| Patent Number |
Title Of Patent |
Date Issued |
| RE40519 |
Conductive fluoro-resin compositions |
September 23, 2008 |
| A conductive fluoro-resin composition of the addition reaction curing type is provided comprising (A) a reactive fluorinated polyether compound comprising fluorinated polyether units and having at least two aliphatic unsaturated hydrocarbon radicals in a molecule, (B) a compound having a |
| RE33737 |
Optical fiber coated with an organopolysiloxane curable actinic rays |
November 5, 1991 |
| The coated optical fiber of the invention is prepared by providing a coating layer of an ultraviolet-curable organopolysiloxane or a composition comprising the same and irradiating the coating layer with ultraviolet. Specifically, each of the terminal silicon atoms of the organopolys |
| RE33284 |
Method for the polymerization of vinyl chloride monomer in an aqeous medium |
July 31, 1990 |
| The invention provides an improvement in the suspension polymerization of vinyl chloride in an aqueous medium in the presence of a monomer-soluble polymerization initiator, according to which the amount of polymer scale deposition on the reactor walls can be greatly decreased. The improv |
| RE32813 |
Method for the suspension polymerization of vinyl chloride monomer |
December 27, 1988 |
| The invention provides an improvement in the suspension polymerization of vinyl chloride or a monomer mixture mainly composed of vinyl chloride in an aqueous medium containing a nonionic surface active agent and in the presence of a monomer-soluble polymerization initiator, according to |
| RE32717 |
Method for the preparation of N-methyl-N-trimethylsilyl trifluoroacetamide |
July 19, 1988 |
| N-Methyl-N-trimethylsilyl trifluoroacetamide can be synthesized by the reaction of N-methyl trifluoroacetamide and, N,O-bis(trimethylsilyl) acetamide at 40.degree.-130.degree. C. followed by fractionating distillation. The method is advantageous in respect of the absence of the step |
| D346891 |
Sports underpants |
May 17, 1994 |
|
| 7452955 |
One part organopolysiloxane gel composition |
November 18, 2008 |
| In a one part organopolysiloxane gel composition comprising an alkenyl-containing branched organopolysiloxane, an SiH-termined organohydrogenpolysiloxane, and an addition reaction catalyst, the catalyst is obtained by heat aging a mixing of a platinum complex having an alkenyl-contai |
| 7452928 |
Cold water-soluble polymer particles and method for preparing the same |
November 18, 2008 |
| A method for preparing cold water-soluble polymer particles is described. The method includes subjecting a liquid containing a wetting agent or a powder of the wetting agent to dropping or spraying over or mixing with a starting water-soluble polymer particles while fluidizing the starti |
| 7452571 |
Method of sealing semiconductor element mounted on gold-plated printed circuit board |
November 18, 2008 |
| Methods of sealing a semiconductor element are provided. The methods includes the steps of coating a semiconductor element mounted on a gold-plated printed circuit board with a curable silicone resin, and then curing the curable silicone resin. In a method, the gold-plated printed ci |
| 7449540 |
Curable silicone composition |
November 11, 2008 |
| A composition comprising (A) polycycloolefin-functional polysiloxane represented by the following average compositional formula (1) ##STR00001## wherein R.sup.1 is a monovalent organic group which does not have an unsaturated bond and may be different from each other, k is the numbe |
| 7438831 |
Zirconium or hafnium and manganese-containing oxides |
October 21, 2008 |
| Oxo-acid salts, halogenated oxo-acid salts, double oxides or complex oxides contain 0.001-10 atom % of Zr or Hf and 0.001-5 atom % of Mn. They emit radiation in the visible range of 390-750 nm when excited with vacuum-ultraviolet radiation. |
| 7438783 |
Plasma processing apparatus and plasma processing method |
October 21, 2008 |
| Disclosed is a plasma processing apparatus and a plasma processing method. A substrate to be processed is accommodated in a vacuum chamber within which a plasma generator is provided so as to generate plasma for use in performing plasma processing on the substrate. Outside the vacuum cha |
| 7438768 |
Rare earth element sintered magnet and method for producing rare earth element sintered magnet |
October 21, 2008 |
| Hydrogen embrittlement is prevented in Sm.sub.2Co.sub.17-based magnets and R.sub.2Fe.sub.14B-based magnets by metal plating the magnet, then carrying out heat treatment, or by forming a metal oxide or metal nitride layer on the metal plating layer or directly on the magnet itself. |
