| Patent Number |
Title Of Patent |
Date Issued |
| RE33530 |
Process and apparatus for the coating of shaped articles by cathode sputtering |
February 5, 1991 |
| The invention concerns a method of coating shaped parts having a three-dimensional coating surface by the cathodic atomization of target material of a first cathode arrangement. The cathode arrangement comprises a magnetic field generator for the concentration of a first discharge sp |
| 5822842 |
Method for masking a disk shaped substrate |
October 20, 1998 |
| In a mask (7) for covering the outer marginal area of a disk-shaped substrate surface during a coating process, for example a vacuum sputtering or vapor depositing process, the mask (7) is made of an elastic material in the form of a planar plate with an essentially circular opening. |
| 5789670 |
Rain sensor |
August 4, 1998 |
| In a moisture sensor (1), the effective sensor field (4) is formed by two sensor elements (8a, 8b,) having interdigitating parallel tracks. These sensor elements consist of layers of a metal nitride compound, especially a chromium-nitrogen compound, deposited by means of magnetron cathod |
| 5766348 |
Rotating head for crystal pulling systems for carrying out the czochralski process |
June 16, 1998 |
| A rotating head (11) for crystal pulling systems (1) according to Czochralski has a reference platform (16) which is able to rotate around a vertical rotation axis (A--A) with a vertical feed-through opening (25) for a pulling cable (13) that can be wound up and a drive assembly (23) |
| 5749716 |
Integrated oil pump rotor and coupling piece for an oil-sealed vacuum pump |
May 12, 1998 |
| The invention pertains to an oil-sealed vacuum pump (1) with a pump chamber (8, 9), with a rotor 3 rotatively mounted therein, with a bearing piece (13) delimiting the pump chamber on the drive side and with a passage (35) in the bearing piece (13) which contains a coupling piece (37) us |
| 5708194 |
Test gas leak detector |
January 13, 1998 |
| A leak detector (1) suitable for detecting leakage with a test gas connection (2), a test gas detector (3), a gas pump (4) and a test gas line (5) extending between the test gas connection (2) and the gas pump (4) and connected to the inlet (6) of the test gas detector (3) via a bloc |
| 5702523 |
Rotating head for crystal pulling systems |
December 30, 1997 |
| A rotating head (11) for crystal pulling systems (1) according to Czochralski has a reference platform (16) which is able to rotate around a vertical rotation axis (A--A) with a vertical feed-through opening (25) for a pulling cable (13) that can be wound up and a drive assembly (23) |
| 5697771 |
Vacuum pump with oil separator |
December 16, 1997 |
| The invention relates to a vacuum pump (1) with an oil separator (42) connected downstream of its outlet (33) and with a duct (45, 46) through which the oil separated in the oil separator (42) is returned to the vacuum pump (1); to feed back the oil in a simple manner, the oil feed d |
| 5695316 |
Friction vacuum pump with pump sections of different designs |
December 9, 1997 |
| A friction vacuum pump (1) is provided with pump sections of different designs, of which the pump section on the inlet side consists of turbomolecular pump stages (14, 15) and a further pump section of Siegbahn stages (16, 17) with spiral grooves (19), whereby the active pumping surf |
| 5693888 |
Heat conductance vacuum gauge with measuring cell, measuring instrument and connecting cable |
December 2, 1997 |
| The invention relates to a process for operating a controlled heat conductance vacuum gauge with a measuring cell (18) comprising a Wheatstone bridge (1) with supply voltage (12, 13) and measurement voltage terminals (14, 15), a power supply and measuring instrument (21) and a connec |
| 5667658 |
Master for the duplication of sound recordings and process for its production |
September 16, 1997 |
| A plate made of silicate glass (glass master) (3) is provided with a pressing surface (surface coat) carrying the sound recording in the form of raised contours formed from a photoresist (5) with a layer of primer (adhesion promotor) (4) to hold the photoresist layer (5) to the glass |
| 5661229 |
Test gas detector, preferably for leak detectors, and process for operating a test gas detector |
August 26, 1997 |
| The invention relates to a test gas detector, preferably for leak detection instruments, with a selective, preferably test-gas-permeable inlet system (6) and with a device (5) recording the presence of test gas; to reduce the complexity in the production of the vacuum it is proposed that |
| 5660535 |
