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Kanto Kagaku Kabushiki Kaisha Patents
Assignee:
Kanto Kagaku Kabushiki Kaisha
Address:
Tokyo, JP
No. of patents:
53
Patents:


1 2


Patent Number Title Of Patent Date Issued
7368064 Cleaning solution and manufacturing method for semiconductor device May 6, 2008
A method of manufacturing a semiconductor device forms an interlayer insulating film on a nickel silicide layer formed on a substrate, and forms a through hole by performing dry etching using a resist pattern, formed on the interlayer insulating film, as a mask and then removing the
7351354 Tungsten metal removing solution and method for removing tungsten metal by use thereof April 1, 2008
A removing solution for removing tungsten metal which causes a film formation on a semiconductor substrate or adheres to it, wherein orthoperiodic acid and water are contained.
7268250 Process for producing optically active compound September 11, 2007
A highly efficient process is provided for producing an optically active compound having high optical purity by an asymmetric reaction using as a catalyst a transition metal complex having an optically active nitrogen-containing compound as an asymmetric ligand.
7138362 Washing liquid composition for semiconductor substrate November 21, 2006
There is provided a washing liquid composition for a semiconductor substrate having a contact angle between the surface thereof and water dropped thereon of at least 70 degrees, the washing liquid composition including an aliphatic polycarboxylic acid and a surfactant, and the washin
7087562 Post-CMP washing liquid composition August 8, 2006
A post-CMP washing liquid composition is provided which includes one type or two or more types of aliphatic polycarboxylic acids and one type or two or more types selected from the group consisting of glyoxylic acid, ascorbic acid, glucose, fructose, lactose, and mannose, and which has a
7084097 Cleaning solution for substrates of electronic materials August 1, 2006
The present invention relates to a cleaning solution capable of removing efficiently at the same time particles and metallic impurities from a substrate surface without corroding metallic materials.The cleaning solution for cleaning substrates of electronic materials comprises an org
7073518 Cleaning solution and cleaning method for mask used in vacuum vapor deposition step in productio July 11, 2006
A cleaning solution for a mask used in a vacuum vapor deposition step in the production of a low molecular weight organic EL device is provided, the cleaning solution including one type or two or more types of aprotic polar solvent. There is also provided a cleaning method for a mask use
7022878 Organic borate compounds and the nonaqueous electrolytes and lithium secondary batteries using t April 4, 2006
Organic borates having the formula: ##STR00001## The borates are highly soluble in solvent of low dielectric constant. Also disclosed are nonaqueous electrolytes made from these organic borates; lithium secondary batteries with improved high-temperature storage characteristics; and
7022169 Electroless gold plating solution April 4, 2006
An electroless gold plating solution is provided that contains no cyanide compound as a source of gold and that contains a decomposition inhibitor represented by general formula (1), provided that, in a case in which the solution contains a gold complex of sulfite and the decomposition
7011697 Electroless gold plating solution March 14, 2006
An electroless gold plating solution is provided that includes a cyanide compound and ascorbic acid or a derivative thereof, the electroless gold plating solution containing one or more than one deposition accelerator selected from the group consisting of a copper compound, a thallium
6914039 Etching liquid composition July 5, 2005
The invention provides etching liquid compositions for transparent conducting films wherein foaming is suppressed and residues do not occur after etching. The etching liquid compositions include an etching liquid for transparent conducting films and one or more compounds selected from
6877518 Chemical solution treatment apparatus for semiconductor substrate April 12, 2005
A chemical solution treatment apparatus for dissolving and removing ruthenium-based metal adhering to a substrate by a chemical solution, includes: a chemical solution treatment unit; a reservoir unit; and a chemical solution circulation system. The chemical solution inside treatment
6864044 Photoresist residue removing liquid composition March 8, 2005
