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Cymer, Inc. Patents
Assignee:
Cymer, Inc.
Address:
San Diego, CA
No. of patents:
385
Patents:


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Patent Number Title Of Patent Date Issued
RE42588 Control system for a two chamber gas discharge laser system August 2, 2011
The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplifie
RE41457 Wavemeter for gas discharge laser July 27, 2010
An optical configuration to illuminate an etalon in a laser wavemeter with a minimum level of light intensity. The system includes optical components to direct a portion of the laser output beam representing the entire cross section of the beam, through an etalon positioned in an eta
RE40343 Control circuit with automatic DC offset May 27, 2008
An automatic gain control circuit in the feedback path for a laser wavelength control circuit is described herein. This gain control circuit automatically adjusts the amplification of the analog signals output from a photodetector array, where the array detects a fringe pattern created
RE38054 Reliable, modular, production quality narrow-band high rep rate F2 laser April 1, 2003
The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses in the range of 1000 Hz to 2000 Hz or greater. Replaceable modules include a laser chamber; a pulse power system comprised of three modules; an optical resonator
8295316 Method and system for managing light source operation October 23, 2012
A laser light source experiencing an EOL condition, which might otherwise cause an unscheduled shutdown, is instead operated in a diminished capacity in one or more predetermined or calculated increments. Operating in such diminished capacity continues until the laser system can undergo
8284815 Very high power laser chamber optical improvements October 9, 2012
An aspect of the disclosed subject matter includes a method of reducing the laser absorption of a beam reverser prism consisting of at least one of the following: increasing a first distance between a first incident point and a chamfered corner, wherein the first incident point is on a
8283643 Systems and methods for drive laser beam delivery in an EUV light source October 9, 2012
An EUV light source device is described herein which may comprise a laser beam travelling along a beam path, at least a portion of the beam path aligned along a linear axis; a material for interaction with the laser beam at an irradiation site to create an EUV light emitting plasma; a
8265109 Systems and methods for implementing an interaction between a laser shaped as line beam and a fi September 11, 2012
A laser crystallization apparatus and method are disclosed for selectively melting a film such as amorphous silicon that is deposited on a substrate. The apparatus may comprise an optical system for producing stretched laser pulses for use in melting the film. In still another aspect
8263953 Systems and methods for target material delivery protection in a laser produced plasma EUV light September 11, 2012
A device is disclosed herein which may comprise a chamber, a source providing a stream of target material droplets delivering target material to an irradiation region in the chamber along a path between a target material release point and the irradiation region, a gas flow in the cha
8259764 Bandwidth control device September 4, 2012
A method and apparatus is disclosed for operating a laser output light beam pulse line narrowing mechanism that may comprise a nominal center wavelength and bandwidth selection optic; a static wavefront compensation mechanism shaping the curvature of the selection optic; an active wa
8254420 Advanced laser wavelength control August 28, 2012
Laser light wavelength control is provided by periodically predicting a next position of a light controlling prism using a model of the prism's motion characteristics. The prediction is then updated if a measurement of laser output wavelength is obtained. However, because the predictions
8198615 Gas management system for a laser-produced-plasma EUV light source June 12, 2012
Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow
8198612 Systems and methods for heating an EUV collector mirror June 12, 2012
As disclosed herein, a device may comprise a substrate made of a material comprising silicon, the substrate having a first side and an opposed second side; an EUV reflective multi-layer coating overlaying at least a portion of the first side; an infrared absorbing coating overlaying at
8173985 Beam transport system for extreme ultraviolet light source May 8, 2012
An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; an extreme ultraviolet light vacuum chamber defining an interior vacuum space that
8170078 Laser system May 1, 2012
A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular
8158960 Laser produced plasma EUV light source April 17, 2012
A device is disclosed herein which may include a plasma generating system comprising a source of target material droplets and a laser producing a beam irradiating the droplets at an irradiation region, the plasma producing EUV radiation, wherein the droplet source comprises a fluid e
