| Patent Number |
Title Of Patent |
Date Issued |
| D576647 |
Nozzle for vapor-phase epitaxial equipment |
September 9, 2008 |
|
| 7619230 |
Charged particle beam writing method and apparatus and readable storage medium |
November 17, 2009 |
| A charged particle beam writing method includes inputting pattern data for writing a writing region, predicting a writing time for writing the pattern of the pattern data, acquiring, by using a correlation among a time required from a writing start time, the predicted writing time and a |
| 7612347 |
Charged particle beam apparatus and charged particle beam resolution measurement method |
November 3, 2009 |
| A charged particle beam apparatus in accordance with one preferred form of this invention includes an irradiation unit for irradiating a charged particle beam, an instrumentation unit which performs instrumentation of a reflection signal from a mark as obtained by scanning the mark while |
| 7608845 |
Charged particle beam writing apparatus and method thereof, and method for resizing dimension va |
October 27, 2009 |
| A charged particle beam writing apparatus includes a first part configured, based on pattern data, to estimate a total writing time, a second part configured to acquire a base dose at an arbitrary time, after writing start time and within the total writing time by using a first corre |
| 7608528 |
Substrate cover, and charged particle beam writing apparatus and method |
October 27, 2009 |
| A substrate cover includes a frame-like member configured to be placed on a substrate which is to be written using a charged particle beam, and to have an outer perimeter dimension larger than a perimeter end of the substrate and an inner perimeter dimension, being a border between the |
| 7605383 |
Pattern writing apparatus using charged particle beam, and program-recorded readable recording m |
October 20, 2009 |
| A charged particle beam pattern writing apparatus includes an input part for inputting a predetermined command, a check part for checking a state of a predetermined function used for pattern writing using a charged particle beam, based on the predetermined command, and an output part for |
| 7601968 |
Charged particle beam writing method and apparatus |
October 13, 2009 |
| A charged particle beam writing method includes irradiating a shot of a charged particle beam, and deflecting the charged particle beam of the shot using a plurality of deflectors arranged on an optical path of the charged particle beam to write a pattern on a target object, wherein any |
| 7598504 |
Writing error diagnosis method for charged particle beam photolithography apparatus and charged |
October 6, 2009 |
| A writing error diagnosis method for a charged beam photolithography apparatus and a charged beam photolithography apparatus which can specify an error cause within a short period of time in occurrence of a pattern writing error are provided. The writing error diagnosis method for a |
| 7592611 |
Creation method and conversion method of charged particle beam writing data, and writing method |
September 22, 2009 |
| A creation method of charged particle beam writing data for writing a pattern using a charged particle beam based on design data of circuits includes creating, based on the design data, a location data file including location data, as part of the writing data, the location data being |
| 7589335 |
Charged-particle beam pattern writing method and apparatus and software program for use therein |
September 15, 2009 |
| A charged particle beam pattern writing apparatus in accordance with one preferred form of this invention includes an atmospheric pressure measuring unit which measures the value of an atmosphere air pressure, a coordinate value corrector which corrects three-dimensional (3D) coordin |
| 7554107 |
Writing method and writing apparatus of charged particle beam, positional deviation measuring me |
June 30, 2009 |
| A charged particle beam writing method includes measuring a topography of a backside of a substrate without an influence of a gravity sag, calculating a first positional deviation amount of a pattern written on a frontside of the substrate in a case of the backside of the substrate h |
| 7544951 |
Electron gun assembly |
June 9, 2009 |
| A device which employs an electron beam, for performing a desired function, includes an electron gun for generating the electron beam. The electron gun includes a barrel shaped rotatable structure having a plurality of annularly disposed electron sources. A curvature of a surface por |
| 7525110 |
Multiple irradiation effect-corrected dose determination technique for charged particle beam lit |
April 28, 2009 |
| A charged-particle beam microlithographic apparatus is generally made up of a pattern writing unit and a system controller. The writer has an electron beam source and a pattern generator for forming a pattern image on a workpiece. The system controller includes a unit for correcting |
| 7521689 |
Deflector for equipment of electron beam lithography and equipment of electron beam lithography |
April 21, 2009 |
| A deflector for an equipment of electron beam lithography, the deflector including a plurality of control electrodes arranged symmetrically relative to the center axis of an irradiated electron beam, the electrodes configured to control the electron beam by applying voltages respecti |
| 7514660 |
Focusing apparatus, focusing method, and inspection apparatus |
April 7, 2009 |
| A focusing apparatus includes a first sensor and a second sensor configured to receive an optical image of a target workpiece to be inspected and convert it photoelectrically, a first optical system configured to make the optical image be focused on the first sensor, a second optical |
| 7511290 |
Charged particle beam writing method and apparatus |
March 31, 2009 |
| A method for writing a pattern on a workpiece by use of a charged particle beam, the method includes calculating a corrected dose including at least a proximity effect correction dose for correction of proximity effect, calculating a corrected residual difference-corrected dose for corre |
| 7504645 |
Method of forming pattern writing data by using charged particle beam |
March 17, 2009 |
| A method of forming pattern writing data to write a predetermined pattern from layout data of a circuit by using a charged particle beam while deflecting the charged particle beam, includes inputting the layout data including a pattern ranging over a plurality of deflection regions, |
| 7495243 |
Writing method of charged particle beam, support apparatus of charged particle beam writing appa |
February 24, 2009 |
| A charged particle beam writing method includes inputting design pattern data, virtually dividing a writing area to be written with the design pattern data into a plurality of small areas in a mesh-like manner, calculating a pattern density in each of the plurality of small areas bas |
| 7485879 |
Electron beam writing apparatus and writing method |
February 3, 2009 |
| A writing apparatus including a selector unit responsive to receipt of input data of a pattern to be written by shots of irradiation of an electron beam, configured to select a current density of the electron beam being shot and a maximal shot size thereof based on the input data of |
| 7476881 |
Charged beam drawing apparatus and charged beam drawing method |
January 13, 2009 |
| There is provided a charged beam drawing apparatus which includes main/sub two-stage deflectors, divides a main deflection drawing region on a sample into sub deflection drawing regions determined by the deflection width of the sub deflector, selects one of the sub deflection drawing |
| 7463173 |
Charged particle beam apparatus, abnormality detecting method for DA converter unit, charged par |
December 9, 2008 |
| A charged particle beam apparatus includes a plurality of digital-analog (DA) converter units configured to input digital signals, convert the digital signals into analog values, and amplify the analog values to output the analog values, a deflector configured to input at least one a |
| 7394048 |
Focusing device, focusing method and a pattern inspecting apparatus |
July 1, 2008 |
| A focusing device comprises a first imaging optical system, a second imaging optical system which splits the optical image in the direction of an AF sensor and further splits the optical image so that a front focus image in which the point that is in focus is in front of the optical |