The object of the present invention is to provide, in the production of semiconductor circuit elements, a photoresist residue removing liquid composition which is excellent for removing photoresist residues after dry etching without attacking the wiring material or the interlayer insulat
6855191 Electroless gold plating solution February 15, 2005
An electroless gold plating solution is provided in which an amount of gold deposited by a displacement reaction is at least 15 .mu.g/cm.sup.2, and the electroless gold plating solution includes a reducing agent that is oxidized by gold, and a reducing agent that is of the same type as o
6824928 Organic borate compounds and the nonaqueous electrolytes and lithium secondary batteries using t November 30, 2004
The object of the present invention is to supply organic borates highly soluble even in a solvent of a low dielectric constant; nonaqueous electrolytes made from these organic borates and excellent in characteristics; lithium secondary batteries with improved high-temperature storage
6790973 Ruthenium complexes and process for preparing alcoholic compounds using these September 14, 2004
The invention provides novel ruthenium complexes having an optically active diphosphine compound, which has asymmetry on carbon and is easy to synthesize, as the ligand and a process for preparing optically active alcoholic compounds using said complexes as the catalysts, wherein said
6787293 Photoresist residue remover composition September 7, 2004
A photoresist residue remover composition is provided that includes one type or two or more types of fluoride compound and one type or two or more types chosen from the group consisting of glyoxylic acid, ascorbic acid, glucose, fructose, lactose, and mannose (but excluding one that incl
6730644 Cleaning solution for substrates of electronic materials May 4, 2004
The present invention relates to a cleaning solution capable of removing efficiently at the same time particles and metallic impurities from a substrate surface without corroding metallic materials.The cleaning solution for cleaning substrates of electronic materials comprises an organic
6713033 Process for producing hydrophilic ODS packing material made of silica gel March 30, 2004
A process for the production of a highly chemically stable hydrophilic ODS packing material made of silica gel for liquid chromatography that causes hardly any peak tailing. ODS groups are chemically bonded to a silica gel having a specific surface area of 200 to 300 m.sup.2 /g, which is
6706533 Method for detecting a concentration of a solution March 16, 2004
A concentration detection method and a concentration detection apparatus, and an agent diluting preparation apparatus capable of accurately estimating the concentration of a solution without the need of strict temperature control, and of estimating the concentration of the solution i
6485779 Solution for forming ferroelectric film and method for forming ferroelectric film November 26, 2002
Acetylacetone and an aqueous nitric acid are included in a solution in which organic metal compounds of metals constituting a ferroelectric in an organic solvent thereby forming a ferroelectric film formation solution. The solution is applied to a substrate, followed by drying and baking
6428974 Microplate for drug susceptibility testing containing a drug, a color reagent, and color suppres August 6, 2002
A reagent for a drug susceptibility testing which is simple and highly reproducible is provided. A microplate for a drug susceptibility testing wherein a drug and a color reagent containing a tetrazolium salt, 1-methoxy-5-methylphenazinium methylsulfate (1-methoxy PMS), potassium fer
6388146 Polymerizable compound, polymerizable resin composition, cured polymer and liquid crystal displa May 14, 2002
The polymerizable compound of this invention is represented by general formula (I): ##STR1##where R is H, R', R'O, R'COO, or R'OCO, R' is a linear or branched alkyl group or alkenyl group having 1 to about 15 carbon atoms, A.sub.1 and A.sub.2 are independently a cyclohexane ring or a
6231677 Photoresist stripping liquid composition May 15, 2001
A photoresist stripping liquid composition effective for removing resist residues after dry etching and resist ashing in the manufacturing processes of semiconductor devices, which does not corrode the different metallic materials, and wherein are comprised, as active component, one or
6165420 Production unit for producing high purity hydrochloric acid and using the same December 26, 2000
