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Hampshire Instruments, Inc. Patents
Assignee:
Hampshire Instruments, Inc.
Address:
Rochester, NY
No. of patents:
11
Patents:












Patent Number Title Of Patent Date Issued
5197089 Pin chuck for lithography system March 23, 1993
A pin chuck holds a wafer during translation by an X-ray lithography machine. The chuck is designed to be the same size as the wafer and includes a plurality of extensions having tops along a common plane. The space between the extensions is evacuated to hold and level the wafer. In
5165094 Partially constrained minimum energy state controller November 17, 1992
A lithographic system, having a stepper and exposure station built on a block of granite attached to the ground using isolation legs, includes a servo control system for providing signals a motor associated with the stepper to control the movement of the stepper. The control system i
4980896 X-ray lithography system December 25, 1990
An x-ray lithography system is disclosed in which x-rays are generated by directing a high energy laser beam against a metal target to form an x-ray emitting plasma. The x-rays from the plasma are then directed through a mask towards a resist covered wafer to cause a patterned exposure o
4969169 X-ray lithography system November 6, 1990
An x-ray lithography system is disclosed in which x-rays are generated by directing a high energy laser beam against a metal target to form an x-ray emitting plasma. The x-rays from the plasma are then directed through a mask towards a resist covered wafer to cause a patterned exposure o
4896341 Long life X-ray source target January 23, 1990
Disclosed herein is an X-ray lithography system having a long life target. The life of the conventional target in X-ray generating systems for use in X-ray lithography systems is increased by providing means by which a single laser pulse can be provided to the same spot a plurality of ti
4872189 Target structure for x-ray lithography system October 3, 1989
Described herein is an improved target for use in a pulsed induced plasma X-ray lithography system. The target is formed as a disk shaped base having a series of concentric grooves formed on the side thereof incident to the focused laser beam. A plurality of small holes are fabricated
4870668 Gap sensing/adjustment apparatus and method for a lithography machine September 26, 1989
A step and repeat mechanism is used with an X-ray lithography system for moving a wafer to be exposed from position to position beneath the source of x-rays. The step and repeat mechanism includes, means for moving the wafer to be exposed with six degrees of freedom. Conventional drive m
4860328 Target positioning for minimum debris August 22, 1989
Described herein is an improved target for use in a pulsed induced plasma X-ray lithography system. The target is formed as a disk shaped base having a series of concentric grooves formed on the side thereof incident to the focused laser beam. A plurality of small holes are fabricated
4837793 Mass limited target June 6, 1989
Described herein is an improved target for use in a pulsed induced plasma X-ray lithography system. The target is formed as a disk shaped base having a series of concentric grooves formed on the side thereof incident to the focused laser beam. A plurality of small holes are fabricated
4734923 Lithographic system mask inspection device March 29, 1988
A device used to test the features of a mask used in a semiconductor lithographic machine. The device includes an array of charge couple devices and an array of pinholes positioned above the charge couple devices. The array of pinholes includes a small pinhole opening for each of the
4700371 Long life x-ray source target October 13, 1987
Disclosed herein is an X-ray lithography system having a long life target. The life of the conventional target in X-ray generating systems for use in X-ray lithography systems is increased by providing means by which a single laser pulse can be provided to the same spot a plurality of ti

 
 
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