| 7432603 |
Semiconductor encapsulating epoxy resin composition and semiconductor device |
October 7, 2008 |
| In an epoxy resin composition comprising (A) an epoxy resin, (B) a curing agent, (C) an inorganic compound, and (D) an inorganic filler, the inorganic compound (C) is an oxide of metal elements at least one of which is a metal element of Group II in the Periodic Table having a second |
| 7432313 |
Solvent-free polymide silicone resin composition and a cured resin film thereof |
October 7, 2008 |
| A solvent-free polyimide silicone resin composition comprising (a) a polyimide silicone resin having repeating units represented by the following formula (1-1) and repeating units represented by the following formula (1-2), a film of said resin with a thickness of 100 .mu.m prepare |
| 7432235 |
Low-foaming silicone composition comprising a polyoxyalkylene/perfluoroalkyl-comodified organopo |
October 7, 2008 |
| Provided is a low-foaming silicone composition, including: (A) from 51 to 99.9 parts by mass of a polyoxyalkylene-modified organopolysiloxane having a specific structure, (B) from 0.1 to 49 parts by mass of a polyoxyalkylene/perfluoroalkyl-comodified organopolysiloxane having a speci |
| 7432023 |
Method for producing a pellicle for lithography |
October 7, 2008 |
| There is provided a pellicle for lithography which has at least, a pellicle film for dustproof protection, a pellicle frame to which the pellicle film is adhered, an adhesive layer provided on one end face of the pellicle frame in order to adhere the pellicle film, and a sticking lay |
| 7431899 |
Apparatus for the continuous production of silicon oxide powder |
October 7, 2008 |
| A silicon oxide powder can be continuously prepared by feeding a raw material powder mixture containing silicon dioxide powder into a reaction chamber (2) at a temperature of 1,100-1,600.degree. C., to produce a silicon oxide gas, transferring the silicon oxide gas to a deposition ch |
| 7427464 |
Patterning process and undercoat-forming material |
September 23, 2008 |
| A pattern is formed by applying an undercoat layer comprising a naphthol-dicyclopentadiene copolycondensate on a processable substrate as an antireflective film, applying a photoresist layer over the undercoat layer, exposing the photoresist layer to radiation, developing the resist |
| 7425390 |
Preparation of halftone phase shift mask blank |
September 16, 2008 |
| In preparing a halftone phase shift mask blank, a metal and silicon-containing compound film serving as a halftone phase shift film is formed on a transparent substrate by a co-sputtering process including the steps of disposing a metal-containing target and a silicon target in a cha |
| 7425373 |
Primer composition |
September 16, 2008 |
| A primer composition comprising a compound containing an epoxy group, a Si--H group, and an aromatic ring per molecule, and a solvent is effective for assisting in integral molding or bonding a silicone rubber to an adherend of gold, silver or platinum. |
| 7425283 |
Cyclic carbonate-modified siloxane, method of making, non-aqueous electrolytic solution, seconda |
September 16, 2008 |
| A siloxane modified with a cyclic carbonate of the formula: ##STR00001## is combined with a non-aqueous solvent and an electrolyte salt to form a non-aqueous electrolytic solution, which is used to construct a secondary battery having improved temperature and cycle characteristics. |
| 7420075 |
Preparation of organohalosilanes |
September 2, 2008 |
| Organohalosilanes are prepared by charging a reactor with a contact mass of metallic silicon and a catalyst and feeding an organohalide-containing gas to the reactor. Tin or a tin compound is used as the catalyst. Then organohalosilanes can be produced quite efficiently at a high reactio |
| 7420015 |
Flame retardant silicone compositions |
September 2, 2008 |
| A silicone composition comprising (A) an organopolysiloxane having at least one lower alkenyl group in a molecule, (B) an organohydrogenpolysiloxane having at least two SiH groups in a molecule, (C) a platinum catalyst, and (D) at least one compound selected from among indoline, 1,2, |
| 7419749 |
Halftone phase shift mask blank, halftone phase shift mask and their preparation |
September 2, 2008 |
| In a halftone phase shift mask blank comprising a halftone phase shift film on a substrate which is transparent to exposure light, the halftone phase shift film comprises a metal, silicon, and optionally oxygen and nitrogen. The halftone phase shift film experiences a phase difference |
| 7419567 |
Plasma processing apparatus and method |
