| Patent Number |
Title Of Patent |
Date Issued |
| 7042060 |
Backside thinning of image array devices |
May 9, 2006 |
| Backthinning in an area selective manner is applied to imaging sensors 12 for use in electron bombarded devices. A further arrangement results in an array of collimators 51 aligned with pixels 42 or groups of pixels providing improved image contrast of such image sensor. Provision of a |
| 7012328 |
Semiconductor die attachment for high vacuum tubes |
March 14, 2006 |
| There is described novel bonding and interconnecting techniques for use with semiconductor die for the creation of thermally efficient, physically compliant Ultra High Vacuum Tubes and the novel tube resulting therefrom. |
| 7005637 |
Backside thinning of image array devices |
February 28, 2006 |
| Backthinning in an area selective manner is applied to imaging sensors 12 for use in electron bombarded devices. A further arrangement results in an array of collimators 51 aligned with pixels 42 or groups of pixels providing improved image contrast of such image sensor. Provision of a |
| 7000418 |
Capacitance sensing for substrate cooling |
February 21, 2006 |
| Described is a cooling system for use in the manufacture of substrates into magnetic disk memory in which cooling plates are positioned dynamically in relation to a substrate to be cooled. This enables positioning the cooling plates closer for more effective cooling. Positioning is c |
| 6969839 |
Backthinned CMOS sensor with low fixed pattern noise |
November 29, 2005 |
| This invention deals with the reduction in fixed pattern noise in backthinned CMOS imagers primarily for use in a vacuum environment. Reduction is achieved by effectively shielding the imager. This is done by depositing a conductive layer on the front surface prior to the attachment |
| 6943425 |
Wavelength extension for backthinned silicon image arrays |
September 13, 2005 |
| There is described a back thinned sensor in which a material is added on the front surface to extend the wavelength of the sensor into wavelengths it normally does not reach. In the preferred embodiment, the back-thinned layer comprises silicon and is the base for a CMOS device or a CCD. |
| 6919001 |
Disk coating system |
July 19, 2005 |
| There is described a disk processing and manufacturing equipment in which the processing chambers are stacked on top of each other and in which the disks move through the system on disk carriers which are adjustable to take disks of varying sizes. The disks enter the system through a loa |
| 6837766 |
Unitary vacuum tube incorporating high voltage isolation |
January 4, 2005 |
| A housing for microelectronic devices requiring an internal vacuum for operation, e.g., an image detector, is formed by tape casting and incorporates leads between interior and exterior of the housing where the leads are disposed on a facing surface of green tape layers. Adjacent gre |
| 6657178 |
Electron bombarded passive pixel sensor imaging |
December 2, 2003 |
| A low light level image directed to a photocathode in a vacuum causes release of electron which bombard a CMOS imager including passive pixel sensors which in turn generates an electronic image which is fed out of the vacuum and is used to create useful images corresponding to the low |
| 6635154 |
Method and apparatus for multi-target sputtering |
October 21, 2003 |
| Sequential sputtered film deposition of distinct materials on a workpiece is obtained with discrete targets composed of such distinct materials disposed on separate area portions of a common cathode/heatsink. Sputtering without cross contamination of the deposited films is enabled du |
| 6517691 |
Substrate processing system |
February 11, 2003 |
| A substrate processing system includes a primary processing assembly and secondary processing assembly. The secondary processing assembly has one or more interconnected modules and includes one or more process stations. The primary and secondary processing assemblies are connected by a v |
| 6507147 |
Unitary vacuum tube incorporating high voltage isolation |
January 14, 2003 |
| A housing for microelectronic devices requiring an internal vacuum for operation, e.g., an image detector, is formed by tape casting and incorporates leads between interior and exterior of said housing where said leads are disposed on a facing surface of green tape layers. Adjacent g |
| 6307586 |
Electron bombarded active pixel sensor camera incorporating gain control |
October 23, 2001 |
| A camera includes a photocathode operable in a night mode wherein electrons are generated in response to incident light, an active pixel sensor including an array of pixels for sensing electrons in the night mode, a power supply for energizing the photocathode in the night mode in respon |
| 6285018 |
Electron bombarded active pixel sensor |
September 4, 2001 |
| A low light level system is described wherein electrons, created by images directed to a photocathode, directly bombard active pixel sensors. Both the active pixel sensors and the output end of the photocathode are positioned in a vacuum envelop. The electron released from the photoc |
| 6236021 |
Substrate transport assembly for rapid thermal processing system |
May 22, 2001 |
| A rapid thermal processing system for large area substrates, such as glass panels for flat panel displays, includes a processing chamber having a loading/unloading zone and a processing zone, a heating assembly for heating a substrate in the processing zone, and a transport assembly for |
| 6228429 |
Methods and apparatus for processing insulating substrates |
May 8, 2001 |
| A disk gripper for gripping an insulating disk, such as a glass disk, at its edge during processing includes a contact device for contacting the edge of the insulating disk and a mechanism for moving the contact device between a contact position, in contact with the edge of the disk, and |
| 6204483 |
Heating assembly for rapid thermal processing system |
March 20, 2001 |
