retracting the link mechanisms, a rotar |
| 5965200 |
Processing apparatus and processing method |
October 12, 1999 |
| A develop processing apparatus is provided for processing an object with a developing solution, comprising a retaining member for rotatably retaining the object, a developing solution supply nozzle for supplying the developing solution to the object, a developing solution sucking nozzle |
| 5964954 |
Double-sided substrate cleaning apparatus and cleaning method using the same |
October 12, 1999 |
| There is provided a double-sided substrate cleaning apparatus including a carrier station for loading/unloading a carrier in which objects to be processed are stored, a convey mechanism for conveying an object taken out from the carrier station, at least one cleaning mechanism, arranged |
| 5942035 |
Solvent and resist spin coating apparatus |
August 24, 1999 |
| An apparatus for forming a coating film, comprises a spin chuck for supporting a substrate with one surface facing upward and rotating the substrate about a vertical axis, a first nozzle for supplying a solvent of a coating solution on the substrate, and a second nozzle for supplying the |
| 5882426 |
Method of cleaning a substrate by scrubbing |
March 16, 1999 |
| The present invention provides a cleaning method in which an object to be cleaned is held such that a surface of the object to be cleaned faces a cleaning body and the object to be cleaned and the cleaning body are moved relative to each other in a state where the cleaning body is in con |
| 5871584 |
Processing apparatus and processing method |
February 16, 1999 |
| A develop processing apparatus is provided for processing an object with a developing solution, comprising a retaining member for rotatably retaining the object, a developing solution supply nozzle for supplying the developing solution to the object, a developing solution sucking nozzle |
| 5853803 |
Resist processing method and apparatus |
December 29, 1998 |
| A method of resist-processing a rectangular substrate including a resist coating step of supplying resist solution to the substrate, while rotating it, to form resist film at least on one surface of it and a resist removing step of jetting removing liquid, which can solve resist, to both |
| 5826130 |
Apparatus and method for developing resist coated on substrate |
October 20, 1998 |
| A developing apparatus for developing a photoresist-coated substrate comprises a spin chuck having a supporting surface smaller in size than the substrate and adapted to be spin-driven with the photoresist-coated substrate surface held upward, a cup surrounding the spin chuck, a deve |
| 5826129 |
Substrate processing system |
October 20, 1998 |
| This invention provides a substrate processing system including a cassette station on which at least one cassette containing a plurality of objects is placed, a process station including a plurality of process chambers for performing processing for the objects, and an object conveying un |
| 5817156 |
Substrate heat treatment table apparatus |
October 6, 1998 |
| A substrate treatment apparatus according to an aspect of the invention includes a table for placing thereon an object to be treated, heating means for heating the object with the table interposed therebetween, and a plurality of support members which project from the table for supportin |
| 5803932 |
Resist processing apparatus having an interface section including two stacked substrate waiting |
September 8, 1998 |
| A processing system comprising a loading/unloading section, a processing section and an interface section. The system further comprises a convey mechanism and at least two waiting sections. The convey mechanism can move in either direction between between the loading/unloading section an |
| 5779796 |
Resist processing method and apparatus |
July 14, 1998 |
| The present invention provides a resist processing method for an object to be processed, including the processing step of supplying a process solution onto the object to be processed to perform a process on the object to be processed, and the cleaning step of supplying a cleaning sol |
| 5762745 |
Substrate processing apparatus |
June 9, 1998 |
| A substrate processing apparatus includes a plurality of easily removable processing units including at least a heating unit for heating a substrate and a cooling unit for cooling the substrate, and an outer frame having a plurality of compartments. Each compartment has an opening throug |
| 5759614 |
Resist processing method and apparatus |
June 2, 1998 |
| The present invention provides a resist processing method for an object to be processed, including the processing step of supplying a process solution onto the object to be processed to perform a process on the object to be processed, and the cleaning step of supplying a cleaning sol |
| 5725664 |
Semiconductor wafer processing apparatus including localized humidification between coating and |
March 10, 1998 |
| An apparatus for subjecting a plurality of wafers to coating and heating treatments, including a coating section for subjecting the wafers to a coating treatment one by one, a heating section for subjecting wafers which have undergone the coating treatment to a heating treatment all |
| 5718763 |
Resist processing apparatus for a rectangular substrate |
February 17, 1998 |
| A apparatus of resist-processing a rectangular substrate including a resist coating step of supplying resist solution to the substrate, while rotating it, to form resist film at least on one surface of it and a resist removing step of jetting removing liquid, which can solve resist, to b |
| 5711646 |
Substrate transfer apparatus |