Disclosed is an apparatus for supplying hydrogen chloride gas from a hydrogen chloride gas generator to an absorbing reactor through a gas supply pipe, and a method for producing hydrochloric acid by allowing the gas absorbed in water in an absorbing reactor. The apparatus obtains a
6098848 Method and apparatus for connecting a fluid reservoir with pipelines August 8, 2000
The object of the present invention is to simplify the process of connecting a reservoir for charging and discharging 2 or more fluids with a pipeline for conveying said fluid and to assist the automation of this process.In the present invention, a reservoir, having, at its end face, 2 o
6086665 Solution for forming ferroelectric film and method for forming ferroelectric film July 11, 2000
Acetylacetone and an aqueous nitric acid are included in a solution in which organic metal compounds of metals constituting a ferroelectric in an organic solvent thereby forming a ferroelectric film formation solution. The solution is applied to a substrate, followed by drying and baking
6080709 Cleaning solution for cleaning substrates to which a metallic wiring has been applied June 27, 2000
The present invention relates to a cleaning solution for cleaning substrates, to which a metallic wiring has been applied, being capable of easily removing the metallic impurities of the substrate surface without corroding the metal, not putting a strain on the environment, and not c
6007739 Liquid crystal compound, liquid crystal composition, and liquid crystal display device using the December 28, 1999
A liquid crystal compound of the present invention is represented by the following general Formula I: ##STR1## wherein R.sub.1 and R.sub.2 are independently a linear or branched alkyl group or alkoxy group having 1 to 14 carbon atoms, provided that at least one of R.sub.1 and R.s
5892075 Process for synthesizing metallocene compounds April 6, 1999
The object of the invention resides in the development of an improved process for synthesizing metallocene compounds useful as olefin polymerization catalysts.A new process for synthesizing metallocene compounds of formulae (IV) and (IV') comprises a reaction of formula (I) with formula
5859276 Organotransition metal compounds January 12, 1999
New metallocene compounds (II) and their synthetic intermediates (I) used for olefin polymerization catalysts represented by the general formulas (I) and (II) ##STR1## (wherein X can be identical or different and is each independently of one another a halogen atom, M.sup.1 is a g
5750213 Polymerizable compound and liquid crystal display device using the same May 12, 1998
A polymerizable compound represented by Formula (I): ##STR1## where X is a hydrogen atom or a methyl group; l and m are independently an integer of 0 to 14; Y is a single bond, --COO--, --OCO--, or --O--; n and p are independently an integer of 0 to 18; q and s are independently an
5728463 Stationary phase material for chromatography March 17, 1998
A material for use as a stationary phase for chromatography comprising a solid material the surface of which is coated with pyrophosphate and/or metaphosphate.
5709911 Polymerizable compound and liquid crystal display device using the same January 20, 1998
A polymerizable compound represented by Formula (I): ##STR1## where X is a hydrogen atom or a methyl group; Y and Z are independently a hydrogen atom or a fluorine atom; l is an integer of 0 to 14; m and n are independently an integer of 0 or 1; R is represented by Formula (II),
5702642 Polymeric compounds, and liquid crystal element using the same December 30, 1997
The polymeric compound of this invention is represented by the following general formula (I): ##STR1## wherein A represents a hydrogen atom or ##STR2## B represents a hydrogen atom or ##STR3## each of X.sub.1 and X.sub.2 represents independently a hydrogen atom or a m
5645760 Polymeric compounds, and liquid crystal element using the same July 8, 1997
The polymeric compound of this invention is represented by the following general formula (I): ##STR1## wherein A represents a hydrogen atom or ##STR2## B represents a hydrogen atom or ##STR3## each of X.sub.1 and X.sub.2 represents independently a hydrogen atom or a m
5580847 Aqueous ammonia composition December 3, 1996
An aqueous ammonia composition having low surface tension is disclosed, which comprises ammonia water and a fluoroalkylsulfonamide compound having the following general formula:wherein R.sup.1 represents a fluoroalkyl group, R.sup.2 represents a hydrogen atom or a lower alkyl group, X re
5576182 Anti-mucus glycoprotein monoclonal antibody November 19, 1996