September 2, 2008 |
| A plasma processing apparatus includes a worktable in a process chamber to horizontally place a target substrate thereon. A plasma generation space is defined above and around the worktable within the process chamber. The plasma generation space includes a peripheral plasma region and a |
| 7417104 |
Porous film-forming composition, patterning process, and porous sacrificial film |
August 26, 2008 |
| A porous film-forming composition is provided comprising (A) a polymer obtained by hydrolytic condensation of a hydrolyzable silane having formula (1): R.sup.1.sub.n--Si--R.sup.2.sub.4-n (1) wherein R.sup.1 is a monovalent organic group or hydrogen, R.sup.2 is a hydrolyzable group or |
| 7417078 |
Electromagnetic wave absorbing thermally conductive composition and thermosoftening electromagne |
August 26, 2008 |
| An electromagnetic wave absorbing heat conductive composition is used to form an electromagnetic wave absorbing heat dissipating article that is placed between a heat generating electronic component which, when operated, generates heat, reaches a temperature higher than room temperat |
| 7416833 |
Photoresist undercoat-forming material and patterning process |
August 26, 2008 |
| An undercoat-forming material comprising a copolymer derived from an indene and a compound having a hydroxyl or epoxy group and a double bond, an organic solvent, an acid generator, and a crosslinker, optionally combined with an intermediate layer having an antireflective effect, has |
| 7414096 |
Solvent-free silicone composition for release paper |
August 19, 2008 |
| A solvent-free silicone composition for release paper, comprising: (A) an organopolysiloxane represented by the following average compositional formula (1) ##STR00001## (B) an organopolysiloxane represented by the following average compositional formula (2) ##STR00002## (C) a |
| 7414086 |
Room temperature-curable organopolysiloxane compositions |
August 19, 2008 |
| RTV organopolysiloxane compositions comprising (A) a diorganopolysiloxane having hydroxyl or alkoxysilyl groups at both ends, (B) a polyoxypropylene-modified silicone, (C) wet silica, and (D) a silane or siloxane having at least three silicon-bonded hydrolyzable groups have improved |
| 7413744 |
Cosmetic preparation |
August 19, 2008 |
| A cosmetic comprising the organopolysiloxane wax represented by the following formula (1), ##STR00001## wherein R.sup.1 is a group selected from the group consisting of alkyl groups having 1 to 20 carbon atoms, alicyclic groups, aryl groups, aralkyl groups and fluorinated alkyl gr |
| 7405503 |
Permanent magnet rotating electric machine |
July 29, 2008 |
| The present invention provides a rotating electric machine in which damage to a magnet from heat is prevented, eddy current loss is reduced while decreasing an eddy current generated in a permanent magnet, and furthermore, time and cost for manufacturing can be reduced. The present i |
| 7405459 |
Semiconductor device comprising porous film |
July 29, 2008 |
| The present invention provides a zeolite sol which can be formed into a porous film that can be thinned to an intended thickness by a method used in the ordinary semiconductor process, that excels in dielectric properties, adhesion, film consistency and mechanical strength, and that |
| 7405316 |
Organosilicon compounds |
July 29, 2008 |
| Silyl ketene acetal compounds having a partial structure of formula (1) wherein R and R.sup.2 each are a monovalent C.sub.1-C.sub.12 hydrocarbon group and n is an integer of 1-6 are useful as a terminal alkoxysilylating agent, surface treating agent, storage stabilizer, curing agent |
| 7405244 |
Solvent-free polyimide silicone resin composition and a resin film composed of the same |
July 29, 2008 |
| A solvent-free resin composition comprising (a) a polyimide silicone resin having repeating units represented by the following general formulas (1-1) and (1-2), ##STR00001## wherein X is a tetravalent organic group, Y is a divalent organic group, and Z is a divalent organic group having |
| 7402621 |
Porous-film-forming composition, preparation method of the composition, porous film and semicond |
July 22, 2008 |
| The invention provides a coating solution for forming a porous film having excellent mechanical strength and dielectric properties and for easily forming a film with a freely controlled film thickness in an ordinarily employed method in semiconductor process. More specifically, provided |
| 7396867 |
Organopolysiloxane composition for bonding to magnesium alloy |
July 8, 2008 |
