| Patent Number |
Title Of Patent |
Date Issued |
| RE40221 |
Object observation apparatus and object observation |
April 8, 2008 |
| This invention relates to an object observation apparatus and observation method. The object observation apparatus is characterized by including a drivable stage on which a sample is placed, an irradiation optical system which is arranged to face the sample on the stage, and emits an ele |
| RE39846 |
Illumination optical apparatus and scanning exposure apparatus |
September 18, 2007 |
| An illumination optical apparatus for illuminating an object to be illuminated in an arcuate or rectangular shape. A first optical integrator forms a plurality of light source images in a substantially linear arrangement, based on a beam of parallel rays. Then a second optical integr |
| RE39662 |
Projection exposure apparatus |
May 29, 2007 |
| A projection exposure apparatus includes illuminating optical means for illuminating a projection negative, and projection optical means for projection-exposing the projection negative illuminated by the illuminating optical means onto a substrate, the illuminating optical means incl |
| RE39296 |
Catadioptric projection systems |
September 19, 2006 |
| Catadioptric projection systems are disclosed for projecting an illuminated region of a reticle onto a corresponding region on a substrate. The systems are preferably used with ultraviolet light sources (e.g., 193 nm). The systems comprise a first imaging system, a concave mirror, an |
| RE39120 |
Ceramic sintered product and process for producing the same |
June 6, 2006 |
| Low thermal expansion ceramics contains a cordierite crystal phase, wherein a phase of a crystalline compound containing at least one element selected from the group consisting of an alkaline earth element other than Mg, a rare earth element, Ga and In, is precipitated in the grain b |
| RE39083 |
Projection exposure apparatus |
May 2, 2006 |
| Constant speed drive of a reticle and a wafer in a relative scanning direction and positioning of the reticle and the wafer are simultaneously performed with high precision by a slit scanning exposure scheme. A reticle side scanning stage for scanning a reticle relative to a slit-lik |
| RE39024 |
Exposure apparatus having catadioptric projection optical system |
March 21, 2006 |
| To use a beam splitting optical system smaller than the conventional beam splitters and to set a longer optical path between a concave, reflective mirror and an image plant. A light beam from an object surface travels through a first converging group to enter a beam splitter, and a light |
| RE38798 |
Projection exposure apparatus |
September 20, 2005 |
| Constant speed drive of a reticle and a wafer in a relative scanning direction and positioning of the reticle and the wafer are simultaneously performed with high precision by a slit scanning exposure scheme. A reticle side scanning stage for scanning a reticle relative to a slit-like |
| RE38541 |
Camera equipped with data imprinting device |
June 29, 2004 |
| A camera with a data imprinting device includes a generally triangular space adjacent a film spool. A roller, used to conform the film to the film spool is urged into the triangular space when the film diameter on the roller approaches a maximum diameter. A portion of an optical system |
| RE38465 |
Exposure apparatus |
March 16, 2004 |
| A projection optical system of the present invention has a first lens group G.sub.1 being positive, a second lens group G.sub.2 being negative, a third lens group G.sub.3 being positive, a fourth lens group G.sub.4 being negative, a fifth lens group G.sub.5 being positive, and a sixth le |
| RE38438 |
Catadioptric reduction projection optical system and exposure apparatus having the same |
February 24, 2004 |
| A catadioptric projection optical system is provided, which can use a beam splitting optical system smaller in size than a conventional polarizing beam splitter, can set a long optical path from a concave reflecting mirror to an image plane, allows easy adjustment of the optical system, |
| RE38421 |
Exposure apparatus having catadioptric projection optical system |
February 10, 2004 |
| To use a beam splitting optical system smaller than the conventional beam splitters and to set a longer optical path between a concave, reflective mirror and an image plane. A light beam from an object surface travels through a first converging group to enter a beam splitter, and a light |
| RE38403 |
Projection optical system and projection exposure apparatus |
January 27, 2004 |
| In the projection optical system that projects an image of the first object onto the second object with a fixed reduction ratio and a projection aligner equipped therewith, said projection optical system comprises, viewed from said first object side, in order of succession, the first |
| RE38320 |
Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the te |
November 18, 2003 |
| A projection optical system of a projection exposure apparatus according to the present invention has a plurality of optical members made of glass materials at least one of which has a temperature characteristic of index of refraction different from that of the other glass material. Furt |
| RE38176 |
Scanning exposure method |
July 8, 2003 |
| A step-and-scan exposure method .Iadd.and a scanning exposure apparatus .Iaddend.in which a mask has a plurality of patterns and the number of patterns to be transferred to each shot area of a photosensitive substrate varies. The scanning and stepping movements are controlled in accordan |
