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Eclipse Ion Technology, Inc. Patents |
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Assignee: Eclipse Ion Technology, Inc.
Address: Beverly, MA
No. of patents: 3
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| 4836233 |
Method and apparatus for venting vacuum processing equipment |
June 6, 1989 |
| Controlled, low-turbulence venting of a semiconductor processing vacuum chamber is provided by a venting system including sensing elements for sensing gas conditions, including pressure, in the chamber during venting, and vent rate control elements, including a flow rate regulator valve, |
| 4745281 |
Ion beam fast parallel scanning having dipole magnetic lens with nonuniform field |
May 17, 1988 |
| An ion source provides ions that pass through an analyzing magnet, image slit, and magnetic quadrupole lenses before entering a beam deflector. The deflected ion beam enters a magnetic field established by a dipole magnetic lens of rectangular cross section in planes parallel to the beam |
| 4726689 |
Linear gas bearing with integral vacuum seal for use in serial process ion implantation equipmen |
February 23, 1988 |
| A high vacuum ion implantation chamber has a lower wall formed with an opening accommodating a depending sleeve through which a shaft passes supporting a substrate support platform at the top and connectable to external linear and rotary drives at the bottom. The sleeve is formed with |
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