| An organopolysiloxane composition for bonding to magnesium alloys comprises (A) 100 parts by weight of an organopolysiloxane of the following general formula (1) and/or (2) ##STR00001## wherein R may be the same or different and represents a substituted or unsubstituted monovalent h |
| 7396633 |
Chemically amplified resist composition and manufacturing method of semiconductor integrated cir |
July 8, 2008 |
| With the damascene process in which an interconnection is formed using a conventional chemically amplified positive photoresist composition, there arises a problem that the photoresist within the via hole (as well as in its vicinity) may remain even after the exposure and the development |
| 7393893 |
Curable organopolysiloxane composition and mother mold for cast molding |
July 1, 2008 |
| A curable organopolysiloxane composition is provided, which is capable of generating a silicone rubber mother mold with improved mold release durability. The composition includes (A) 100 parts by mass of an organopolysiloxane containing at least two Si-bonded alkenyl groups within ea |
| 7391291 |
Sealed rare earth magnet and method for manufacturing the same |
June 24, 2008 |
| It is an object of the present invention to provide a rare earth magnet that will not decompose due to hydrogen embrittlement when used in a hydrogen gas atmosphere, and furthermore, does not pose the risk of contaminating a reaction bath with the surface treated film of the magnet. |
| 7390436 |
Zirconium or hafnium-containing oxides |
June 24, 2008 |
| Oxo-acid salts, double oxides or complex oxides contain 0.001-10 atom % of Zr or Hf. They emit near-ultraviolet radiation when excited with vacuum-ultraviolet radiation. |
| 7385021 |
Sacrificial film-forming composition, patterning process, sacrificial film and removal method |
June 10, 2008 |
| A sacrificial film-forming composition is provided comprising (A) an organofunctional silicone resin which is a co-hydrolytic condensate of hydrolyzable silanes having formula (1) and formula (2) and/or (3): X--Y--SiZ.sub.3 (1) R.sub.nSiZ.sub.4-n (2) P--SiZ.sub.3 (3) wherein Z |
| 7378548 |
Tertiary amine compounds having an ester structure and processes for preparing the same |
May 27, 2008 |
| The present invention provides ester group-containing tertiary amine compounds of the formula (R.sup.1OCH.sub.2CH.sub.2).sub.nN(CH.sub.2CH.sub.2CO.sub.2R.sup.2).sub.3-- n which, when used as additives in chemical amplification photolithography, can yield photoresists having a high res |
| 7378218 |
Polymer, resist composition and patterning process |
May 27, 2008 |
| A fluorinated polymer comprising recurring units of formulae (1a) to (1d) and having a Mw of 1,000-500,000 is provided. R.sup.1 is an acid labile group, R.sup.2 is a single bond or methylene, a1, a2, a3, and a4 are numbers from more than 0 to less than 1, and 0<a1+a2+a3+a4.ltoreq.1, b |
| 7378215 |
Positive photoresist composition |
May 27, 2008 |
| A positive photoresist composition comprising an alkali-soluble resin, a 1,2-quinonediazide compound, an organic solvent, and a fluorinated organosilicon compound of formula (1) serving as a surfactant can be effectively coated to uniformity over large areas and is improved in resist |
| 7374819 |
Release film |
May 20, 2008 |
| A release film comprising a plastic film substrate 3, a first layer 1 provided on at least one side of the substrate, and a second layer 2 provided on the first layer 1. The second layer 2 functions as a release layer and the first layer 1 as an adhesive layer to fix the second layer |
| 7374612 |
Method of producing single-polarized lithium tantalate crystal and single-polarized lithium tant |
May 20, 2008 |
| A method of producing a lithium-tantalate crystal comprising, at least subjecting a single-polarized lithium-tantalate crystal wherein an optical absorption coefficient at a wave number of 3480 cm.sup.-1 is 0.3 cm.sup.-1 or less to a heat treatment under a reducing atmosphere at a te |
| 7368588 |
Preparation of sulfide chain-bearing organosilicon compounds |
May 6, 2008 |
| By reacting a mixture of a halogenoalkyl group-bearing organosilicon compound and sulfur with an aqueous solution or water dispersion of an ammonium or alkali metal sulfide or a hydrate thereof in the presence of a phase transfer catalyst, a sulfide chain-bearing organosilicon compound |
| 7368495 |
Flame-retardant resin composition free from halogen |
May 6, 2008 |
| The invention discloses a flame-retardant thermoplastic resin composition without containing any halogen compounds as a flame-retardant agent but still exhibiting excellent flame retardancy. The resin composition comprises: (a) a thermoplastic resin kneadable or moldable at a tempera |
