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Dainichi Shoji Co., Ltd. Patents
Assignee:
Dainichi Shoji Co., Ltd.
Address:
both of, JP
No. of patents:
1
Patents:




Patent Number Title Of Patent Date Issued
4714086 Apparatus for washing and drying substrates December 22, 1987
A method for washing and drying a substrate and an apparatus therefor are disclosed which are capable of effectively rapidly carrying out the washing and drying of a semiconductor substrate in good yields without damaging and contaminating the substrate. The method comprises the steps

 
 
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