Method of operating a claw-type vacuum pump and a claw-type vacuum pump suitable for carrying ou |
August 26, 1997 |
| A method of operating a claw-type vacuum pump with two or more stages, each of which has a suction chamber with a pair of claw rotors and end-located suction and discharge ports. To avoid the possibility of liquids affecting operation of the pump, the invention proposes that the pump is |
| 5658114 |
Modular vacuum system for the treatment of disk-shaped workpieces |
August 19, 1997 |
| Modular vacuum system includes functional units arranged in tandem to form two parallel transport paths which connect at one end of the system. Each unit includes a housing milled from a single block of metal having external walls, an internal wall, and side-by-side openings which align |
| 5656141 |
Apparatus for coating substrates |
August 12, 1997 |
| Apparatus for coating substrates 31, 31", . . . in a vacuum chamber 2 including a substrate carrier 30 disposed therein and a device 29 for generating a first plasma cloud 28 and, further, including magnets 26, 27 directing the plasma cloud 28 onto the surface of the substrates 31, 31" . |
| 5653855 |
Method for manufacturing a rain sensor |
August 5, 1997 |
| In a moisture sensor (1), the effective sensor field (4) is formed by two sensor elements (8a, 8b,) having interdigitating parallel tracks. These sensor elements consist of layers of a metal nitride compound, especially a chromium-nitrogen compound, deposited by means of magnetron cathod |
| 5631511 |
Gear motor with an electric motor having a hollow shaft |
May 20, 1997 |
| A gear motor (1), with an electric motor (4) whose rotor (7) has a hollow shaft (8), drives, through at least one gear box (26) with at least one drive step, at least one load. For the purpose of compact configuration combined with low vibration, there is coaxially disposed in the hollow |
| 5612068 |
Apparatus for the transfer of substrates |
March 18, 1997 |
| In an apparatus for the transfer of substrates (9) from an initial station (3) through several process stations (4 to 8) and back to this initial station (3), manipulators (10 to 14) having pivoting gripper arms (15 to 19) and carousel transfer systems (20,21) for the transfer of the |
| 5611899 |
Device for suppressing flashovers in cathode sputtering installations |
March 18, 1997 |
| An AC voltage source connected to at least one cathode is switched off rapidly upon the occurrence of a critical number of so-called "microarcs" which precede a "large arc". In order to be able to differentiate between large arcs and microarcs, a special counting and evaluation device is |
| 5611858 |
Apparatus for transporting discoidal substrates in a vacuum coating apparatus |
March 18, 1997 |
| In an apparatus for the transport of discoidal substrates (3, 3', . . . ) through a treatment station or from a first to a second processing station (4 and 5, respectively) of a vacuum coating apparatus a motor unit (6) is provided, having three planar, positive conveyors driven by the l |
| 5608168 |
Temperature compensation in a regulated heat conduction vacuum gauge |
March 4, 1997 |
| The invention relates to a process for operating a regulated heat conduction vacuum gauge with a Wheatstone bridge (1) powered by a controllable supply voltage and a gauge filament (6) and a resistance (9) as two of its components among others, designed to be temperature-dependant to |
| 5599390 |
Apparatus for crystal pulling |
February 4, 1997 |
| A lock valve disposed between a pulling pot and a lock chamber is opened at the start of the pulling process and thereby uncovers a lock entrance for the crystal that is to be pulled, and together with a gasket closes the lock entrance after the end of the pulling process and thereby |
| 5597622 |
Process for the production of a reflection-reducing coating on lenses |
January 28, 1997 |
| The invention relates to a process of providing a scratch-resistant coating for a lens made of an optical material comprising synthetics. In order for the synthetic material, for example a CR 39, to be protected against scratches, a very thin adhesion layer of SiO is applied first, and i |
| 5597609 |
Process and apparatus for the continuous or semi-continuous coating of eyeglass lenses |
January 28, 1997 |
| Lenses are brought individually or in pairs on a transport device (12) to a continuous vacuum apparatus (1) equipped with a rotating substrate carrier (3). The eyeglass lenses (13) are introduced through a system of locks (15) into the continuous vacuum apparatus (1), where they are coat |
| 5591529 |
Optical filter having multi-layer coating |
January 7, 1997 |