| A rapid thermal processing system for large area substrates, such as glass panels for flat panel displays, includes a processing chamber, a transport assembly for transporting a substrate through the processing chamber, and a heating assembly for heating the substrate. The heating assemb |
| 6203862 |
Processing systems with dual ion sources |
March 20, 2001 |
| A substrate processing system includes a processing chamber, a substrate holder positioned in the chamber, a gas source for supplying a process gas to the chamber, first and second ion sources located in the chamber, and a power source for energizing the first and second ion sources. Eac |
| 6183831 |
Hard disk vapor lube |
February 6, 2001 |
| Disclosed is a system for transporting disks in vacuum to a vacuum station whereat a lubricant film is applied uniformly to the surfaces of the disks by evaporation. Thickness uniformity is achieved by directing the evaporate through a multi-hole aperture plate. Described is equipment fo |
| 6157189 |
Magnetic read/write of reference track in contact start-stop testing of magnetic disks |
December 5, 2000 |
| Methods and apparatus for testing a magnetic disk and a read head are provided. A reference track is written on the magnetic disk. The read head is scanned laterally with respect to the reference track while the magnetic disk is rotating. The reference track is sensed with the read h |
| 6101972 |
Plasma processing system and method |
August 15, 2000 |
| A substrate processing system includes a processing chamber, a substrate holder positioned in the chamber, a gas source for supplying a process gas to the chamber, at least one ion source located in the chamber, and a power source for energizing the ion source by positively biasing the a |
| 6005247 |
Electron beam microscope using electron beam patterns |
December 21, 1999 |
| An electron beam microscope includes an electron beam pattern source, a vacuum enclosure, electron optics, a detector and a processor. The electron beam pattern source generates a sequence of electron beam patterns for illuminating a set of pixels on a specimen. The electron optics d |
| 5932966 |
Electron sources utilizing patterned negative electron affinity photocathodes |
August 3, 1999 |
| An electron source includes a negative electron affinity photocathode on a light-transmissive substrate and a light beam generator for directing a light beam through the substrate at the photocathode for exciting electrons into the conduction band. The photocathode has at least one a |
| 5912500 |
Integrated photocathode |
June 15, 1999 |
| A transferred-electron photocathode or other opto-electronic device having one light-receiving side and one electronic side, in which multiple photocathodes are processed concurrently on a wafer for front and back side contacts and anti-reflection layers. After the wafer-level proces |
| 5891311 |
Sputter coating system and method using substrate electrode |
April 6, 1999 |
| Apparatus for depositing a film on a substrate includes a housing that encloses a sputtering chamber, a substrate holder for positioning a substrate in the sputtering chamber and a sputtering gun, including a sputtering target, for depositing a film of atoms of the target on a surfac |
| 5873989 |
Methods and apparatus for linear scan magnetron sputtering |
February 23, 1999 |
| A magnetron sputtering source for depositing a material onto a substrate includes a target from which the material is sputtered, a magnet assembly disposed in proximity to the target for confining a plasma at the surface of the target and a drive assembly for scanning the magnet assembly |
| 5830327 |
Methods and apparatus for sputtering with rotating magnet sputter sources |
November 3, 1998 |
| A magnetron sputtering source for forming a sputtered film on a substrate in a magnetron sputtering apparatus includes a target having a surface from which material is sputtered and a magnet assembly that is rotatable about an axis of rotation with respect to the target. The magnet assem |
| 5738767 |
Substrate handling and processing system for flat panel displays |
April 14, 1998 |
| A vacuum processing system for handling and processing rectangular glass panels for flat panel displays has a cluster configuration. The system includes a central buffer chamber, with multiple processing chambers, a load lock and an unload lock positioned around the buffer chamber and |
| 5684360 |
Electron sources utilizing negative electron affinity photocathodes with ultra-small emission ar |
November 4, 1997 |
| An electron source includes a negative electron affinity photocathode on a light-transmissive substrate and a light beam generator for directing a light beam through the substrate at the photocathode for exciting electrons into the conduction band. The photocathode has at least one a |
| 5576559 |
Heterojunction electron transfer device |
November 19, 1996 |
| A smooth and monotonic potential energy gradient was established at a p-type (InGa)As--undopad InP heterojunction to efficiently transfer conduction electrons from the (InGa)As:p layer to the InP:.o slashed. layer. This potential energy gradient was established with a compositionally |
| 5523262 |
Rapid thermal annealing using thermally conductive overcoat |
June 4, 1996 |
| Apparatus and method for improved heating uniformity during rapid thermal annealing through the use of a sacrificial layer covering the surface to be annealed. The composition and thickness of the layer are chosen to be opaque at the frequencies emitted by a radiant energy source, usuall |
| 5512375 |
Pseudomorphic substrates |
April 30, 1996 |
| High quality epitaxial layers can be grown on a multi-layer substrate which has a crystalline pseudomorphic layer with an exposed surface used for the epitaxial growth. The pseudomorphic layer of the substrate has a thickness at or below the pseudomorphic limit so it will be deformed as |
| 5475227 |
Hybrid photomultiplier tube with ion deflector |
December 12, 1995 |