An IgM class monoclonal antibody which specifically reacts with mucus glycoproteins produced by human gastric gland-type mucous cells is provided. By performing immunohistochemical staining using a labeled derivative of the monoclonal antibody, human gastric gland-type mucous cells a
5545747 Cyclobutanecarboxylic acid derivatives and liquid crystalline compositions containing them August 13, 1996
An optically inactive cyclobutanecarboxylic acid derivative of the general formula ##STR1## wherein R.sup.1 is a hydrogen atom or a straight or branched chain alkyl group having 1-14 carbon atoms, R.sup.2 is a straight or branched chain alkyl group having 1-14 carbon atoms, X.sup
5494605 P-terphenyl derivatives and liquid crystalline compositions February 27, 1996
The p-terphenyl derivatives of the formula shown below are useful in preparing practical ferroelectric liquid crystalline compositions. The derivatives exhibit excellent chemical stability and display the chiral smectic C or smectic C phase over a wide temperature range. ##STR1##
5470381 Electroless gold plating solution November 28, 1995
An electroless gold plating solution comprising an aqueous solution containing as ingredients (a) chloroauric (III) acid or a salt thereof or a sulfite or thiosulfate gold (I) complex salt as a gold source, (b) an alkali metal or ammonium sulfite or thiosulfate, (c) ascorbic acid or a
5397504 Biphenyl compound March 14, 1995
A new biphenyl compound which is chemically stable and possesses practically excellent properties as a component for preparing ferroelectric smetic liquid crystalline compositions as well as a new liquid crystalline composition containing this compound.
5382380 P-terphenyl derivatives and liquid crystalline compositions January 17, 1995
New p-terphenyl derivatives useful as components for preparing practical ferroelectric liquid crystalline compositions and excellent in chemical stability, as well as liquid crystalline compositions containing at least one of the p-terphenyl derivatives.
5326490 Surface tension sulfuric acid composition July 5, 1994
Sulfuric acid or sulfuric acid/hydrogen peroxide cleaning solutions used in semiconductor manufacturing processes are improved in wettability and cleaning effect by lowering their surface tension through the addition of surface-active agents Of the general formula R.sup.1 SO.sub.2 NR.sup
5229270 Reagent for the determination of chlorine ion July 20, 1993
Quantitative assay and reagent for the determination of chlorine ion in body fluid. Body fluid is contacted with a reagent which includes deactivated .alpha.-amylase, a compound capable of chelating calcium ion, a calcium chelate compound, and an .alpha.-amylase activity-measuring su
5205928 Process for the preparation of microspherical sintered bodies of hydroxyapatite and a chromatogr April 27, 1993
Microspherical sintered bodies of hydroxyapatite are prepared according to a new specific process wherein a suspension having hydroxyapatite microparticles dispersed in water or an organic solvent or a mixture of water and an organic solvent compatible therewith is atomized into a he
5108956 Process for the preparation of microspherical sintered bodies of hydroxyapatite and a chromatogr April 28, 1992
Microspherical sintered bodies of hydroxyapatite are prepared according to a new specific process wherein a suspension having hydroxyapatite microparticles dispersed in water or an organic solvent or a mixture of water and an organic solvent compatible therewith is atomized into a he
5084483 Process and apparatus for recovering and reusing resist composition January 28, 1992
The present invention relates to a process for recovering and reusing a resist composition which comprises the steps of (a) collecting resin composition scattered from a spinner during application of the resist composition onto silicon wafers and otherwise no longer used and to be di
4967782 Process and apparatus for recovering and reusing resist composition November 6, 1990
The present invention relates to a tank for use in recovering and reusing resist compositions, which comprises (a) means for measuring the viscosity of a previously used resist composition introduced into the recovery tank; (b) line means for feeding a solvent into the recovery tank; (c)
4871693 Porous cordierite ceramics October 3, 1989
New type porous cordierite ceramics having a new characteristic interconnecting open cellular structure and a hollow microspherical cordierite glass powder with a shell devoid of any pores or provided with a few or an abundance of open pores which is used as a starting material for t
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