8144740 Laser system March 27, 2012
An apparatus/method may comprise a line narrowed pulsed lithography laser light source which may comprise: a seed pulse providing laser system which may comprise: a first pulsed seed laser producing seed pulses at a rate of X kHz; a second pulsed seed laser producing seed pulses at a rat
8144739 System method and apparatus for selecting and controlling light source bandwidth March 27, 2012
The bandwidth selection mechanism includes a first actuator mounted on a second face of a dispersive optical element, the second face being opposite from a reflective face, the first actuator having a first end coupled to a first end block and a second end coupled to a second end blo
8138487 System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generatio March 20, 2012
A system and method generating an extreme ultraviolet light in an extreme ultraviolet light chamber including a collector mirror, a droplet generation system having a droplet outlet aligned to output a plurality of droplets along a target material path and a first catch including a f
8126027 Line narrowing module February 28, 2012
An apparatus is disclosed which may comprise a grating receiving light, a first prism moveable to coarsely select an angle of incidence of the light on the grating, and a second prism moveable to finely select an angle of incidence of the light on the grating. In one application, the
8102889 Multi-chamber gas discharge laser bandwidth control through discharge timing January 24, 2012
A method and apparatus are disclosed for controlling bandwidth in a multi-portion laser system comprising a first line narrowed oscillator laser system portion providing a line narrowed seed pulse to an amplifier laser system portion, may comprise utilizing a timing difference curve
8098698 Active spectral control of DUV laser light source January 17, 2012
According to aspects of an embodiment of the disclosed subject matter, a line narrowed high average power high pulse repetition laser micro-photolithography light source bandwidth control method and apparatus are disclosed which may comprise a bandwidth metrology module measuring the
8075732 EUV collector debris management December 13, 2011
A method and apparatus that may comprise an EUV light producing mechanism utilizing an EUV plasma source material comprising a material that will form an etching compound, which plasma source material produces EUV light in a band around a selected center wavelength comprising: an EUV pla
8061923 Blind motorized coupling arrangements for coupling UV light source subsystem and scanner subsyst November 22, 2011
A coupling arrangement for coupling a light source subsystem with a scanner subsystem in a UV lithography system is disclosed. The arrangement includes a source flange having a plurality of ramped eared flanges coupled to one of the light source subsystem and the scanner subsystem. T
8035092 Laser produced plasma EUV light source October 11, 2011
A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed
8017924 Drive laser delivery systems for EUV light source September 13, 2011
An LPP EUV light source is disclosed having an optic positioned in the plasma chamber for reflecting EUV light generated therein and a laser input window. For this aspect, the EUV light source may be configured to expose the optic to a gaseous etchant pressure for optic cleaning while
8014432 Regenerative ring resonator September 6, 2011
A laser includes a regenerative ring resonator that includes a discharge chamber having electrodes and a gain medium between the electrodes for producing a laser beam; a partially-reflective optical coupler, and a beam modification optical system in the path of the laser beam. The beam
8000212 Metrology for extreme ultraviolet light source August 16, 2011
An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; a beam delivery system configured to receive the amplified light beam emitted from
7999915 Laser system August 16, 2011
A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular
7995637 Gas discharge laser chamber August 9, 2011
One aspect of the disclosed subject matter describes a gas discharge laser chamber. The gas discharge laser chamber includes a discharge region formed between a first electrode and a second electrode, a tangential fan for circulating gas through the discharge region, wherein the fan
7960701 EUV light source components and methods for producing, using and refurbishing same June 14, 2011
A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of
7928417 LPP EUV light source drive laser system April 19, 2011
An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the
7928416 Laser produced plasma EUV light source April 19, 2011
An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre-pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser devi
7920616 Laser system April 5, 2011
A method/apparatus may comprise a laser light source which may comprise a solid state seed laser system producing a seed laser output having a nominal center wavelength at a pulse repetition rate; a first and a second gas discharge laser amplifier gain medium each operating at a puls