| A focused electron/bombarded hybrid photomultiplier tube comprising a photocathode, focusing electrodes, and a collection anode disposed in a detector body. The collector anode includes a diode for receiving the focused output electron beam from the photocathode. The current gain bet |
| 5425611 |
Substrate handling and processing system |
June 20, 1995 |
| This invention relates to a system for handling and processing thin substrates, such as substrates for magnetic disks. The system includes a main chamber, entrance and output load locks, a buffer chamber, substrate load/unload structure, and a plurality of substrate processing stations |
| 5391101 |
Method of manufacturing a feedback limited microchannel plate |
February 21, 1995 |
| A method of manufacturing a low noise microchannel plate which limits feedback includes creating a conductive layer on the output side of the microchannel plate so that portions of the open areas in the output end are closed off. |
| 5379984 |
Gate valve for vacuum processing system |
January 10, 1995 |
| A vacuum gate valve includes a valve body having an opening therethrough and a valve seat surrounding the opening, and a swing gate assembly rotatable about a pivot axis between an open position and a closed position. The swing gate assembly includes a swing gate body, a resilient se |
| 5378955 |
Method for fabrication of a microchannel electron multiplier |
January 3, 1995 |
| A bundle of multiglass fibers are assembled within an outer glass tube. An intermediate glass structure is interposed between the bundle of multifibers and the outer glass tube. The intermediate glass structure has a softening temperature within the range of minus 5% and plus 15% of the |
| 5374826 |
Hybrid photomultiplier tube with high sensitivity |
December 20, 1994 |
| A focused electron/bombarded (FEB) ion detector comprising an MCP, focusing means, and a collection anode disposed in a detector body. The collector anode includes a diode for receiving the focused output electron beam from the MCP. The gain between the input ion current to the MCP and t |
| 5373320 |
Surveillance system having a microchannel image intensifier tube |
December 13, 1994 |
| A camera attachment converts a standard day-light video camera into a day/night-vision video camera. The attachment device has a threaded input and output to physically and optically interconnect an auto-iris lens to a video camera. The attachment device contains an image intensifier tub |
| 5369267 |
Microchannel image intensifier tube with novel sealing feature |
November 29, 1994 |
| A low cost image intensifier tube is provided which has an improved vacuum sealing mechanism and improved optical transmission. Glass windows on both the input and output of the tube are vacuum sealed within the housing by a ring of indium that contacts the interface between each of the |
| 5359187 |
Microchannel plate with coated output electrode to reduce spurious discharges |
October 25, 1994 |
| A microchannel plate (MCP) apparatus and method in which the output metalization layer or electrode is covered with a thin coating to reduce the number of spurious electron emissions striking the phosphor screen or other collection anode in an image intensifier. Microchannel plates m |
| 5326978 |
Focused electron-bombarded detector |
July 5, 1994 |
| A focused electron-bombarded (FEB) ion detector comprising an MCP, focusing means, and a collection anode disposed in a detector body. The collection anode includes a diode for receiving the focused output electron beam from the MCP. The gain between the input ion current to the MCP and |
| 5287914 |
System for substrate cooling in an evacuated environment |
February 22, 1994 |
| A method and apparatus are disclosed using a combination of convection and conduction cooling to cool an article in an evacuated environment. A processing chamber is used which includes at least one heat sink. A flat surface of the article to be cooled is positioned within the chamber in |
| 5268612 |
Feedback limited microchannel plate |
December 7, 1993 |
| A low noise microchannel plate limiting feedback includes a conductive deposit on an output side for reducing open areas at an output end of the plate. The microchannel plate can be included in an image intensifier tube. |
| 5253266 |
MBE effusion source with asymmetrical heaters |
October 12, 1993 |
| An effusion source, for the generation of molecular beams, adapted to be positioned at an angle to the horizontal, within a vacuum chamber, of an MBE system including heating structures around the source to create uniform temperatures across the source in planes substantially parallel to |
| 5215420 |
Substrate handling and processing system |
June 1, 1993 |
| A system for handling and processing thin substrates, such as substrates for magnetic disks. The system includes a main chamber, entrance and output load locks, a buffer chamber, substrate load/unload mechanism, and a plurality of substrate processing stations positioned contiguous with |
| 5181556 |
System for substrate cooling in an evacuated environment |
January 26, 1993 |
| A method and apparatus are disclosed using a combination of convection and conduction cooling to cool an article in an evacuated environment. A processing chamber is used which includes at least one heat sink. A flat surface of the article to be cooled is positioned within the chamber in |
| 5180478 |
Sputter coating source |
January 19, 1993 |
| Sputter coating source in which the target is mounted directly on the front side of the cathode and coolant is circulated on the back side of the cathode. The coolant does not contact the target, and the target is clamped tightly to the cathode by retainers which permit it to be removed |
| 5047821 |
Transferred electron III-V semiconductor photocathode |
September 10, 1991 |
| An improved transferred electron III-V semiconductor photocathode comprising an aluminum contact pad and an aluminum grid structure that improves quantum efficiency by removing a major obstacle to electrons escaping into the vacuum and controls dark spot blooming caused by overly bri |