| RE38113 |
Method of driving mask stage and method of mask alignment |
May 6, 2003 |
| In a scanning-type projection exposure system, curvature of a movable mirror that is used to measure mask stage coordinate positions is determined while the mask stage is moved in the scanning direction, by measuring coordinate positions, perpendicular to the scan direction, of the m |
| RE38085 |
Exposure method and projection exposure apparatus |
April 22, 2003 |
| A projection exposure apparatus carries out scan exposure with illumination flux of slit(s) by moving a mask and a substrate in a direction of one-dimension at synchronized speeds with each other. The mask is inclined with a predetermined angle relative to the substrate in the direction |
| RE38038 |
Exposure method and projection exposure apparatus |
March 18, 2003 |
| A projection exposure apparatus carries out scan exposure with illumination flux of slit(s) by moving a mask and a substrate in a direction of one-dimension at synchronized speeds with each other. The mask is inclined with a predetermined angle relative to the substrate in the direction |
| RE37946 |
Exposure method and projection exposure apparatus |
December 31, 2002 |
| A projection exposure apparatus carries out scan exposure with illumination flux of slit(s) by moving a mask and a substrate in a direction of one-dimension at synchronized speeds with each other. The mask is inclined with a predetermined angle relative to the substrate in the direction |
| RE37913 |
Exposure method and projection exposure apparatus |
November 26, 2002 |
| A projection exposure apparatus carries out scan exposure with illumination flux of slit(s) by moving a mask and a substrate in a direction of one-dimension at synchronized speeds with each other. The mask is inclined with a predetermined angle relative to the substrate in the direction |
| RE37846 |
Projection optical system and exposure apparatus using the same |
September 17, 2002 |
| The present invention relates to an exposure apparatus using a projection optical system to realize a small size and the bitelecentricity as securing a wide exposure area and a large numerical aperture and to realize extremely good correction for aberrations, particularly for distort |
| RE37762 |
Scanning exposure apparatus and exposure method |
June 25, 2002 |
| The present invention is directed to scanning exposure apparatus and exposure method to achieve simultaneous projection of images of plural regions on a mask onto a photosensitive substrate with correcting an orthogonality error of a pattern on the mask or photosensitive substrate. I |
| RE37391 |
Exposure method and projection exposure apparatus |
September 25, 2001 |
| A projection exposure apparatus carries out scan exposure with illumination flux of slit(s) by moving a mask and a substrate in a direction of one-dimension at synchronized speeds with each other. The mask is inclined with a predetermined angle relative to the substrate in the direction |
| RE37361 |
Scanning type exposure apparatus and exposure method |
September 11, 2001 |
| .[.In a scanning type exposure apparatus for exposing an entire surface of a pattern region on a mask to a substrate by scanning the mask and the substrate with respect to a projection optical system in a predetermined direction with a speed ratio in accordance with a magnification of th |
| RE37359 |
Projection exposure method and apparatus capable of performing focus detection with high accurac |
September 11, 2001 |
| A projection exposure apparatus comprises a projection optical system for projecting a pattern of a mask on a photosensitive substrate, a stage, for holding the photosensitive substrate, movable in an optical-axis direction of the projection optical system and in a direction perpendicula |
| RE37352 |
Projection optical apparatus |
September 4, 2001 |
| A projection optical apparatus for projection an image of an object onto a workpiece, which is suitable for use, for example, as an exposure apparatus used in the manufacture of integrated circuits. The projection optical apparatus includes an image forming optical system whose optical |
| RE37309 |
Scanning exposure apparatus |
August 7, 2001 |
| A projection exposure apparatus for transferring a pattern formed on a mask onto a photosensitive substrate by a scanning exposure method, includes a light source for generating a light beam having a predetermined spatial coherence, an illumination optical system for receiving the light |
| RE36895 |
Automatic focusing camera |
October 3, 2000 |
| An automatic focusing camera comprises a measuring device formed integrally with a camera housing, defining a distance measuring zone selectively extended in different directions, and adapted for producing information employed for focusing to an object contained in the extended distance |
| RE36799 |
Projection optical apparatus using plural wavelengths of light |
August 1, 2000 |
| A projection optical apparatus comprising a projection optical system for projectively focusing a pattern image of a mask under illumination by light of first wavelength onto a sensitive substrate, a stage holding the sensitive substrate, a fiducial plate disposed on the stage, a first m |
| RE36740 |
Cata-dioptric reduction projection optical system |
June 20, 2000 |
| In a cata-dioptric optical system having a combination of a reflection system and a refraction system for reduction-projecting an object on a first plane onto a second plane, a polarization beam splitter and a quarter wavelength plate are provided to split the incident light and the |
