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Eidgenoessische Technische Hochschule Zurich Patents
Assignee:
Eidgenoessische Technische Hochschule Zurich
Address:
Zurich, CH
No. of patents:
1
Patents:




Patent Number Title Of Patent Date Issued
7115895 Formation of high-mobility silicon--germanium structures by low-energy plasma enhanced chemical October 3, 2006
Method for making a semiconductor structures comprising the steps:--forming a virtual substrate on a silicon substrate with a graded Si.sub.1-xGe.sub.x layer and a non-graded Si.sub.1-xGe.sub.x layer, using a high-density, low-energy plasma enhanced chemical vapor deposition (LEPECVD

 
 
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