| Patent Number |
Title Of Patent |
Date Issued |
| D338024 |
Holder for carrying wafers |
August 3, 1993 |
|
| D332340 |
Carrier basket |
January 5, 1993 |
|
| 5371950 |
Isopropyl alcohol vapor dryer system |
December 13, 1994 |
| Microprocessor controlled isopropyl alcohol vapor dryer system for robotic drying of wafer cassettes containing wafers or substrates. A wetted wafer or substrate is robotically placed into a virgin isopropyl alcohol vapor zone. The wetted surface and free-moving contaminants are replaced |
| 5248393 |
Solvent reprocessing system |
September 28, 1993 |
| A compact solvent reprocessing system for use in a limited physical area. Solvents to be reprocessed is contacted by deionized water in a water wash column and delivered to a distillation column where waste solvent is separated from materials that boil at a higher temperature than the wa |
| 5167808 |
Deionized water purification system |
December 1, 1992 |
| A DI water purification system for the point-of-use purification of water in applications demanding the highest quality of water. The system includes the following components: 1. dual submicron filters of 0.2 micron rating in parallel, housed in chemically inert housings; 2. a stacke |
| 5054210 |
Isopropyl alcohol vapor dryer system |
October 8, 1991 |
| Microprocessor controlled isopropyl alcohol vapor dryer system for robotic drying of wafer cassettes containing wafers or substrates. A wetted wafer or substrate is robotically placed into a virgin isopropyl alcohol vapor zone. The wetted surface and free-moving contaminants are replaced |
| 5038808 |
High frequency ultrasonic system |
August 13, 1991 |
| A high frequency ultrasonic system for sonically removing particles from substrates or wafers held in a carrier or carriers in a tank of liquid, such as DI water. A frame encompasses the tank and supports the transducer housing at an angle with respect to the tank bottom and also provide |