| RE36730 |
Projection exposure apparatus having an off-axis alignment system and method of alignment theref |
June 13, 2000 |
| An exposure apparatus for exposing mask patterns on a sensitive plate comprises a set (for X and Y direction) of a laser interferometer for measuring a position of a wafer stage and satisfying Abbe's condition with respect to a projection lens and a set (for X and Y direction) of the |
| RE36246 |
Film rewinder |
July 6, 1999 |
| A film rewinder for a camera comprising a motor and rewinding means driven by the motor and adapted to rewind a used film into a film cartridge, comprises first sensing means disposed at a specific position in the path of the film moved to the film cartridge when the film is being rewoun |
| RE36238 |
Operation control apparatus of electric zoom camera |
June 29, 1999 |
| An electric zoom camera comprises a photographing lens system having a zoom lens system, a detecting device for detecting a focal length of the photographing lens system and generating a corresponding output, a driving device for driving the photographing lens system for zooming, a comma |
| RE35885 |
Photographing mode switching device of a camera |
September 1, 1998 |
| A camera capable of operation in continuous photography and one-frame photography modes has an automatically activated flash device the operation of which may be inhibited by the user when desired. In a preferred embodiment, when the camera is in the continuous photography mode and t |
| RE35877 |
Automatic light modulating camera |
August 25, 1998 |
| An automatic light modulating camera effecting a preliminary light emission and a main light emission, extracts effective light metering areas from plural light metering areas based on the light metering signals obtained at the preliminary light emission and on lens signals indicating th |
| RE35852 |
Power supply frequency regulating device for vibration wave driven motor |
July 21, 1998 |
| A vibration wave driven motor comprise a comparator for comparing a resonance frequency of the motor with a power supply frequency and a frequency setter for setting the power supply frequency according to a predetermined algorithm in response to the output of the comparator. The fre |
| RE35630 |
Over write capable magnetooptical recording medium, recording method and apparatus using the sam |
October 14, 1997 |
| A multi-layered magnetooptical recording medium that satisfies predetermined formulas is over write capable when used, in a recording method and apparatus, with a jointing field, i.e., a magnetic field the intensity of which decreases continuously from an initial field to a bias fiel |
| RE35592 |
Camera with self-timer |
August 19, 1997 |
| A camera has an exposure device for effecting a photographing operation on a film in response to manipulation of a member, and a self-timer for causing the exposure device to effect the photographing operation after the counting of a predetermined time. The self-timer has a first state f |
| RE34409 |
Drive circuit for surface-wave driven motor utilizing ultrasonic vibration |
October 19, 1993 |
| A surface-wave driven motor comprises a moving member for being displaced, a resilient member having a surface urged against the moving member, a piezo-electric member provided in contact with the resilient member to impart vibration to the resilient member and create an elastic wave in |
| RE34010 |
Position detection apparatus |
July 28, 1992 |
| An apparatus includes a means for providing a predetermined frequency difference between two light beams and generating an optical beat with respect to interference between first and second diffracted light beams from a diffraction grating formed on a substrate, and a means for detec |
| RE32795 |
Exposure apparatus for production of integrated circuit |
December 6, 1988 |
| An exposure apparatus for production of ICs of the type that includes a stage on which is placed a semiconductor wafer to be exposed by illumination light projecting means, and means for two-dimensionally moving the stage within a plane intersecting the illumination light at substant |
| H2114 |
Inspection tool for testing and adjusting a projection unit of a lithography system |
February 1, 2005 |
| An inspection system and method are disclosed. The inspection system is configured to inspect a projection unit having multiple optical subsystems. The optical subsystems are configured to project an image during a lithography step. The inspection system provides self calibration by |
| H1972 |
Autofocus system using common path interferometry |
July 3, 2001 |
| An autofocus system for use for instance in a photolithography machine (but not so limited) uses oblique incident optics which transform a defocus of the plane of the wafer whose location is being detected to a lateral shear of the beam. A common path interferometer measures the lateral |
| H1763 |
Microscope objective lens |
December 1, 1998 |
| Apochromatic-type microscope objective lenses are disclosed having a high numeral aperture number with few component lenses. The objective lenses are operable to correct any of various aberrations arising due to use of the objective lens with cover glasses having variable thickness. The |
| D590855 |
Binoculars |
April 21, 2009 |
|
| D579961 |
Binoculars |
November 4, 2008 |
|
| D579472 |
Binoculars |
October 28, 2008 |
|
| D558804 |
Microscope |
January 1, 2008 |
|
| D556800 |
Microscope |
December 4, 2007 |
|
| D552140 |
Binoculars |
October 2, 2007 |
|