January 27, 1998 |
| A substrate transfer apparatus for receiving and delivering a substrate among a plurality of process locations and transferring the substrate among the process locations comprises an apparatus body, a transfer member, movably provided on the apparatus body, for supporting and transfe |
| 5695817 |
Method of forming a coating film |
December 9, 1997 |
| A method of forming a coating film, in which the coating film is formed by supplying a coating liquid onto a surface of a substrate, while the substrate housed in a processing vessel is rotated together with the processing vessel, includes the steps of coating the surface of the subs |
| 5695562 |
Processing apparatus |
December 9, 1997 |
| A processing apparatus comprises a carrier rest portion for placing thereon carriers each of which stores a plurality of plate-like target bodies substantially horizontally with gaps therebetween in the vertical direction and which has a front surface forming a target body transfer p |
| 5689749 |
Apparatus for developing a resist-coated substrate |
November 18, 1997 |
| A developing apparatus for developing a photoresist-coated substrate comprises a spin chuck having a supporting surface smaller in size than the substrate and adapted to be spin-driven with the photoresist-coated substrate surface held upward, a cup surrounding the spin chuck, a deve |
| 5686143 |
Resist treating method |
November 11, 1997 |
| There is provided a double-sided substrate cleaning apparatus including a carrier station for loading/unloading a carrier in which objects to be processed are stored, a convey mechanism for conveying an object taken out from the carrier station, at least one cleaning mechanism, arranged |
| 5672205 |
Coating apparatus |
September 30, 1997 |
| According to the present invention, there is provided an coating apparatus including means for holding an object to be process, the object holding means rotating in a state in which the object is placed thereon, a ring-like cup situated on an outer side of the object holding means, p |
| 5671544 |
Substrate drying apparatus and substrate drying method |
September 30, 1997 |
| A substrate drying apparatus includes a process bath having an object containing region for containing an object to be treated, a treatment liquid containing region for containing a volatile treatment liquid, and heating member for evaporating the treatment liquid, a receiving contai |
| 5666381 |
Communication system used in semiconductor device manufacturing equipment |
September 9, 1997 |
| A communication system used in a semiconductor device manufacturing equipment includes a master side transmission unit having a master transmitting logic module for transmitting information in an inverted two-successive transmission mode in which information having non-inverted infor |
| 5665200 |
Substrate processing method and substrate processing apparatus |
September 9, 1997 |
| The present invention provides a substrate processing method including the coating step of coating a processing liquid on an object to be processed in a first processing unit of a processing chamber having first and second processing units, the step of conveying the object from the first |
| 5658615 |
Method of forming coating film and apparatus therefor |
August 19, 1997 |
| An apparatus for forming a coating film, comprises a spin chuck for supporting a substrate with one surface facing upward and rotating the substrate about a vertical axis, a first nozzle for supplying a solvent of a coating solution on the substrate, and a second nozzle for supplying the |
| 5636401 |
Cleaning apparatus and cleaning method |
June 10, 1997 |
| The present invention provides a cleaning apparatus having object holding means for holding an object to be cleaned such that a surface of the object to be cleaned faces a cleaning body and a cleaning mechanism for moving and rotating the cleaning body for cleaning the surface of the |
| 5626913 |
Resist processing method and apparatus |
May 6, 1997 |
| A invention provides a resist processing method for an object to be processed, including the processing step of supplying a process solution onto the object to be processed to perform a process on the object to be processed, and the cleaning step of supplying a cleaning solution onto the |
| 5625433 |
Apparatus and method for developing resist coated on a substrate |
April 29, 1997 |
| A developing apparatus comprising a spin chuck for rotating a wafer while keeping the wafer substantially horizontal with a resist-coated surface up, a nozzle for supplying developer, from above and obliquely, to the resist-coated surface of the wafer on the sign chuck, a source for |
| 5620560 |
Method and apparatus for heat-treating substrate |
April 15, 1997 |
| A heat-treating method of heating and cooling a substrate comprising the steps of carrying the wafer into a heat-treating section by a main arm and mounting the wafer on a heating stage, heating the wafer mounted on the heating stage, lifting the wafer thus heated from the heating stage, |
| 5620295 |
Transfer apparatus |
April 15, 1997 |
| A transfer apparatus for transferring a plurality of substrates between carriers holding these equidistantly arranged substrates thereon and a support member, comprising a carrier table for arranging a plurality of the carriers arranged in a serial array so as to hold the substrates |
| 5580607 |
Coating apparatus and method |
December 3, 1996 |
| A coating apparatus comprises a chuck on which a semiconductor wafer is adhered, a resist liquid supplying system for supplying a resist liquid to the semiconductor wafer, a motor for rotating the semiconductor wafer, thereby spreading the resist liquid over the semiconductor wafer, and |
