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OnTrak Systems, Inc. Patents
Assignee:
OnTrak Systems, Inc.
Address:
Milpitas, CA
No. of patents:
31
Patents:












Patent Number Title Of Patent Date Issued
6059889 Method for processing a substrate using a system having a roller with treading May 9, 2000
A method for rotating wafers in a double sided scrubber where a rotating roller imparts rotary motion to a semiconductor wafer during a double sided cleaning process. The rotating roller and wafer contact at their outer edges and the friction between their outer edges causes the wafer to
6003185 Hesitation free roller December 21, 1999
A method and apparatus for rotating wafers in a scrubber, wherein both sides of a wafer are scrubbed without slipping or hesitating. A rotating roller imparts rotary motion to a semiconductor wafer during a cleaning process wherein both sides of a wafer are scrubbed. The rotating roller
5975736 Scrubber control system November 2, 1999
A control system. An apparatus having a motor; a host processor for generating a message containing motor control information; a control board for receiving the message and for transmitting a command, corresponding to the message, to the motor; and a communications medium coupling the ho
5924154 Brush assembly apparatus July 20, 1999
A semiconductor processing system, such as a system for scrubbing both sides of a wafer at the same time, that includes a brush box containment apparatus for use with highly-acidic or other volatile chemical solutions, a roller positioning apparatus and a (brush) placement device.
5913714 Method for dressing a polishing pad during polishing of a semiconductor wafer June 22, 1999
A polishing pad dressing method uses a polishing head for polishing a semiconductor wafer. This polishing head includes a housing, a wafer carrier movably mounted to the housing, and a pad dressing element movably mounted to the housing. The wafer carrier forms a wafer-supporting sur
5868863 Method and apparatus for cleaning of semiconductor substrates using hydrofluoric acid (HF) February 9, 1999
A cleaning method and apparatus using very dilute hydrofluoric acid (HF) for cleaning silicon wafers and semiconductor substrates. The HF is delivered to the core of a brush where the solution is absorbed by the brush and then applied by the brush onto the substrate. This delivery sy
5862560 Roller with treading and system including the same January 26, 1999
A method and apparatus for rotating wafers in a double sided scrubber where a rotating roller imparts rotary motion to a semiconductor wafer during a double sided cleaning process. The rotating roller and wafer contact at their outer edges and the friction between their outer edges cause
5861066 Method and apparatus for cleaning edges of contaminated substrates January 19, 1999
A method and apparatus for cleaning edges of substrates is described. The present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based on friction and/or a difference in tangential velocity at a point of contact between the wafer and the cleaning
5858109 Method and apparatus for cleaning of semiconductor substrates using standard clean 1 (SC1) January 12, 1999
A cleaning method and apparatus using very dilute Standard Clean 1 (SC1) for cleaning semiconductor substrates, including silicon wafers. The SC1 is delivered to the core of a brush where the solution is absorbed by the brush and then applied by the brush onto the substrate. This deliver
5857899 Wafer polishing head with pad dressing element January 12, 1999
A polishing head for polishing a semiconductor wafer includes a housing, a wafer carrier movably mounted to the housing, and a pad dressing element movably mounted to the housing. The wafer carrier forms a wafer-supporting surface, and the dressing element surrounds the wafer-supporting
5851041 Wafer holder with spindle assembly and wafer holder actuator December 22, 1998
An improved wafer holder with spindle assembly and wafer holder actuator is disclosed. In one embodiment, the vertical motion of a shaft drives an arm positioning member in a rotational motion. The arm positioning member is coupled to a first position of an arm such that the arm moves in
5840129 Hesitation free roller November 24, 1998
A method and apparatus for rotating wafers in a double sided scrubber without slipping or hesitating. A rotating roller imparts rotary motion to a semiconductor wafer during a double sided cleaning process. The rotating roller and wafer contact at their outer edges and the friction betwe
5809832 Roller positioning apparatus September 22, 1998
A semiconductor processing system, such as a system for scrubbing both sides of a wafer at the same time, that includes a brush box containment apparatus for use with highly-acidic or other volatile chemical solutions, a roller positioning apparatus and a (brush) placement device.
5806126 Apparatus for a brush assembly September 15, 1998
A Method and Apparatus for Chemical Delivery Through the Brush used in semiconductor substrate cleaning processes. The chemical solutions are delivered to the core of a brush where the solution is absorbed by the brush and then applied by the brush onto the substrate. This delivery s
5803799 Wafer polishing head September 8, 1998
A polishing head for polishing a semiconductor wafer includes a housing, a wafer carrier movably mounted to the housing, and a wafer retainer movably mounted to the housing. The wafer carrier forms a wafer supporting surface, and the wafer retainer is shaped to retain a wafer in place on
5800248 Control of chemical-mechanical polishing rate across a substrate surface September 1, 1998