| In a multi-layer coating for a material of good transparency for visible light, with an emissivity e<0.04 and a light transmission T.gtoreq.78% and with two silver layers of different thickness, three oxide coatings are provided, and very thin metal or metal suboxide coatings as block |
| 5587016 |
Controlled feeding Czochralski apparatus |
December 24, 1996 |
| A source (1) is equipped with a conveying device (4) for discharging the particles (2, 2a) at adjustable rates per unit time. A crystal (16), formed from doped particles, is withdrawn from the melting crucible (13) at a predetermined rate per unit time. So that the control process can be |
| 5558751 |
Dual cathode sputter coating apparatus |
September 24, 1996 |
| In a coating apparatus, a sputter cathode (1) has, directly side by side, two electrodes (2, 3) connected in common to a high-frequency generator and having each a target (9, 10). The targets (9, 10) of both electrodes (2, 3) abut one another each with a straight edge (11, 12). A dark sp |
| 5558750 |
Process and system for coating a substrate |
September 24, 1996 |
| A coating system has, in a housing (1), a sputtering chamber (3) for the coating of a substrate (22) and a target carrier coating chamber (4) for the continuous coating of a rotating target carrier (2) with a coating of target material (25), which projects into both chambers (3, 4). The |
| 5556520 |
Method for controlling a reactive sputtering process |
September 17, 1996 |
| A method is proposed for controlling a reactive sputtering process wherein the working point on the physical characteristic curves, cathode voltage or working current intensity over reactive gas flow to the sputtering apparatus, defined by the value of one of the two factors determining |
| 5556477 |
Transport device for substrates to be coated in a vacuum coating system |
September 17, 1996 |
| A substrate carrier plate (17, 17a) designed to hold at least one substrate is removably attached to a support element (19, 19a) of a base (2). The carrier plate is held to the support element (19, 19a) at least at one point by a centering pin (22, 23; 22a, 23a), which projects from the |
| 5542257 |
Cryogenic pump with an essentially cup-shaped housing |
August 6, 1996 |
| A cryogenic pump with an essentially cup-shaped housing (2), with a radiation screen (4) disposed in the housing and also essentially cup-shaped, with an inlet opening (6), with a cold head (3) extending into the housing and the radiation screen, with pump surfaces (15) for condensab |
| 5540823 |
Magnetron cathode |
July 30, 1996 |
| A magnetron cathode for a cathode sputtering system has a target holder for holding a target 9 where the erosion zone is opposite the substrate. The non-sputtering target surfaces 9a are covered with a barrier layer or protective layer 21. |
| 5538610 |
Vacuum coating system |
July 23, 1996 |
| A vacuum coating system has a processing station (2) designed as a sputter-etching station, in which a high-frequency input electrode (25) is mounted between two substrate holders (23, 24), which carry the substrates (5, 6). Between the substrate holders (23, 24) and the high-frequency |
| 5538610 |
Vacuum coating system |
July 23, 1996 |
| A vacuum coating system has a processing station (2) designed as a sputter-etching station, in which a high-frequency input electrode (25) is mounted between two substrate holders (23, 24), which carry the substrates (5, 6). Between the substrate holders (23, 24) and the high-frequency |
| 5538609 |
Cathodic sputtering system |
July 23, 1996 |
| An evacuable chamber serving as a cathode contains a rotatable magnet system and is connected to a high frequency power supply for sputtering a target. The chamber is electrically isolated from an evacuable housing containing the substrate to be coated, the chamber being covered by a |
| 5538609 |
Cathodic sputtering system |
July 23, 1996 |
| An evacuable chamber serving as a cathode contains a rotatable magnet system and is connected to a high frequency power supply for sputtering a target. The chamber is electrically isolated from an evacuable housing containing the substrate to be coated, the chamber being covered by a |
| 5538560 |
Vacuum coating apparatus |
July 23, 1996 |
| A closed cylindrical housing defining a transport chamber has a top plate with a first opening communicating with an entry and exit chamber, and a second opening communicating with a coating chamber. A turntable rotatable about an axis in the transport chamber carries a holder to a first |
| 5538560 |
Vacuum coating apparatus |
July 23, 1996 |
