| Patent Number |
Title Of Patent |
Date Issued |
| 7619364 |
UV continuous spectrum lamp and its lighting device |
November 17, 2009 |
| To increase radiation intensity of deuterium lamp with continuous spectrum in UV region including vacuum UV in order to enable the lamp to illuminate wide area in high intensity. A pair of electrodes 7 and 8 is covered with dielectrics, placed outside of a UV transparent tubular disc |
| 7614031 |
Drawing apparatus with drawing data correction function |
November 3, 2009 |
| A data correcting apparatus is for correcting drawing data representing a drawing pattern included in a quadrangular drawing area of a drawing subject. The correction process is based on an ideal position and an actual position of the drawing area on the drawing subject. An actual ou |
| 7502510 |
Vector-graphic data processing method and drawing apparatus |
March 10, 2009 |
| In a data processing method, all information on a figure to be drawn, as vector-graphic data representing said figure, is transmitted to a drawing apparatus. The vector-graphic data is processed to form an image, as raster-graphic data representing the figure, and the run length data is |
| 7336391 |
Multi-exposure drawing method and apparatus therefor |
February 26, 2008 |
| In a multi-exposure drawing method for drawing a pattern on a drawing surface, using an exposure unit including a plurality of optical modulation elements arranged in a matrix manner, the unit is continuously and relatively moved at a constant velocity with respect to the drawing sur |
| 7295885 |
Multi-exposure drawing method and apparatus thereof for dividing an exposing area into exposed z |
November 13, 2007 |
| In a drawing method, all information on a pattern to be drawn on a drawing surface, represented by first vector-graphic data of a drawing-coordinate-system, is transmitted to an exposure drawing apparatus having a plurality of optical modulation elements. The first vector-graphic dat |
| 7248333 |
Apparatus with light-modulating unit for forming pattern |
July 24, 2007 |
| An apparatus for forming a pattern has a light-modulating unit, a scanner, a pattern data processor, a light modulating controller, a position-error detector, and a correction value calculator. The pattern data processor generates band-pattern data corresponding to each scanning band on |
| 7136087 |
Multi-exposure drawing method and apparatus therefor |
November 14, 2006 |
| In a multi-exposure drawing method for drawing a pattern on a drawing surface, using an exposure unit including a plurality of optical modulation elements arranged in both a first array-direction and a second array-direction, the exposure unit is moved in relation to the drawing surf |
| 7119882 |
Apparatus and method for projection exposure |
October 10, 2006 |
| An apparatus for projection exposure which projects a pattern of a mask onto a work is provided. The apparatus has a base, a source of light, an optical system, a mask support mechanism, a work support mechanism and an alignment mechanism. The optical system constitutes light rays into |
| 7119875 |
Apparatus for forming pattern |
October 10, 2006 |
| An apparatus for forming a pattern has a scanning-time setter, a time-error detector, a scanning-time corrector, a pulse data selector, and a control pulse signal generator. The scanning-time setter sets a "fine-section scanning-time" as a pass-time of the beam for each section of a |
| 7075965 |
Wavelength conversion laser apparatus |
July 11, 2006 |
| The present invention is a wavelength conversion laser apparatus for converting wavelength by utilizing a nonlinear optical crystal and capable of safely using it over a long time. For this end, the fundamental wave laser light emitted from the pumping chamber unit 3 which is a solid |
| 7058094 |
Q-switch laser device |
June 6, 2006 |
| A Q-switch laser device for outputting a pulse laser from an optical resonator is equipped with a Q-switch for changing high/low values of a Q-value for the resonator; a switch-pulse generation means for generating a switch pulse with a frequency for determining a repetition period of |
| 7006197 |
Optical projection system |
February 28, 2006 |
| An optical projection system irradiating a projection light on a work. This optical projection system includes a reflector provided with a first reflection surface and a second reflection surface which reflect the projection light and change a traveling direction of the projection li |
| 6947465 |
Solid state laser |
September 20, 2005 |
| The solid state laser comprises the laser medium 11 for absorbing the pumping light 12 from the LD 10 and generating or amplifying the light having a predetermined wavelength and a heat sink comprising the first block 15a, the second block 15b and the third block 15c for aligning the |