A technique for controlling a polishing rate across a substrate surface when performing CMP, in order to obtain uniform polishing of the substrate surface. A support housing which underlies a polishing pad includes a plurality of openings for dispensing a pressurized fluid. The openings
5794299 Containment apparatus August 18, 1998
A semiconductor processing system, such as a system for scrubbing both sides of a wafer at the same time, that includes a brush box containment apparatus for use with highly-acidic or other volatile chemical solutions, a roller positioning apparatus and a (brush) placement device.
5762084 Megasonic bath June 9, 1998
A megasonic bath with horizontal wafer orientation that may be conveniently interfaced with brush scrub systems. The megasonic transducer creates a sonic energy flow in the direction of the wafers. The sonic energy causes cavitation which loosens and displaces particles from the surface
5745946 Substrate processing system May 5, 1998
An improved substrate processing system. The system may be used for double sided scrubbing of a semiconductor substrate. The wet stations of the system has covers which prevent accumulated liquid from dripping outside of the station and which minimize dripping on the substrates. Transpor
5727332 Contamination control in substrate processing system March 17, 1998
An improved substrate processing system. The system may be used for double sided scrubbing of a semiconductor substrate. The wet stations of the system has covers which prevent accumulated liquid from dripping outside of the station and which minimize dripping on the substrates. Transpor
5692947 Linear polisher and method for semiconductor wafer planarization December 2, 1997
A wafer polisher and method for the chemical mechanical planarization of semiconductor wafers. The polisher includes a wafer holder for supporting the semiconductor wafer and a linear polishing assembly having a polishing member positioned to engage the surface of the wafer. The polishin
5606251 Method and apparatus for detecting a substrate in a substrate processing system February 25, 1997
An improved substrate processing system. The system may be used for double sided scrubbing of a semiconductor substrate. The wet stations of the system has covers which prevent accumulated liquid from dripping outside of the station and which minimize dripping on the substrates. Transpor
5593344 Wafer polishing machine with fluid bearings and drive systems January 14, 1997
A semi-conductor wafer polishing machine having a polishing pad assembly and a wafer holder includes a support positioned adjacent the polishing pad assembly. This support has at least one fluid inlet connectable to a source of fluid at a higher pressure, at least one fluid outlet co
5575707 Polishing pad cluster for polishing a semiconductor wafer November 19, 1996
A polishing pad cluster for polishing a semiconductor wafer having multiple integrated circuit dies includes a pad support and multiple polishing pads. Each pad has a polishing area substantially smaller than the wafer but not substantially smaller than an individual one of the integrate
5571044 Wafer holder for semiconductor wafer polishing machine November 5, 1996
A semi-conductor wafer polishing machine having at least one polishing pad assembly and at least one wafer holder positioned to hold a semi-conductor wafer against the polishing pad assembly includes a joint having two axes of rotation intersecting at a center of rotation. A wafer chuck
5566466 Spindle assembly with improved wafer holder October 22, 1996
A wafer holder which grips a wafer by its edges is disclosed. The wafer holder is mounted on a spindle assembly which spins the wafer so held, for example, to spin dry both the front and back side of the wafer. The wafer holder includes two pairs of wafer holding bumpers, each pair coupl
5558568 Wafer polishing machine with fluid bearings September 24, 1996
A semi-conductor wafer polishing machine having a polishing pad assembly and a wafer holder includes a support positioned adjacent the polishing pad assembly. The support includes multiple fluid bearings that support the polishing pad assembly on the support. These fluid bearings are
5555177 Method and apparatus for resetting individual processes in a control system September 10, 1996
A method and apparatus for resetting a process in a control system. The steps in this method involve identifying a process for a portion of a double-sided wafer scrubber. Then, the process is reset.
5529638 Method for wafer scrubbing June 25, 1996
A wet indexer for receiving a cassette of wafers from a previous processing station that have not been allowed to dry. The wet indexer then keeps the wafers submersed in processing solution before and during indexed transmission to later cleaning stations.
5475889 Automatically adjustable brush assembly for cleaning semiconductor wafers December 19, 1995
An automatically adjustable brush assembly for cleaning semiconductor wafers. The brush assembly includes a first rotary brush, a brush carriage having first and second arms and a second rotary brush, and at least one pressure adjustment assembly positioned to engage at least one of the
5442828 Double-sided wafer scrubber with a wet submersing silicon wafer indexer August 22, 1995
An embodiment of the present invention is a wet indexer for receiving a cassette of wafers from a previous processing station that have not been allowed to dry. The wet indexer then keeps the wafers submersed in processing solution before and during indexed transmission to later clea

 
 
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