| 5575079 |
Substrate drying apparatus and substrate drying method |
November 19, 1996 |
| A substrate drying apparatus includes a process bath having an object containing region for containing an object to be treated, a treatment liquid containing region for containing a volatile treatment liquid, and heating member for evaporating the treatment liquid, a receiving contai |
| 5566076 |
Semiconductor process system and positioning method and apparatus for transfer mechanism thereof |
October 15, 1996 |
| A semiconductor wafer cleaning system includes a chemical cleaning section having a process vessel. A holder is arranged in the process vessel. The holder holds 50 wafers at once. Fifty grooves for receiving peripheral portions of wafers are formed on the holder. Fifty wafers are pas |
| 5565034 |
Apparatus for processing substrates having a film formed on a surface of the substrate |
October 15, 1996 |
| A substrate processing apparatus according to this invention includes an interface section having a first transfer member for transferring an object from a coating process section for applying a process solution to the object in accordance with a single sheet process to an object holding |
| 5564889 |
Semiconductor treatment system and method for exchanging and treating substrate |
October 15, 1996 |
| A resist coating system for semiconductor wafers has a treatment unit and a transfer unit. The treatment unit has a plurality of treatment sections, and a transfer robot moves along the treatment sections. The transfer robot has a vertically movable driving block and first, and second an |
| 5518552 |
Method for scrubbing and cleaning substrate |
May 21, 1996 |
| A substrate scrubbing and cleaning method in which a substrate is carried to a rotatable scrubbing arrangement, and both surfaces of the substrate are scrubbed by the rotatable scrubbing arrangement while the substrate is maintained substantially horizontal. In addition, a cleaning solut |
| 5518542 |
Double-sided substrate cleaning apparatus |
May 21, 1996 |
| There is provided a double-sided substrate cleaning apparatus including a carrier station for loading/unloading a carrier in which objects to be processed are stored, a convey mechanism for conveying an object taken out from the carrier station, at least one cleaning mechanism, arranged |
| 5514852 |
Heat treatment device |
May 7, 1996 |
| A heat treatment device comprises a table of a thermal conductor located in a housing carrying an object of treatment thereon, and a treatment heat source located in the housing and by the table so that a bottom face of the table is opposite to a top face of the heat source, whereby the |
| 5505781 |
Hydrophobic processing apparatus including a liquid delivery system |
April 9, 1996 |
| An apparatus for hydrophobic treatment of a semiconductor wafer comprises a tank in which HMDS liquid is stored, a process chamber in which the wafer is treated, and a unit for supplying HMDS liquid from the tank into the process chamber in an amount needed at any desired time. The proce |
| 5505577 |
Transfer apparatus |
April 9, 1996 |
| A transfer apparatus comprising a carrier table for arranging a plurality of the carriers arranged in a serial array so as to hold the substrates mutually parallel to each other, a plurality of push-up members being adapted to be moved below each of the carriers for pushing up the su |
| 5503171 |
Substrates-washing apparatus |
April 2, 1996 |
| A substrates-washing apparatus includes a process vessel in which washing solution is stored to wash a plurality of substrates, a boat for holding the substrates parallel to one another in the process vessel, solution supply openings formed in the bottom of the process vessel, a solution |
| 5501870 |
Method and apparatus for hydrophobic treatment |
March 26, 1996 |
| Adhesion apparatus for applying a hydrophobic treatment to a semiconductor wafer comprises a tank housing a treating agent of liquid HMDS and a process chamber into which a mixed gas consisting of a vaporized HMDS coming from the tank and a carrier gas is supplied for applying a hydr |
| 5498294 |
Apparatus and method for washing substrates |
March 12, 1996 |
| A substrates-cleaning apparatus including a first unit provided with a scrubber for scrubbing a single side of a substrate, a second unit provided with a turning mechanism for turning the substrate upside down or vice versa, and a carrier robot for carrying the substrate between the |
| 5482068 |
Cleaning apparatus |
January 9, 1996 |
| A chemical cleaning section of a semiconductor wafer cleaning system has a processing vessel. Two cleaning liquid supplying ports are formed in a bottom portion of the vessel. A holder for holding a plurality of wafers at intervals is arranged in the vessel. A rectifying plate is arrange |
| 5460478 |
Method for processing wafer-shaped substrates |
October 24, 1995 |
| An apparatus for coating and developing a resist on a wafer comprises a carrier station provided with a plurality of carriers for receiving wafers and transfer tables, a processing section having a plurality of processing units, and a transfer robot provided between the carrier station a |
| 5445699 |
Processing apparatus with a gas distributor having back and forth parallel movement relative to |
August 29, 1995 |
| A processing apparatus comprising a reaction chamber, a workpiece-supporting section located in the reaction chamber for supporting a workpiece, a gas distributor located in the reaction chamber and facing the workpiece-supporting section for distributing reaction gas to a workpiece |