| 6879378 |
Exposure apparatus and method of conveying mask and work |
April 12, 2005 |
| An exposure apparatus includes a first transferring passage and a second transferring passage arranged at two different levels between a load/unload position and an exposure position, a first table and a second table one positioned in the load/unload position while the other position |
| 6806945 |
Automatic exposing apparatus and method for exposing both sides of works |
October 19, 2004 |
| An automatic both sides exposing apparatus 1 is provided, and includes a first exposing mechanism 10 having a first mask and the second exposing mechanism 20 having a second mask; a carrying-in portion 2 and a carrying-out portion 30; an optical system for exposing the substrate; and |
| 6731074 |
Electrode-less lamp equipment |
May 4, 2004 |
| An electrode-less lamp equipment with higher luminance by higher lamp-cooling efficiency wherein the airflow generated by the blower 9 goes through the ventilation hole 12 and spouts out from the open end of the lamp-cooling nozzle 15 and cools the surface of the electrode-less lamp 1 |
| 6720733 |
Electrodeless lamp system |
April 13, 2004 |
| An emission element enclosed inside an electrodeless lamp 5 is excited by an electromagnetic field of a microwave irradiated from a magnetron 2 for emitting light from the electrodeless lamp 5. A soft-starting method is provided such that an electric power enough to drive the magnetron 2 |
| 6657390 |
Short-arc discharge lamp |
December 2, 2003 |
| To realize high irradiation efficiency and intensity stability for extending lifetime of the short-arc discharge lamp to be used for IC exposure apparatus or the like. For this end, mercury and rare gases are sealed in the inner space 21 of the discharge tube 1. The rare gases are a |
| 6525472 |
Dielectric barrier discharge lamp |
February 25, 2003 |
| The present invention is directed to a dielectric barrier discharge lamp capable of recovering reduced radiation efficiency by easily, quickly cleaning dust or discoloring of a discharge tube or replacing any defective discharge tube. For this end, an internal electrode 22 in a form |
| 6379103 |
Substrate transfer apparatus |
April 30, 2002 |
| The present invention provides a substrate transfer apparatus which can hold the substrate without contacting the surface of the substrate while the substrate is transferred and which does not require the additional prealignment mechanism. The substrate is transferred by a handler. The |
| 6294869 |
High intensity light irradiation apparatus |
September 25, 2001 |
| The present invention is designed to provide a high intensity light irradiation apparatus having a simpler, lighter, easy to assemble and replace support member for a dielectric barrier electrical discharge lamp. The dielectric barrier electrical discharge lamp 1 comprises concentric |
| 6258495 |
Process for aligning work and mask |
July 10, 2001 |
| A mechanism for aligning a work and a mask, which comprising a camera which picks up an image of a mask mark for aligning a mask having a pattern and an image of a work mark of a work, a control mechanism which recognizes, memorizes, and control the positions of both marks, and, a moving |
| 6227926 |
Construction of electrode for high pressure discharge lamp and process for producing the same |
May 8, 2001 |
| In a construction of electrode for a high pressure discharge lamp used with maintaining a high input of electricity, which discharge lamp comprises a valve composed of a luminescence tube having a swelled portion at the middle thereof, and an anode and a cathode placed opposite to each o |
| 6215247 |
Construction of electrode for high pressure discharge lamp and process for producing the same |
April 10, 2001 |
| A high pressure discharge lamp comprises a portion composed of a luminescence tube having a swelled portion at the middle thereof, and an anode and a cathode placed opposite to each other, the cathode is composed of a metal with a high melting temperature doped with a electron-emitting |
| 6114815 |
Device and process for lighting discharge lamp |
September 5, 2000 |
| A device for lighting a discharge lamp comprises a rectifier, a switching circuit having a semiconductor element to be connected to said rectifier; a direct power supplying circuit having a rectifying circuit and filtering circuit each connected to said switching circuit; and a discharge |
| 5656939 |
Apparatus for measuring hardness of ultraviolet curing transformation agent comprising stain and |
August 12, 1997 |
