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National Center for Scientific Research "Demokritos" Patents |
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Assignee: National Center for Scientific Research "Demokritos"
Address: Attiki, GR
No. of patents: 1
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| 6296989 |
Silylation of epoxy-containing photoresist films |
October 2, 2001 |
| A high resolution pattern transfer processes is described, whereby epoxy containing photoresist films are imagewise exposed to radiation, baked to crosslink the exposed areas, and treated with a silylating medium, which reacts with the epoxy ring thereby incorporating silicon at will in |
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