7916388 Drive laser for EUV light source March 29, 2011
A device is described herein which may comprise an oscillator having an oscillator cavity length, L.sub.o, and defining an oscillator path; and a multi-pass optical amplifier coupled with the oscillator to establish a combined optical cavity including the oscillator path, the combined
7899095 Laser lithography system with improved bandwidth control March 1, 2011
A method and apparatus may comprise a seed laser, along with an amplifier laser amplifying the output of the seed laser. A bandwidth metrology module may provide a bandwidth measurement and a bandwidth error signal may be provided using a bandwidth set point. A differential timing system
7897947 Laser produced plasma EUV light source having a droplet stream produced using a modulated distur March 1, 2011
A plasma generating system is disclosed having a source of target material droplets, e.g. tin droplets, and a laser, e.g. a pulsed CO.sub.2 laser, producing a beam irradiating the droplets at an irradiation region, the plasma producing EUV radiation. For the device, the droplet source ma
7894494 Method and apparatus to control output spectrum bandwidth of MOPO or MOPA laser February 22, 2011
An apparatus and method which may comprise a seed laser defining an optical cavity producing an output. An amplifier may amplify the seed laser output. A bandwidth error signal generator may provide a bandwidth error signal from measured bandwidth and a target. A bandwidth selection
7885309 Laser system February 8, 2011
A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular
7872245 Systems and methods for target material delivery in a laser produced plasma EUV light source January 18, 2011
Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical
7856044 Extendable electrode for gas discharge laser December 21, 2010
Disclosed herein are systems and methods for extending one or both of the discharge electrodes in a transverse discharge gas laser chamber in which one or both the electrodes are subject to a dimensional change due to erosion. Electrode extension can be performed to increase the chamber
7852899 Timing control for two-chamber gas discharge laser system December 14, 2010
Feedback timing control equipment and process for an injection seeded modular gas discharge laser. A preferred embodiment is a system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 to 10 mJ or greater
7852889 Active spectral control of DUV light source December 14, 2010
According to aspects of an embodiment of the disclosed subject matter, a line narrowed high average power high pulse repetition laser micro-photolithography light source bandwidth control method and apparatus are disclosed which may comprise a bandwidth metrology module measuring the
7851011 Anodes for fluorine gas discharge lasers December 14, 2010
Electrodes for a fluorine gas discharge laser are disclosed which may comprise a crown straddling the centerline axis between the pair of side walls and the pair of end walls, comprising a first material, forming at least a portion of the discharge region of the electrode; the crown in
7848835 High power laser flat panel workpiece treatment system controller December 7, 2010
A pulsed DUV workpiece treatment apparatus and method for delivering light to irradiate the workpiece, for crystallization of a material on the workpiece, carried on a work stage, which may comprise a pulsed laser DUV light source and an optical train producing a very narrow width very
7843632 EUV optics November 30, 2010
In a first aspect, a method of fabricating an EUV light source mirror is disclosed which may comprise the acts/steps of providing a plurality of discrete substrates; coating each substrate with a respective multilayer coating; securing the coated substrates in an arrangement wherein each
7838854 Method and apparatus for EUV plasma source target delivery November 23, 2010
An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging me
7835414 Laser gas injection system November 16, 2010
A method and apparatus are disclosed which may comprise predicting the gas lifetime for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas may comprise: utilizing at least one of a plurality of laser operating in
7830942 Ultraviolet laser light source pulse energy control system November 9, 2010
A method and apparatus is disclosed which may comprise: a gas discharge laser system energy controller which may comprise: a laser system energy controller providing a first laser operating parameter control signal based on an error signal related to a value of the output energy of the
7830934 Multi-chamber gas discharge laser bandwidth control through discharge timing November 9, 2010
A method and apparatus are disclosed for controlling bandwidth in a multi-portion laser system comprising a first line narrowed oscillator laser system portion providing a line narrowed seed pulse to an amplifier laser system portion, may comprise utilizing a timing difference curve
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