| An apparatus for measuring hardness of an ultraviolet curing transformation agent comprising a stain of the present invention comprises a light source device for emitting beams including ultraviolet rays, an optical filter member through which the ultraviolet rays having a predetermined |
| 5606172 |
Exposing apparatus and exposing method of works |
February 25, 1997 |
| An exposing apparatus provided with a first alignment stage B, a first exposing stage C, a reverse stage D, a second alignmen stage E and a second exposing stage F in which the first alignment stage B, the reverse stage D and the second alignment stage E being provided in a straight line |
| 5563682 |
Exposing apparatus with mask alignment system and method of aligning, exposing and transferring |
October 8, 1996 |
| In an exposing apparatus including an alignment stage A, an exposing stage B, transferring mechanisms 10 and 11 provided in the alignment stage and the exposing stage, a light source device 9, and an image-taking device for taking the images of the work W from the top of the work, the ex |
| 5390025 |
Method of locating work in automatic exposing apparatus |
February 14, 1995 |
| A work locating method for an automatic exposing apparatus is provided. In addition to a step of delivering a work Wa from a feed-in section onto an alignment table 13a on an alignment stand in a locating section which is provided separately from an exposing section, and subjecting the w |
| 5258808 |
Exposure apparatus for forming image |
November 2, 1993 |
| An appropriate photochemical reaction is produced in electrodeposited photoresist applied to the surface of a board and to the inner wall surfaces of holes extending through the board, for improving the efficiency of the operation of image formation. Upper and lower ultraviolet illum |
| 5185625 |
Exposure apparatus for forming pattern on printed-wiring board |
February 9, 1993 |
| An exposure apparatus having upper and lower ultraviolet rays irradiating devices which are vertically symmetrically disposed above and below a pattern-forming board having through holes therein, and upper and lower light-transmissible plates which are disposed spacedly from each other i |
| 5168302 |
Apparatus for permeating irradiated light |
December 1, 1992 |
| A light permeating apparatus preferably employable for an exposing equipment, a drying equipment, a printing equipment for forming a pattern on a printed circuit board is disclosed. The apparatus includes an opposing pair of light permeable plates, a casing fixedly secured to the lig |
| 5150253 |
Reflective mirror having cooling unit attached thereto |
September 22, 1992 |
| A reflective mirror having a cooling unit attached thereto is provided with a layer of material deposited on the surface of a glass plate. This material has such properties that most of ultraviolet rays in a light beam emitted from a light source are reflected from the reflective surface |
| 5147130 |
Cooling liquid recirculation system for light source unit |
September 15, 1992 |
| In a cooling liquid recirculation system, walls of transparent jacket tubes for cooling a mercury-vapor lamp, which jacket tubes are provided separately from the mercury-vapor in accordance with the prior art are formed in optical filters to thereby decrease the temperature of an object |
| 5119127 |
Photoresist exposure method and apparatus therefor |
June 2, 1992 |
| A photoresist exposure apparatus in which a photoresist is coated by electrodeposition on the surface of a printed circuit board. The apparatus operates to expose the printed circuit board, which has been subjected to through-hole plating, to light through a film. The apparatus includes |
| 5037722 |
Photoresist exposure method and apparatus therefor |
August 6, 1991 |
| A photoresist exposure method in which a photoresist that is coated by electrodeposition on the surface of a printed circuit board having been subjected to through-hole plating and on the inner wall surfaces of through-holes therein is exposed to light through a film, comprises the f |
| 4996763 |
Method of locating work in automatic exposing apparatus |
March 5, 1991 |
| A work to be exposed to light beams in an exposing section is fitted to an alignment table in an automatic aligning apparatus under the effect of suction caused by a suction unit. Then, cameras for optically recognizing alignment marks in the form of images are displaced to positions whe |
| 4973850 |
Variable incident angle exposure apparatus |
November 27, 1990 |
| A variable incident angle exposure apparatus wherein the incident angle of exposure light can be set as desired. The apparatus comprises a cold type elliptical reflecting mirror provided in a casing having a window for exposure at which a workpiece is disposed, a spot light source for |