| A closed cylindrical housing defining a transport chamber has a top plate with a first opening communicating with an entry and exit chamber, and a second opening communicating with a coating chamber. A turntable rotatable about an axis in the transport chamber carries a holder to a first |
| 5536380 |
Large area sputter cathode having floating target segments |
July 16, 1996 |
| Individual target segments (A-F), are mounted on a mounting plate by means of locating studs inserted into mounting holes of elongate or circular cross sections in correspondence with the change in length caused by the thermal expansion of the target segments. The segments are retained b |
| 5531877 |
Microwave-enhanced sputtering configuration |
July 2, 1996 |
| The invention relates to a microwave-enhanced sputtering configuration. In this sputtering configuration a magnetron cathode is disposed in a housing whose target opposes a substrate. At both sides of the target is provided in each instance a microwave inlet comprising a waveguide couple |
| 5531876 |
Sputter cathode |
July 2, 1996 |
| The target (5) of a sputter cathode 3 is permanently bonded to a metallic backing plate (14, 15) with a coefficient of thermal expansion similar to that of the target (5). This backing plate (14, 15) is held removably on the electrode (4), for example by means of spring clips (16, 17). |
| 5529627 |
Coating apparatus |
June 25, 1996 |
| The inside of a coating chamber (2) has a sputtering cathode (3) bearing a magnet set (6) and having a pot-shaped electrode (4) and a target (5). The electrode (4) is closed on the side facing away from the target (5) by a cover (11) to form a pressure equalizing chamber (12). The latter |
| 5527019 |
Device and method for cleaning a filter |
June 18, 1996 |
| The invention relates to a device and a method for cleaning a filter (7) disposed between a chamber contaminated with particles and a pump station. Herein a feedline (21) for oxygen or for an oxygen/inert gas mixture to the filter (7) is provided which is equipped with an arrangement (11 |
| 5510012 |
Method for producing a decorative gold alloy coating |
April 23, 1996 |
| For the production of a coating formed by cathode sputtering, a target made from an alloy of gold and preferably vanadium is used. During the cathode sputtering, nitrogen gas is used as the reactive gas. The result is the formation of vanadium nitrides on the substrate to be coated. By v |
| 5503675 |
Apparatus for applying a mask to and/or removing it from a substrate |
April 2, 1996 |
| First and second transport chambers are joined to one another through a common opening (5), and house respective substrate carriers (6, 7) mounted for rotation about parallel axes. In at least one position the carriers may be superposed, plungers (14 and 15) being disposed in the area of |
| 5498291 |
Arrangement for coating or etching substrates |
March 12, 1996 |
| The invention relates to an arrangement for coating or etching substrates. In this arrangement an HF substrate bias voltage is generated without contact. For this purpose plasma sources are equipped with a bias pot which is disposed at the dark space distance from a substrate carrier and |
| 5492078 |
Process for the controlled feeding of a melting crucible with particles during the drawing of cr |
February 20, 1996 |
| In a process and a device for the controlled feeding of a melting crucible (13) with doped particles (2, 2a) during the drawing of a crystal (16) by the Czochralski method by the control of a flow of particles (2, 2a) from a source (1) to the melting crucible (13), the source (1) is equi |
| 5485802 |
Method and apparatus for pulling monocrystals from a melt |
January 23, 1996 |
| A crucible is situated in a vacuum chamber and provided with a feeder for granulate material, heating elements for melting the material, and a crystal puller above the crucible. Measuring elements provide signals for a controller including a fuzzy processor utilizing an empirically d |
| 5482610 |
Cathode for coating a substrate |
January 9, 1996 |
| In a cathode system for coating a substrate (46), having a cathode which is connected to a direct-current and/or alternating-current source (high-frequency source) and is disposed in an evacuable coating chamber (2), and is electrically connected to a target (29) which is sputtered and |
| 5480530 |
Mask for covering the margin of a disk-shaped substrate |
January 2, 1996 |
| In a mask (7) for covering the outer marginal area of a disk-shaped substrate surface during a coating process, for example a vacuum sputtering or vapor depositing process, the mask (7) is made of an elastic material in the form of a planar plate with an essentially circular opening. |
