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Epitech Inc. Patents
Assignee:
Epitech Inc.
Address:
Taichung, TW
No. of patents:
1
Patents:




Patent Number Title Of Patent Date Issued
6716777 Fabric structure for making bags and the like April 6, 2004
A fabric structure is constructed having a fabric base sheet, a viscidity layer, a polymeric back layer, and a protective layer. The polymeric back layer is prepared from SBC (styrenic block copolymer) for the advantage of low specific gravity and preventing the drawback of PVC or the li

 
 
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