| 4866351 |
Annular light source unit using electrodeless discharge and a method of lighting the same |
September 12, 1989 |
| Disclosed are an annular light source unit using electrodeless discharge and a method of lighting the same. The unit comprises an annular electrodeless discharge tube, a bowl-shaped microwave cavity device, and a plurality of microwave oscillators. The cavity unit is disposed in such a |
| 4854004 |
Device for clearing the hole blockage of a liquid resist substrate |
August 8, 1989 |
| Disclosed is a device for clearing the hole blockage of a liquid resist substrate. The liquid resist substrate has a substrate formed with holes and coated on its upper surface with a liquid resist. The device has a blowing-off means which is intended to blow off the portions of the liqu |
| 4850710 |
Method of measuring and displaying double refraction occurring in a material to be measured |
July 25, 1989 |
| Disclosed is a method of measuring and displaying double refraction. In this method measuring light which has been subjected to double refraction passes through the material to be measured at a point of measurement thereof. A surface of the material to be measured is disposed in a manner |
| 4764791 |
Work alignment apparatus for double-sided exposure of a work |
August 16, 1988 |
| Disclosed is a work alignment apparatus for double-sided exposure of a work which serves to convey to and locate the work in an exposing position such that the work is exposed on either side thereof between printing frames each holding an image mask on each corresponding side of the work |
| 4721980 |
Transfer type each-side exposure apparatus |
January 26, 1988 |
| Disclosed is a transfer type each-side exposure apparatus which comprises light sources which oppose each other and transfer means which transfer materials to be exposed between the light sources. In one aspect, the apparatus further comprises light shielding means which prevent the |
| 4716442 |
Exposure device and exposure control method |
December 29, 1987 |
| In an exposure device, the light rays emitted from a light source and radiated at an illumination surface, the light rays directly incident to the illuminated surface, the light rays incident to the illuminated surface at greater angles of incidents and the light rays which cause the |
| 4707773 |
Parallel light moving type exposure apparatus |
November 17, 1987 |
| A parallel light moving type exposure apparatus including a light source adapted to cause parallel lights to be obtained by the lights reflected from a parabolic reflector, said light source and a material to be exposed being moved relative to each other to perform the exposure, comprise |
| 4682277 |
Movable light source type exposure apparatus |
July 21, 1987 |
| A movable light-source type exposure apparatus comprising a light source disposed at the focal point of a parabolic reflector, a first light-shielding member disposed right beneath the light source and intended to prevent the light rays from the light source from being irradiated dir |
| 4673294 |
Film thickness measuring apparatus employing microprojector of spectral reflection measurement |
June 16, 1987 |
| A film thickness measuring apparatus comprising an optical measuring system and an optical projecting system is disclosed. The conventional optical measuring system includes a light source, a first optical system, a monochromator, a second optical system and a photomultiplier tube an |
| 4666305 |
Film thickness measuring apparatus employing intensity compensation device of spectral reflectiv |
May 19, 1987 |
| An improved film thickness measuring apparatus including an optical measuring system, a detective photomultiplier tube, a corrective photomultiplier tube, a control circuit and a signal processing section. Measuring of the film thickness of a sample material is carried out with the u |
| 4645349 |
Method of measuring film thickness |
February 24, 1987 |
| An improved method of measuring film thickness of the film layer on a certain material is disclosed. The method is carried out by way of the steps of measuring reflection intensity spectrum, determining extreme values of wavelength relative to the spectrum, preparing an expected value |
| 4599297 |
Method of manufacturing printed boards |
July 8, 1986 |
| At least one strip of dry film assembly is supplied continuously to a plurality of mutually spaced apart boards which are also being fed continuously. The film assembly consists of a photosensitive layer sandwiched between a protective film and a base. The base is removed from the as |
