| |
 |
P & I Corp. Patents |
|
Assignee: P & I Corp.
Address: Seoul, KR
No. of patents: 1
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| 7309405 |
Method of forming ITO film |
December 18, 2007 |
| Disclosed is a method of forming an ITO film by optimized sequential sputter deposition of seed and bulk layers having different sputter process conditions, which is applicable to various display devices, and more particularly, to an organic light-emitting device needing an ultra-pla |
|
|
|
