| Patent Number |
Title Of Patent |
Date Issued |
| 7382816 |
Two-stage laser pulse energy control device and two-stage laser system |
June 3, 2008 |
| A charging voltage Vosc applied to a main capacitor C0 disposed in an oscillating high-voltage pulse generator 12 of an oscillating laser 100 is subject to constant control such that a pulse energy Posc of the oscillating laser 100 becomes a lower limit energy Es0 or more of an ampli |
| 7297968 |
Debris collector for EUV light generator |
November 20, 2007 |
| A debris collector for EUV light generators is disclosed which enables to improve durabilities of optical units in a chamber including a collector mirror, to keep the vacuum degree in the chamber, and to suppress decrease in EUV light output by efficiently collecting debris bumping i |
| 7271401 |
Extreme ultra violet light source device |
September 18, 2007 |
| An EUV light source device for protecting a collection mirror from debris that is considered harmful to a mirror coating. The EUV light source device includes: a chamber in which extreme ultra violet light is generated; a target injection unit and a target injection nozzle that suppl |
| 7196796 |
Wavelength detecting apparatus, laser apparatus, and wavelength detecting method |
March 27, 2007 |
| In a wavelength detecting apparatus using an etalon, a drift in wavelength measurement by the etalon is stabilized and an adverse influence of out gas is eliminated, so that correct wavelength measurement is realized. The wavelength detecting apparatus includes a housing equipped with a |
| 7078717 |
Light source device and exposure equipment using the same |
July 18, 2006 |
| A light source device which has small etendue so that high power can be drawn out and which is subject to less damage by debris. The light source device for generating extreme ultra violet light by irradiating a target with a laser beam, includes a target supply unit for supplying a mate |
| 7072375 |
Line-narrowed gas laser system |
July 4, 2006 |
| In a line-narrowed gas laser system such as a line-narrowed molecular fluorine laser system, ASE is cut off to obtain a spectral linewidth of 0.2 pm or lower and a spectral purity of 0.5 pm or lower. The laser system comprises a laser chamber filled with an F.sub.2-containing laser g |
| 7067832 |
Extreme ultraviolet light source |
June 27, 2006 |
| An extreme ultraviolet light source device which makes it possible to increase a working distance and obtain extreme ultraviolet light with a high output. The extreme ultraviolet light source device generates a plasma by irradiating a target (22) with laser light from a driving laser |
| 7006309 |
Prism unit and laser device |
February 28, 2006 |
| A prism unit, which is capable of firmly fixing a plurality of prism parts in a small space, and a laser device, which is capable of enhancing output power of laser light with use of the prism unit, are provided. For this purpose, a prism unit (28) includes a plurality of prism parts (35 |
| 6987279 |
Light source device and exposure equipment using the same |
January 17, 2006 |
| A light source device capable of extending the life of a collector mirror and reducing running cost by protecting the collector mirror from debris that is considered harmful to a mirror coating while securing the collection solid angle and collection rate of EUV light. The light source |
| 6922428 |
Gas laser apparatus for lithography |
July 26, 2005 |
| The present invention relates to a long pulse gas laser apparatus for lithography further improved in the laser oscillation efficiency and stability increased by addition of xenon gas. A gas laser apparatus for lithography has a pair of discharge electrodes 2 provided in a laser cham |
| 6879617 |
Two stage laser system |
April 12, 2005 |
| The present invention relates to a two stage laser system in which a desired spectral line width can be obtained at high output even when the integrated spectral characteristic of oscillator laser does not have the desired spectral line width, comprising an oscillator laser device 10 |
| 6813287 |
Wavelength control device for laser device |
November 2, 2004 |
| A wavelength control device for a laser device capable of controlling a center wavelength of a laser light to be a predetermined target wavelength is provided. For this purpose, the wavelength control device for the laser device includes a movable holder (36) for making an optical compon |
| 6810061 |
Discharge electrode and discharge electrode manufacturing method |
October 26, 2004 |
| A film is formed on the discharge parts of the main discharge electrodes. In order to prevent erosion of the discharge parts by the halogen gas contained in the laser gas, a substance that tends not to react with the halogen gas, i.e., a halogen-resistant substance, is used for this film |
| 6741627 |
Photolithographic molecular fluorine laser system |
May 25, 2004 |
| The invention provides a two-stage laser mode of photolithographic molecular fluorine laser system for matching the center wavelength of an oscillation-stage laser to the center wavelength of an amplification-stage laser, thereby oscillating a laser beam having a low spectral purity and |
| 6639929 |
Pulse oscillating gas laser device |
October 28, 2003 |
| A pulse oscillating gas laser device, which can reduce an influence of a shock wave caused by primary discharge and perform stable laser oscillation is provided. To this end, the device is a pulse oscillating gas laser device for exciting a laser gas by causing primary discharge in a |
| 6636297 |
Vacuum ultraviolet laser wavelength measuring apparatus |
October 21, 2003 |
| A vacuum ultraviolet laser wavelength measuring apparatus capable of accurately measuring wavelength characteristics of a laser beam. The wavelength measuring apparatus has spectral devices for generating an optical pattern corresponding to wavelength characteristics of an incident l |
