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ASM Genitech Korea Ltd. Patents
Assignee:
ASM Genitech Korea Ltd.
Address:
Daejon, KR
No. of patents:
2
Patents:




Patent Number Title Of Patent Date Issued
7141278 Thin film forming method November 28, 2006
A method for forming thin films of a semiconductor device is provided. The thin film formation method presented here is based upon a time-divisional process gas supply in a chemical vapor deposition (CVD) method, where the process gases are supplied and purged sequentially, and additiona
7138336 Plasma enhanced atomic layer deposition (PEALD) equipment and method of forming a conducting thi November 21, 2006
A plasma enhanced atomic layer deposition (PEALD) apparatus and a method of forming a conductive thin film using the same are disclosed. According to the present invention of a PEALD apparatus and a method, a process gas inlet tube and a process gas outlet tube are installed symmetricall

 
 
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